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Properties of Boron-doped μc-Ge:H Films Deposited by Hot-wire CVD
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作者 黄海宾 沈鸿烈 +3 位作者 WU Tianru LU Linfeng TANG Zhengxia SHEN Jiancang 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2015年第3期516-519,共4页
Boron-doped hydrogenated microcrystalline Germanium (lac-Ge:H) films were deposited by hot-wire CVD. H2 diluted G-ell4 and B2H6 were used as precursors and the substrate temperature was kept at 300 ℃. The properti... Boron-doped hydrogenated microcrystalline Germanium (lac-Ge:H) films were deposited by hot-wire CVD. H2 diluted G-ell4 and B2H6 were used as precursors and the substrate temperature was kept at 300 ℃. The properties of the samples were analyzed by XRD, Raman spectroscopy, Fourier transform infrared spectrometer and Hall Effect measurement with Van der Pauw method. It is found that the films are partially crystallized, with crystalline fractions larger than 45% and grain sizes smaller than 50 nm. The B-doping can enhance the crystallization but reduce the grain sizes, and also enhance the preferential growth of Ge (220). The conductivity of the films increases and tends to be saturated with increasing diborane-to-germane ratio RB2H6. All the Hall mobilities of the samples are larger than 3.8 cmZV-1·s-1. A high conductivity of 展开更多
关键词 Boron pc-Ge:H film HWCVD crystalline fraction conductivity Hall mobility
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