Preparation of Fluorine-free MXene Ti_(3)C_(2)T_(x) and Its Electrical Properties

The fluorine-free MXene was prepared by Lewis acid salt etching of ternary layered ceramic MAX phase material.The structure of fluorine-free MXene was characterized by scanning electron microscopy(SEM)and X-ray diffractometry(XRD).The study finds that the layer spacing of fluorine-free MXene is approximately twice that of MXene etched by the liquid-phase method,compared to the conventional liquidphase method.It also has greater capacitive properties.Therefore,the MXene prepared by this method shows a great potential for application in the field of capacitors.

Suitable contacting scheme for evaluating electrical properties of GaN-based p-type layers

A suitable contacting scheme for p-(Al)GaN facilitating quick feedback and accurate measurements is proposed in this study.22 nm p^(+)-GaN followed by 2 nm p-In_(0.2)Ga_(0.8)N was grown on p-type layers by metal-organic chemical vapor deposition.Samples were then cut into squares after annealing and contact electrodes using In balls were put at the corners of the squares.Good linearity between all the electrodes was confirmed inⅠ–Ⅴcurves during Hall measurements even with In metal.Serval samples taken from the same wafer showed small standard deviation of~4%for resistivity,Hall mobility and hole concentration.The influence of contact layer on the electrical characteristics of bulk p-type layers was then investigated by step etching technique using inductively coupled plasma etching and subsequent Hall-effect measurements.Identical values could be obtained consistently when a 28 nm non-conductive layer thickness at the surface was taken into account.Therefore,the procedures for evaluating the electrical properties of GaN-based p-type layers just using In balls proposed in this study are shown to be quick and useful as for the other conventionalⅢ–Ⅴmaterials.

Exploring heteroepitaxial growth and electrical properties of α-Ga_(2)O_(3) films on differently oriented sapphire substrates

This study explores the epitaxial relationship and electrical properties of α-Ga_(2)O_(3) thin films deposited on a-plane, mplane, and r-plane sapphire substrates. We characterize the thin films by X-ray diffraction and Raman spectroscopy, and elucidate thin film epitaxial relationships with the underlying sapphire substrates. The oxygen vacancy concentration of α-Ga_(2)O_(3) thin films on m-plane and r-plane sapphire substrates are higher than α-Ga_(2)O_(3) thin film on a-plane sapphire substrates. All three thin films have a high transmission of over 80% in the visible and near-ultraviolet regions, and their optical bandgaps stay around 5.02–5.16 eV. Hall measurements show that the α-Ga_(2)O_(3) thin film grown on r-plane sapphire has the highest conductivity of 2.71 S/cm, which is at least 90 times higher than the film on a-plane sapphire. A similar orientation-dependence is seen in their activation energy as revealed by temperature-dependent conductivity measurements, with 0.266, 0.079, and 0.075eV for the film on a-, m-, r-plane, respectively. The origin of the distinct transport behavior of films on differently oriented substrates is suggested to relate with the distinct evolution of oxygen vacancies at differently oriented substrates. This study provides insights for the substrate selection when growing α-Ga_(2)O_(3) films with tunable transport properties.

Optical and electrical properties of BaSnO_(3) and In_2O_(3) mixed transparent conductive films deposited by filtered cathodic vacuum arc technique at room temperature

For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular beam epitaxy till now which limited there application in low temperature device process.In the article,the microstructure,optical and electrical of BTO and In_(2)O_(3) mixed transparent conductive BaInSnO_(x)(BITO)film deposited by filtered cathodic vacuum arc technique(FCVA)on glass substrate at room temperature were firstly reported.The BITO film with thickness of 300 nm had mainly In_(2)O_(3) polycrystalline phase,and minor polycrystalline BTO phase with(001),(011),(111),(002),(222)crystal faces which were first deposited at room temperature on amorphous glass.The transmittance was 70%–80%in the visible light region with linear refractive index of 1.94 and extinction coefficient of 0.004 at 550-nm wavelength.The basic optical properties included the real and imaginary parts,high frequency dielectric constants,the absorption coefficient,the Urbach energy,the indirect and direct band gaps,the oscillator and dispersion energies,the static refractive index and dielectric constant,the average oscillator wavelength,oscillator length strength,the linear and the third-order nonlinear optical susceptibilities,and the nonlinear refractive index were all calculated.The film was the n-type conductor with sheet resistance of 704.7Ω/□,resistivity of 0.02Ω⋅cm,mobility of 18.9 cm2/V⋅s,and carrier electron concentration of 1.6×10^(19) cm^(−3) at room temperature.The results suggested that the BITO film deposited by FCVA had potential application in transparent conductive films-based low temperature device process.

