期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering
1
作者 牟宗信 刘升光 +2 位作者 臧海荣 王春 牟晓东 《Plasma Science and Technology》 SCIE EI CAS CSCD 2011年第6期667-671,共5页
High-power pulsed magnetron sputtering (HPPMS or HiPIMS) is an emerging coating technology that produces very dense plasmas and highly ionized sputtering atoms. This paper is focused on discharge properties, unbalan... High-power pulsed magnetron sputtering (HPPMS or HiPIMS) is an emerging coating technology that produces very dense plasmas and highly ionized sputtering atoms. This paper is focused on discharge properties, unbalanced features and temporal evolution of pulse current of the HPPMS discharge. A hollow cathode was used to suppress the scattering of charges. A coaxial coil surrounding the target was used to control the breakdownvoltage and pulse repetition frequency by varying the coil current. A Langmuir probe and an oscilloscope were used to simultaneously measure the floating potential, pulse voltage and pulse current signMs. The pulse power density in the discharge reached 10 kW/cm2 with frequencies as high as N40 Hz and a pulse width about 1~5 ms. The characteristics of the discharge evolution were analyzed using magnetron discharge dynamics. 展开更多
关键词 plasma sources electric discharges deposition by sputtering
下载PDF
The 50 nm-thick yttrium iron garnet films with perpendicular magnetic anisotropy
2
作者 Shuyao Chen Yunfei Xie +11 位作者 Yucong Yang Dong Gao Donghua Liu Lin Qin Wei Yan Bi Tan Qiuli Chen Tao Gong En Li Lei Bi Tao Liu Longjiang Deng 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第4期67-72,共6页
Yttrium iron garnet(YIG) films possessing both perpendicular magnetic anisotropy(PMA) and low damping would serve as ideal candidates for high-speed energy-efficient spintronic and magnonic devices.However,it is still... Yttrium iron garnet(YIG) films possessing both perpendicular magnetic anisotropy(PMA) and low damping would serve as ideal candidates for high-speed energy-efficient spintronic and magnonic devices.However,it is still challenging to achieve PMA in YIG films thicker than 20 nm,which is a major bottleneck for their development.In this work,we demonstrate that this problem can be solved by using substrates with moderate lattice mismatch with YIG so as to suppress the excessive strain-induced stress release as increasing the YIG thickness.After carefully optimizing the growth and annealing conditions,we have achieved out-of-plane spontaneous magnetization in YIG films grown on sGGG substrates,even when they are as thick as 50 nm.Furthermore,ferromagnetic resonance and spin pumping induced inverse spin Hall effect measurements further verify the good spin transparency at the surface of our YIG films. 展开更多
关键词 SPINTRONICS perpendicular magnetic anisotropy magnetic thin film deposition by sputtering
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部