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Mechanical properties of electroformed copper layers with gradient microstructure 被引量:2
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作者 Qiang Liao Li-qun Zhu Hui-cong Liu Wei-ping Li 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2010年第1期69-74,共6页
The electroformed copper layer with gradient microstructure was prepared using the ultrasonic technique. The microstructure of the electroformed copper layer was observed by using an optical microscope (OM) and a sc... The electroformed copper layer with gradient microstructure was prepared using the ultrasonic technique. The microstructure of the electroformed copper layer was observed by using an optical microscope (OM) and a scanning electron microscope (SEM). The preferred orientations of the layer were characterized by X-ray diffraction (XRD). The mechanical properties were evaluated with a Vicker's hardness tester and a tensile tester. It is found the gradient microstructure consists of two main parts: the outer part (faraway substrate) with columnar crystals and the inner part (nearby substrate) with equiaxed grains. The Cu-(220) preferred orientation increases with the increasing thickness of the copper layer. The test results show that the microhardness of the electroformed copper layer decreases with increasing grain size along the growth direction and presents a gradient distribution. The tensile strength of the outer part of the electroformed copper layer is higher than that of the inner part but at the cost of ductility. Meanwhile, the integral mechanical properties of the electroformed copper with gradient microstrucmre are significantly improved in comparison with the pure copper deposit. 展开更多
关键词 ELECTROFORMING copper layer gradient rnicrostructure mechanical properties preferred orientation
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Effects of Implant Copper Layer on Diamond Film Deposition on Cemented Carbides
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作者 马志斌 汪建华 +1 位作者 邬钦崇 王传新 《Plasma Science and Technology》 SCIE EI CAS CSCD 2001年第1期647-651,共5页
The deposition of high-quality diamond films and their adhesion on cemented carbides are strongly influenced by the catalytic effect of cobalt under typical deposition conditions. Decreasing Co content on the surface... The deposition of high-quality diamond films and their adhesion on cemented carbides are strongly influenced by the catalytic effect of cobalt under typical deposition conditions. Decreasing Co content on the surface of the cemented carbide is often used for the diamond film deposition. But the leaching of Co from the WC-Co substrate leading to a mechanical weak surface often causes a poor adhesion. In this paper we adopted an implant copper layer prepared by vaporization to improve the mechanical properties of the Co-leached substrate. The diamond films were grown by microwave plasma chemical vapor deposition from CH4:H2 gas mixture. The cross section and the morphology of the diamond film were characterized by scanning electron microscopy (SEM). The non-diamond content in the film was analyzed by Raman