Crystallization Kinetics of Nanophase Glass-Ceramics as Magnetic Disk Substrate

Glass-ceramics containing β-quartz as a main crystal phase based on the system of SiO2-Al2O3-Li2O-K2O-MgO-ZnO were investigated for the application to magnetic storage substrate for higher storage capacity. Parent glasses were prepared, then nucleated and crystallized at certain temperatures for 3-4 h. The crystallization kinetics of glass-ceramics was also studied. The grain size was estimated by Scherrer formula and image treatment of transmission electron microscopy （TEM）. The results showed that the Avrami exponent was determined to be 3.88, the activation energy 189.3＋7 k J/tool and the grain size 30-60 nm. A detailed microstructure of the glass-ceramics, including grain distribution and the morphology of nano-crystalline was characterized by TEM, X-ray diffraction （XRD）, differential scanning calorimeter （DSC）, differential thermal analysis （DTA）. The relationship between microstructure and mechanical properties was also discussed.

ANALYSIS ON LAPPING AND POLISHING PRESSURE DISTRIBUTION OF HARD MAGNETIC DISK SUBSTRATE

The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate),grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed.

Abrasive-free polishing of hard disk substrate with H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry

The effect of tert-butyl hydroperoxide-sodium pyrosulfite((CH3)3COOH-Na2S2O5)as an initiator system in H2O2-based slurry was investigated for the abrasive-free polishing(AFP)of a hard disk substrate.The polishing results show that the H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry exhibits a material removal rate(MRR)that is nearly 5 times higher than that of the H2O2 slurry in the AFP of the hard disk substrate.In addition,the surface polished by the slurry containing the initiator exhibits a lower surface roughness and has fewer nano-asperity peaks than that of the H2O2 slurry.Further,we investigate the polishing mechanism of H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry.Electron spin-resonance spectroscopy and auger electron spectrometer analyses show that the oxidizing ability of the H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry is much greater than that of the H2O2 slurry.The results of potentiodynamic polarization measurements show that the hard disk substrate in the H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry can be rapidly etched,and electrochemical impedance spectroscopy analysis indicates that the oxide film of the hard disk substrate formed in the H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry may be loose,and can be removed easily during polishing.The better oxidizing and etching ability of H_(2)O_(2)-C_(4)H_(10)O_(2)-Na_(2)S_(2)O_(5) slurry leads to a higher MRR in AFP for hard disk substrates.

Simulation and Experiments on the Capillary Force between a Circular Disk and a Parallel Substrate

The capillary force of a liquid bridge with a pinned contact line between a small disk and a parallel plate is investigated by simulation and experiments. The numerical minimization simulation method is utilized to calculate the capillary force. The results show excellent agreement with the Young-Laplace equation method. An experimental setup is built to measure the capillary force. The experimental results indicate that the simulation results agree well with the measured forces at large separation distances, while some deviation may occur due to the transition from the advancing contact angle to the receding one at small distances. It is also found that the measured rupture distance is slightly larger than the simulation value due to the effect of the viscous interaction inside the liquid bridge.