期刊文献+
共找到6篇文章
< 1 >
每页显示 20 50 100
Future Digital Design and Manufacturing Technologies for Manufacturing Innovation:Embracing Industry 4.0 and Beyond 被引量:1
1
作者 Sheng-Feng Qin Kai Cheng 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2016年第2期I0001-I0001,共1页
Industry 4.0 as referred to a fourth industrial revolution has endorsed in several national manufacturing development plans such as in Germany, the UK, and China. A set of important pervasive and secondary technologie... Industry 4.0 as referred to a fourth industrial revolution has endorsed in several national manufacturing development plans such as in Germany, the UK, and China. A set of important pervasive and secondary technologies for future manufacturing activities have been identified such as additive manufacturing, sensor technology, big data analytics, Internet of things, robotics, cloud computing, and nanotechnology. 展开更多
关键词 Future Digital design and manufacturing Technologies for manufacturing Innovation
下载PDF
Adaptive Layout Partitioning for Dark Field Alternating Phase-Shift Mask Design 被引量:1
2
作者 王迪 吴为民 洪先龙 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第7期766-770,共5页
A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phas... A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflicts with good quality and satisfy lower resource consumption with different requirements of precision and speedup. 展开更多
关键词 IC CAD phase-shift mask PARTITION phase conflict design for manufacturing
下载PDF
Partition-Based Global Placement Considering Wire-Density Uniformity for CMP Variations
3
作者 董昌道 周强 +1 位作者 蔡懿慈 刘大为 《Tsinghua Science and Technology》 SCIE EI CAS 2011年第1期41-50,共10页
This paper presents a multilevel hypergraph partitioning method that balances constraints on not only the cell area but also the wire weight with a partition-based global placement algorithm that maximizes the wire de... This paper presents a multilevel hypergraph partitioning method that balances constraints on not only the cell area but also the wire weight with a partition-based global placement algorithm that maximizes the wire density uniformity to control chemical-mechanical polishing (CMP) variations. The multilevel partitioning alternately uses two FM variants in the refinement stage to give a more uniform wire distribution. The global placement is based on a top-down recursive bisection framework. The partitioning algorithm is used in the bisectioning to impact the wire density uniformity. Tests show that, with a 10% constraint, the partitioning produces solutions with more balanced edge weights that are 837% better than from hMetis, 1039.1% better than MLPart, and 762.9% better than FM in terms of imbalance proportion and that this global placement algorithm improves ROOSTER with a more uniform wire distribution by 3.1% on average with an increased wire length of only 3.0%. 展开更多
关键词 partitioning PLACEMENT chemical-mechanical polishing (CMP) design for manufacturing (DFM) wire-density
原文传递
An electroplating topography model based on layout-dependent variation of copper deposition rate
4
作者 王强 陈岚 +1 位作者 李志刚 阮文彪 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第10期152-156,共5页
A layout-pattern-dependent electroplating model is developed based on the physical mechanism of the electroplating process.Our proposed electroplating model has an advantage over former ones due to a consideration of ... A layout-pattern-dependent electroplating model is developed based on the physical mechanism of the electroplating process.Our proposed electroplating model has an advantage over former ones due to a consideration of the variation of copper deposition rate with different layout parameters during the process.The simulation results compared with silicon data demonstrate the improvement in accuracy. 展开更多
关键词 design for manufacturing ELECTROPLATING MODELING
原文传递
DFM/CAPP/CAM System in a Concurrent Engineering Environment
5
作者 刘成颖 王先逵 +3 位作者 蒲建 李志忠 黄新刚 朱霞 《Tsinghua Science and Technology》 SCIE EI CAS 1999年第2期46-51,共6页
In this paper the importance of DFM/CAPP/CAM system in Concurrent Engineering (CE) is discussed. Based on the analyses of the character of concurrent product design and manufacturing process design, the workflow of ... In this paper the importance of DFM/CAPP/CAM system in Concurrent Engineering (CE) is discussed. Based on the analyses of the character of concurrent product design and manufacturing process design, the workflow of DFM/CAPP/CAM system in CE is given. DFM/CAPP/CAM theories, methods and functions are investigated in a delicate and all round way, and are implemented in the developed DFM/CAPP/CAM system. 展开更多
关键词 Concurrent Engineering (CE) process planning design for manufacturing
原文传递
Part Machinability Evaluation System
6
作者 黄新刚 王先逵 +1 位作者 刘成颖 蒲建 《Tsinghua Science and Technology》 SCIE EI CAS 1999年第2期68-70,共3页
In the early design period, estimation of the part or the whole product machinability is useful to consider the function and process request of the product at the same time so as to globally optimize the design decisi... In the early design period, estimation of the part or the whole product machinability is useful to consider the function and process request of the product at the same time so as to globally optimize the design decision. This paper presents a part machinability evaluation system, discusses the general restrictions of part machinability, and realizes the inspection of these restrictions with the relation between tool scan space and part model. During the system development, the expansibility and understandability were considered, and an independent restriction algorithm library and a general function library were set up. Additionally, the system has an interpreter and a knowledge manager. 展开更多
关键词 Concurrent Engineering (CE) design for manufacturing machinability evaluation
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部