spectroscopy. The effects of pretreatment on the concentrations of Co and Cu near the interfacial region were examined by energy dispersive spectrum (EDS) equipped with SEM. The adhesion of the diamond on the substrate was evaluated with a Rockwell-type hardness tester. The results indicate that the diamond films prepared with implant copper layer have a good adhesion to the cemented carbide substrate due to the recovery of the mechanical properties of the Co-depleted substrate after the copper implantation and the formation of less amorphous carbon between the substrate and the diamond film. 展开更多
关键词 Effects of Implant copper layer on Diamond Film Deposition on Cemented Carbides Co
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PHOTOELECTROCHEMICAL STUDY OF PASSIVE LAYERS ON COPPER ELECTRODES IN SOME ALKALINE MEDIA 被引量:2
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作者  A. Kamkina,1, Zhou Guodinga, Xu Qunjieb and B. H.c Loo a Electrochemical Research Group, Shanghai Institute of Electric Power, Shanghai 200090, P. R. China b Corrosion Prevention Center, East China University of 《中国有色金属学会会刊:英文版》 CSCD 1998年第2期129-134,共6页
PHOTOELECTROCHEMICALSTUDYOFPASSIVELAYERSONCOPPERELECTRODESINSOMEALKALINEMEDIA①A.Kamkina,1,ZhouGuodinga,XuQun... PHOTOELECTROCHEMICALSTUDYOFPASSIVELAYERSONCOPPERELECTRODESINSOMEALKALINEMEDIA①A.Kamkina,1,ZhouGuodinga,XuQunjiebandB.H.cLooaE... 展开更多
关键词 copper ELECTRODE ALKALINE solutions PASSIVE layer PHOTOCURRENT response cyclic VOLTAMMETRY
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The Copper Thin Layer Deposition by Pulse Vacuum-Arc Sprayer
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作者 A. M. Zhukeshov А. T. Gabdullina +3 位作者 B. M. Ibraev M. Mukhamedryskyzy А. U. Amrenova E. Baltabai 《Materials Sciences and Applications》 2020年第3期177-183,共7页
In this work, the deposition process features of a copper coating on stainless steel substrate, using the pulse vacuum arc spraying method were researched. A continuous layer of copper was deposited on a stainless ste... In this work, the deposition process features of a copper coating on stainless steel substrate, using the pulse vacuum arc spraying method were researched. A continuous layer of copper was deposited on a stainless steel substrate, and a high degree of coating adhesion to the substrate was demonstrated. The thickness of coating using application time was calculated, and the surface unevenness was estimated. Inside the coating layer substrate material elements were observed, that could appear as a result of simultaneously plasma spraying on the surface of the substrate. The feature of this method was discovered, that surface plasma plays a significant role in the deposition process. Finally, it was shown that the device with a pulsed arc could effectively be used in industry, since it is possible to change the layer thickness in the range of hundreds of microns by varying the deposition time. 展开更多
关键词 VACUUM-ARC PLASMA PLASMA DEPOSITION copper Thin layers MICROHARDNESS
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Atomic layer deposition of copper thin film and feasibility of deposition on inner walls of waveguides
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作者 熊玉卿 高恒蛟 +1 位作者 任妮 刘忠伟 《Plasma Science and Technology》 SCIE EI CAS CSCD 2018年第3期146-150,共5页
Copper thin films were deposited by plasma-enhanced atomic layer deposition at low temperature, using copper(I)-N,N′-di-sec-butylacetamidinate as a precursor and hydrogen as a reductive gas. The influence of temper... Copper thin films were deposited by plasma-enhanced atomic layer deposition at low temperature, using copper(I)-N,N′-di-sec-butylacetamidinate as a precursor and hydrogen as a reductive gas. The influence of temperature, plasma power, mode of plasma, and pulse time, on the deposition rate of copper thin film, the purity of the film and the step coverage were studied.The feasibility of copper film deposition on the inner wall of a carbon fibre reinforced plastic waveguide with high aspect ratio was also studied. The morphology and composition of the thin film were studied by atomic force microscopy and x-ray photoelectron spectroscopy,respectively. The square resistance of the thin film was also tested by a four-probe technique. On the basis of on-line diagnosis, a growth mechanism of copper thin film was put forward, and it was considered that surface functional group played an important role in the process of nucleation and in determining the properties of thin films. A high density of plasma and high free-radical content were helpful for the deposition of copper thin films. 展开更多
关键词 atomic layer deposition copper inner wall WAVEGUIDE high aspect ratio
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Diffusion bonding of copper alloy to stainless steel with Ni and Cu interlayer
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作者 于治水 王凤江 +1 位作者 李晓泉 吴铭芳 《中国有色金属学会会刊:英文版》 CSCD 2000年第1期88-91,共4页
CuAlBe alloy is an attractive shape memory alloy with many important usages in industrial field, in order to spread its range of application it is desirable to be able to join CuAlBe soundly with other metallic materi... CuAlBe alloy is an attractive shape memory alloy with many important usages in industrial field, in order to spread its range of application it is desirable to be able to join CuAlBe soundly with other metallic materials, for example stainless steel; however the weldability between CuAlBe alloy and stainless steel has never been studied, therefore an experimental investigation of different transition metals was carried out in the diffusion bonding joints of Cu alloys (CuAlBe) to stainless steel (1Cr18Ni9Ti). The microstructure and phase composition of the joint were analyzed by SEM, EPMA and X ray diffraction. The following conclusions have been drawn: 1) The joint strength with Ni interlayer is higher than that with Cu interlayer when the welding parameters are the same; 2) When Ni interlayer is thinner, Al will interact with Ni and Fe, and the intermetallic compounds such as Fe 3Al are formed in the interface, which decreases the strength of the joints; 3) When the bonding temperature is higher, because the diffusion of Cu in Ni is faster than Ni in Cu, a Kirkendall effect occurs, which also decreases the strength of the joints. 展开更多
关键词 copper alloys STAINLESS steel inter layer DIFFUSION BONDING
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Crystal Structure And Magnetic Property of the Complex of Hydrogen-bonded Two-dimensional Layer Copper(Ⅱ)Acrylate with Trimethyl Phosphate
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作者 WANG Yaoyu SHI Qian +2 位作者 YANG Bingqin GAO Yici SHI Qizhen 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 2000年第2期176-178,共3页
关键词 copper(Ⅱ) acrylate Trimethyl phosphate Two-dimensional layer Crystal structure Magnetic property
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高深宽比硅孔溅射铜种子层工艺的探索与研究
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作者 付学成 刘民 +2 位作者 张笛 程秀兰 王英 《真空》 CAS 2024年第4期1-5,共5页
硅通孔技术(TSV)是当前非常热门的高密度封装技术,但由于常规薄膜沉积技术很难在高深宽比的硅孔内沉积铜、钨等金属种子层,硅通孔技术中存在深硅孔金属化困难的工艺问题。通过对倾斜溅射时铜原子二维非对心碰撞前后入射角度的变化关系... 硅通孔技术(TSV)是当前非常热门的高密度封装技术,但由于常规薄膜沉积技术很难在高深宽比的硅孔内沉积铜、钨等金属种子层,硅通孔技术中存在深硅孔金属化困难的工艺问题。通过对倾斜溅射时铜原子二维非对心碰撞前后入射角度的变化关系进行模拟计算发现,当原子碰撞有能量损失时,入射到硅孔内的铜原子角度会发生改变,有助于其沉积在硅孔深处。本文利用负偏压辅助多个铜靶共焦溅射的方式,在不同深宽比的硅盲孔中沉积铜种子层,验证了该方法的可行性,并通过三靶共焦溅射成功在深宽比8∶1的硅孔内实现了铜种子层的沉积。 展开更多
关键词 硅通孔技术 多靶共焦溅射 铜种子层
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一种基于射频辉光放电光谱仪的防污漆中铜元素含量的快速检测方法
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作者 汪杰 张海江 +4 位作者 夏萌 李江江 宋震 尹继凯 桂泰江 《合成材料老化与应用》 CAS 2024年第2期17-19,共3页
利用射频辉光放电光谱仪测定防污漆中铜元素含量,可在1h内准确测定出结果,同时分析渗出层的厚度,可以快速判定防污漆的防污效果。相比于传统的采用电感耦合等离子体原子发射(ICP-OES)或者原子吸收光谱仪的测量方法,该方法具有以下优势:... 利用射频辉光放电光谱仪测定防污漆中铜元素含量,可在1h内准确测定出结果,同时分析渗出层的厚度,可以快速判定防污漆的防污效果。相比于传统的采用电感耦合等离子体原子发射(ICP-OES)或者原子吸收光谱仪的测量方法,该方法具有以下优势:不需要复杂冗长的前处理过程,测试时间短,也不会产生废酸等废液,同时可以分析渗出层的厚度。经测试发现,模拟实验后防污漆表层铜元素含量为41.0%,随着深度的增加,铜元素含量先快速降低,随后缓慢增加,最后趋于平稳。由表面剥蚀到5μm深度时,铜含量降到最低值40.5%。此深度也就是“渗出层”的厚度。随着深度进一步增加,铜含量增加至40.9%,在23.0μm趋于稳定。 展开更多
关键词 防污涂料 铜含量 渗出层 辉光放电
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THQ50-C镀铜焊丝表面锈蚀原因探讨与分析
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作者 左茂方 左青源 +2 位作者 马正伟 王厚山 董洪波 《材料导报》 EI CAS CSCD 北大核心 2024年第S01期392-396,共5页
本工作对THQ50-C镀铜焊丝出现表面锈蚀的影响因素进行了研究和梳理,使用ZEISS-ULTRA场扫描电镜观察了镀铜焊丝表面SEM形貌和焊丝横截面镀铜层与母丝基体结合区SEM形貌,并测量了镀铜层厚度,分析了Cu、O、Fe三种元素的EDS能谱。利用OLYMPU... 本工作对THQ50-C镀铜焊丝出现表面锈蚀的影响因素进行了研究和梳理,使用ZEISS-ULTRA场扫描电镜观察了镀铜焊丝表面SEM形貌和焊丝横截面镀铜层与母丝基体结合区SEM形貌,并测量了镀铜层厚度,分析了Cu、O、Fe三种元素的EDS能谱。利用OLYMPUS GX53光学显微镜观察了焊丝横截面镀铜层与母丝基体结合区OM形貌,并对以上观察结果进行了分析。结果表明,THQ50-C镀铜焊丝出现表面锈蚀的根本原因是焊丝加工过程的母丝表面残留了许多微细沟壑、单深坑、细麻点等表面缺陷,这些缺陷宏观表现为树皮棱状凸凹不平的状态。进一步分析认为以上缺陷是由于焊丝母材盘条原有的表面缺陷经拉拔加工后“遗传”到焊丝母丝表面所引起的,从而导致了焊丝表面镀铜层不能完全覆盖焊丝基体形成致密铜层,在焊丝储存过程中由于环境腐蚀而出现了锈蚀现象。 展开更多
关键词 镀铜焊丝 表面锈蚀 镀铜层 母材盘条划痕 表面缺陷遗传
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基体铬合金化增强石墨烯/铜复合材料摩擦学性能研究
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作者 王杰 李英杰 +2 位作者 范国威 吴嘉杰 麦永津 《热加工工艺》 北大核心 2024年第8期82-86,共5页
如何通过优化石墨烯/铜复合材料的界面结构来提高复合材料的摩擦学性能成为石墨烯增强铜基复合材料领域重要的研究方向之一。采用铜铬合金(CuCr)作为基体材料,还原氧化石墨烯(RGO)作为增强相,通过溶液搅拌混合和热压烧结工艺制备得到了R... 如何通过优化石墨烯/铜复合材料的界面结构来提高复合材料的摩擦学性能成为石墨烯增强铜基复合材料领域重要的研究方向之一。采用铜铬合金(CuCr)作为基体材料,还原氧化石墨烯(RGO)作为增强相,通过溶液搅拌混合和热压烧结工艺制备得到了RGO/CuCr复合材料。对比了添加铬元素前后复合材料的减摩耐磨性能,基于磨痕表面成份和形貌的分析探讨了铜基体铬合金化对石墨烯/铜复合材料摩擦学性能的作用机制。结果表明,铜基体铬合金化使复合材料具有更小更稳定的摩擦因数和更低的比磨损率,特别是在高载荷工况下。性能提高的原因归结为铜基体铬合金化有利于在摩擦过程中复合材料表面形成致密而连续的富石墨烯摩擦层。 展开更多
关键词 石墨烯 界面结合 铜基复合材料 摩擦层 磨损
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基于氮化铝HTCC的表面Cu互连制备技术
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作者 杨欢 张鹤 +1 位作者 杨振涛 刘林杰 《微纳电子技术》 CAS 2024年第7期156-161,共6页
针对高集成密度、高散热封装外壳发展需求,基于氮化铝(AlN)高温共烧陶瓷(HTCC)多层基板,结合直接镀铜(DPC)工艺,提出了一种薄厚膜相结合的高散热封装基板及其制备方法。重点对氮化铝HTCC与表面铜(Cu)层间的结合力进行研究和优化,通过扫... 针对高集成密度、高散热封装外壳发展需求,基于氮化铝(AlN)高温共烧陶瓷(HTCC)多层基板,结合直接镀铜(DPC)工艺,提出了一种薄厚膜相结合的高散热封装基板及其制备方法。重点对氮化铝HTCC与表面铜(Cu)层间的结合力进行研究和优化,通过扫描电子显微镜(SEM)、能谱仪(EDS)和剥离强度测试仪分析和研究了界面的微观结构和力学性能。研究结果表明:与氮化铝/钛钨(TiW)/Cu相比,氮化铝/钛(Ti)/Cu界面的缺陷更少,金属Ti的黏附性能更优,拉脱断裂面在陶瓷基板上。当采用厚度为400 nm的Ti作为黏附层时,表面金属化剥离强度高达592 MPa,实现了高界面结合力,保证了产品封装性能的稳定性。 展开更多
关键词 氮化铝 高温共烧陶瓷(HTCC)多层基板 直接镀铜(DPC) 黏附层 钛(Ti) 剥离强度
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铜氧化层上钒氧酞菁分子的吸附构型及组装结构
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作者 彭兰沁 李小雨 +3 位作者 幸运 赵涵 邓炎滔 于迎辉 《物理学报》 SCIE EI CAS CSCD 北大核心 2024年第12期118-125,共8页
近年来,有机功能分子的调控因其在提高纳米光电器件内部载流子迁移率方面的突出贡献,已逐渐成为材料科学的热门领域之一.本文利用低温扫描隧道显微镜系统地研究了钒氧酞菁(VOPc)分子在干净Cu(110)和铜氧化层表面的吸附构型和组装结构.在... 近年来,有机功能分子的调控因其在提高纳米光电器件内部载流子迁移率方面的突出贡献,已逐渐成为材料科学的热门领域之一.本文利用低温扫描隧道显微镜系统地研究了钒氧酞菁(VOPc)分子在干净Cu(110)和铜氧化层表面的吸附构型和组装结构.在Cu(110)表面,初始时VOPc分子孤立吸附且氧原子向上和向下的构型共存.而在CuO-(2×1)表面,VOPc分子在初始时形成扩展的分子链,随后组装为有序的分子膜,在分子膜中两种吸附构型仍然共存且随机排布.在Cu_(5)O_(6)-c(6×2)表面,初始时VOPc分子的两种构型共存且形成无序结构.在覆盖度接近一个单层时,结构有序的组装分子膜逐渐形成,此时主要采用氧原子向上的分子构型,因偶极相互作用,随后的分子层生长遵循两种分子构型交替堆垛.研究还发现当Cu(110)表面上两种氧化结构共存时,第2层分子更倾向于吸附在Cu_(5)O_(6)-c(6×2)表面担载的分子膜上,主要是由分子层间的偶极相互作用导致的.本研究表明金属表面的氧化层在改变分子吸附构型和组装结构方面的重要性,可能将影响电子器件制造中分子膜中的电荷输运过程. 展开更多
关键词 钒氧酞菁 铜氧化层 扫描隧道显微镜 分子组装
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表面负载还原氧化石墨烯对泡沫铜热扩散系数的影响
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作者 常红旭 孙立伟 +2 位作者 白亮 刘景顺 刘军 《内蒙古工业大学学报(自然科学版)》 2024年第3期213-218,共6页
为研究及提升泡沫铜的热扩散性能,利用不同溶剂制备氧化石墨烯混合溶液,通过机械沉积(GO-无水乙醇-丙酮混合溶液沉积)、电沉积(GO-CuS4O混合溶液电沉积、KH550改性GO电沉积)两种不同的沉积方法将氧化石墨烯(GO)附着到经过预处理的泡沫... 为研究及提升泡沫铜的热扩散性能,利用不同溶剂制备氧化石墨烯混合溶液,通过机械沉积(GO-无水乙醇-丙酮混合溶液沉积)、电沉积(GO-CuS4O混合溶液电沉积、KH550改性GO电沉积)两种不同的沉积方法将氧化石墨烯(GO)附着到经过预处理的泡沫铜表面,后通过高温还原法去除氧化石墨烯表面多余的含氧基团,将其还原为还原氧化石墨烯(rGO),研究材料热扩散性能及泡沫铜表面rGO的存在状态。研究结果表明,通过GO-无水乙醇-丙酮混合溶液沉积的泡沫铜表面沉积层最为均匀完整,经高温还原后性能提升也最为明显,其低温热扩散系数由纯泡沫铜的29.06 mm^(2)/s提高为56.81 mm^(2)/s,提升了95.5%。与热扩散系数为50.26 mm^(2)/s的T2铜片相比,其热扩散系数亦提高13.09%。GO在泡沫铜表面的沉积方式对沉积效果影响显著,GO经过高温还原为rGO后均可以有效提升泡沫铜的热扩散性能。 展开更多
关键词 泡沫铜 氧化石墨烯 沉积层 高温还原 热扩散系数
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延长高炉寿命的若干问题探讨
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作者 车玉满 谢明辉 +2 位作者 郭天永 姜喆 李仲 《鞍钢技术》 CAS 2024年第2期1-6,共6页
近年来,一些企业的高炉依然存在安全隐患,严重限制高炉高效生产。系统分析了高炉设计、铁口以下区域炭砖种类选择、炉缸冷却制度、施工质量管理、日常维护与操作技术等高炉长寿影响因素,论述了炉缸压浆护炉、含钛炉料护炉和在炭砖热面... 近年来,一些企业的高炉依然存在安全隐患,严重限制高炉高效生产。系统分析了高炉设计、铁口以下区域炭砖种类选择、炉缸冷却制度、施工质量管理、日常维护与操作技术等高炉长寿影响因素,论述了炉缸压浆护炉、含钛炉料护炉和在炭砖热面形成永久性保护层的延长高炉寿命技术,以期为实现高炉高效长寿提供参考和借鉴。 展开更多
关键词 高炉 长寿 死铁层 铜冷却壁
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QAl10-4-4/TC6双金属连接界面组织与力学性能分析
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作者 姜琪 孙利星 +4 位作者 张艺豪 张容焱 倪磊 杨倩 邹军涛 《铜业工程》 CAS 2024年第1期45-53,共9页
铜合金/钛合金双金属材料能发挥各自的性能优势,兼具轻质、耐磨、高强等优异性能。本文通过真空热压扩散法连接QAl10-4-4铝青铜和TC6钛合金,并采用显微组织观察和剪切强度测试等方法,研究了直接连接和添加AgCuZnCd连接的QAl10-4-4/TC6... 铜合金/钛合金双金属材料能发挥各自的性能优势,兼具轻质、耐磨、高强等优异性能。本文通过真空热压扩散法连接QAl10-4-4铝青铜和TC6钛合金,并采用显微组织观察和剪切强度测试等方法,研究了直接连接和添加AgCuZnCd连接的QAl10-4-4/TC6双金属的界面组织和力学性能,探究了连接参数与中间层对QAl10-4-4/TC6双金属连接质量的影响规律,分析了双金属界面过渡层形成机理,建立了连接工艺-界面组织-力学性能的内在关联。结果表明:直接扩散连接的QAl10-4-4/TC6双金属连接质量较差,生成的金属间化合物导致界面上生长了贯穿长裂纹,剪切强度仅有21 MPa;添加AgCuZnCd连接QAl10-4-4/TC6双金属后界面金属间化合物减少,当连接温度为850℃时,界面剪切强度最大为178.19 MPa,温度超过850℃时,双金属界面强度迅速降低。 展开更多
关键词 铜合金/钛合金 真空热压扩散连接 中间层 金属间化合物 剪切强度
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精粗双层绕组磁浮平面电机线圈厚度影响分析
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作者 赵烁 曾理湛 《微特电机》 2024年第6期1-7,共7页
新型精粗双层绕组磁浮平面电机(FCDLWMPM)利用靠近磁体的下层线圈产生加速推力、离磁体较远的上层线圈保证匀速运动精度,可兼顾光刻运动不断提升的加速度与精度要求。FCDLWMPM高加速度运动生成的铜耗和谐波力会影响系统精度,而线圈厚度... 新型精粗双层绕组磁浮平面电机(FCDLWMPM)利用靠近磁体的下层线圈产生加速推力、离磁体较远的上层线圈保证匀速运动精度,可兼顾光刻运动不断提升的加速度与精度要求。FCDLWMPM高加速度运动生成的铜耗和谐波力会影响系统精度,而线圈厚度是影响铜耗和谐波力的关键设计参数。对FCDLWMPM进行了电磁力及铜耗建模,介绍了FCDLWMPM的电磁结构及工作模式。基于永磁阵列磁场谐波模型、洛伦兹定律,进行了单线圈电磁力解析求解,推导了DQ解耦控制下的上下层线圈阵列电磁力方程,进而得出了光刻运动下的电机铜耗方程和谐波力占比函数。求解上下层线圈厚度参数值,得到双层绕组厚度对铜耗和谐波力占比的影响规律,讨论双层绕组厚度参数的选择以有效减小铜耗和谐波力占比。 展开更多
关键词 精粗双层绕组磁悬浮平面电机 线圈厚度 铜耗方程
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Friction and wear properties of copper matrix composites reinforced by tungsten-coated carbon nanotubes 被引量:3
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作者 NIE Junhui JIA Xian +3 位作者 JIA Chengchang LI Yi ZHANG Yafeng SHI Na 《Rare Metals》 SCIE EI CAS CSCD 2011年第6期657-663,共7页
Carbon nanotubes (CNTs) were coated by tungsten layer using metal organic chemical vapor deposition process with tungsten hexacarbonyl as a precursor. The W-coated CNTs (W-CNTs) were dispersed into Cu powders by m... Carbon nanotubes (CNTs) were coated by tungsten layer using metal organic chemical vapor deposition process with tungsten hexacarbonyl as a precursor. The W-coated CNTs (W-CNTs) were dispersed into Cu powders by magnetic stirring process and then the mixed powders were consolidated by spark plasma sintering to fabricate W-CNTs/Cu composites. The CNTs/Cu composites were fabricated using the similafprocesses. The friction coefficient and mass wear loss of W-CNTs/Cu and CNTs/Cu composites were studied. The results showed that the W-CNT content, interfacial bonding situation, and applied load could influence the friction coefficient and wear loss of W-CNTs/Cu com- posites. When the W-CNT content was 1.0 wt.%, the W-CNTs/Cu composites got the minimum friction coefficient and wear loss, which were decreased by 72.1% and 47.6%, respectively, compared with pure Cu specimen. The friction coefficient and wear loss of W-CNTs/Cu composites were lower than those of CNTs/Cu composites, which was due to that the interracial bonding at (W-CNTs)-Cu interface was better than that at CNTs-Cu interface. The friction coefficient of composites did not vary obviously with increasing applied load, while the wear loss of composites increased significantly with the increase of applied load. 展开更多
关键词 carbon nanotubes tungsten layer copper friction coefficient wear loss
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Corrosion Inhibition from Thiol Self-assembly Layer: A High Pressure Perspective
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作者 任全强 LI Ainong +3 位作者 邱日 XU Likun LI Bei SUN Zhiyong 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2018年第6期1334-1343,共10页
Taking dodecanethiol as the representative, we investigated the corrosion inhibition performance of SAL in seawater under pressures from 0.1 to 9 MPa. By using scanning Kelvin probe, the dodecanethiol SAL is confirmed... Taking dodecanethiol as the representative, we investigated the corrosion inhibition performance of SAL in seawater under pressures from 0.1 to 9 MPa. By using scanning Kelvin probe, the dodecanethiol SAL is confirmed to build on Cu surface, and the modification of SAL has positively shifted the surface potential to realize the inertness. Electrochemical techniques, such as electrochemical impedance spectroscopy and potentiodynamic polarization were used to reveal the corrosion behavior of Cu modified by SAL under the different pressure, i e, 0.1, 3, 6, and 9 MPa. It is indicated that the longer modification time affords better corrosion resistance to Cu. Higher static pressure is easier to deteriorate the corrosion inhibition capability due to the penetration effect. A plausible mechanism is proposed to illustrate the degradation process of SAL in the high pressure seawater environment. 展开更多
关键词 high pressure corrosion self-assembled layer copper DODECANETHIOL
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Sintering behavior and thermal conductivity of nickel-coated graphite flake/copper composites fabricated by spark plasma sintering 被引量:1
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作者 Hui Xu Jian-hao Chen +2 位作者 Shu-bin Ren Xin-bo He Xuan-hui Qu 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2018年第4期459-471,共13页
Nickel-coated graphite flakes/copper(GN/Cu) composites were fabricated by spark plasma sintering with the surface of graphite flakes(GFs) being modified by Ni–P electroless plating. The effects of the phase trans... Nickel-coated graphite flakes/copper(GN/Cu) composites were fabricated by spark plasma sintering with the surface of graphite flakes(GFs) being modified by Ni–P electroless plating. The effects of the phase transition of the amorphous Ni–P plating and of Ni diffusion into the Cu matrix on the densification behavior, interfacial microstructure, and thermal conductivity(TC) of the GN/Cu composites were systematically investigated. The introduction of Ni–P electroless plating efficiently reduced the densification temperature of uncoated GF/Cu composites from 850 to 650℃ and slightly increased the TC of the X–Y basal plane of the GF/Cu composites with 20 vol%–30 vol% graphite flakes. However, when the graphite flake content was greater than 30 vol%, the TC of the GF/Cu composites decreased with the introduction of Ni–P plating as a result of the combined effect of the improved heat-transfer interface with the transition layer, P generated at the interface, and the diffusion of Ni into the matrix. Given the effect of the Ni content on the TC of the Cu matrix and on the interface thermal resistance, a modified effective medium approximation model was used to predict the TC of the prepared GF/Cu composites. 展开更多
关键词 copper matrix composites graphite flake nickel-phosphorus transition layer sintering behavior thermal conductivity
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