Nonlinear analysis on electrical properties in a bended composite piezoelectric semiconductor beam

In this paper,the interactions between the transverse loads and the electrical field quantities are investigated based on the nonlinear constitutive relation.By considering a composite beam consisting of a piezoelectric semiconductor and elastic layers,the nonlinear model is established based on the phenomenological theory and Euler’s beam theory.Furthermore,an iteration procedure based on the differential quadrature method(DQM)is developed to solve the nonlinear governing equations.Before analysis,the convergence and correctness are surveyed.It is found that the convergence of the proposed iteration is fast.Then,the transverse pressure induced electrical field quantities are investigated in detail.From the calculated results,it can be found that the consideration of nonlinear constitutive relation is necessary for a beam undergoing a large load.Compared with the linear results,the consideration of the nonlinear constitutive relation breaks the symmetry for the electric potential,the electric field,and the perturbation carrier density,and has little influence on the electric displacement.Furthermore,the non-uniform pressures are considered.The results show that the distributions of the electric field quantities are sensitively altered.It indicates that the electrical properties can be manipulated with the design of different transverse loads.The conclusions in this paper could be the guidance on designing and manufacturing electronic devices accurately.

Effect of SiO_2 addition on the microstructure and electrical properties of ZnO-based varistors

The microstructure and electrical properties of ZnO-based varistors with the SiO2 content in the range of 0-1.00mol% were prepared by a solid reaction route. The varistors were characterized by scanning electron microscopy, X-ray diffraction, energy-dispersive X-ray spectrometry, inductively coupled plasma-atomic emission spectrometry, and X-ray photoelectron spectroscopy. The results indicate that the average grain size of ZnO decreases with the SiO2 content increasing. A new second phase （Zn2SiO4） and a glass phase （Bi2SiO5） are found. Element Si mainly exists in the grain boundary and plays an important role in controlling the Bi2O3 vaporization. The electric measurement shows that the incorporation of SiO2 can significantly improve the nonlinear properties of ZnO-based varistors, and the nonlinear coefficients of the varistors with SiO2 are in the range of 36.8-69.5. The varistor voltage reaches the maximum value of 463 V/mm and the leakage current reaches the minimum value of 0.11 μA at the SiO2 content of 0.75mol%.

Effect of annealing treatment on the structural, optical, and electrical properties of Al-doped ZnO thin films

Highly conductive and transparent Al-doped ZnO （AZO） thin films were prepared from a zinc target containing Al （1.5 wt.%） by direct current （DC） and radio frequency （RF） reactive magnetron sputtering. The structural, optical, and electrical properties of AZO films as-deposited and submitted to annealing treatment （at 300 and 400℃, respectively） were characterized using various techniques. The experimental results show that the properties of AZO thin films can be further improved by annealing treatment. The crystallinity of ZnO films improves after annealing treatment. The transmittances of the AZO thin films prepared by DC and RF reactive magnetron sputtering are up to 80% and 85% in the visible region, respectively. The electrical resistivity of AZO thin films prepared by DC reactive magnetron sputtering can be as low as 8.06 x 10-4 Ωcm after annealing treatment. It was also found that AZO thin films prepared by RF reactive magnetron sputtering have better structural and optical properties than that prepared by DC reactive magnetron sputtering.

Microstructure and electrical properties of Y_2O_3-doped ZnO-based varistor ceramics prepared by high-energy ball milling

Y2O3-doped ZnO-based varistor ceramics were prepared using high-energy ball milling （HEBM） and low-temperature sin- tering technique, with voltage-gradient of 1934-2197 V/mm, non-linear coefficients of 20.8-21.8, leakage currents of 0.59-1.04 μA, and densities of 5.46-5.57 g/cm3. With increasing Y2O3 content, the voltage-gradient increases because of the decrease of ZnO grain size; the non-linear coefficient and the leakage current improve but the density decreases because of more porosity; the donor con- centration and density of interface states decrease, whereas the barrier height and width increase because of the acceptor effect of Y2O3 in varistor ceramics.

Effects of cooling rate on the microstructure and electrical properties of Dy_2O_3-doped ZnO-based varistor ceramics

The microstructure, electrical properties, and density of Dy2O3-doped ZnO-based varistor ceramics, prepared using high-energy ball milling （HEBM） and sintered at 800℃, were investigated by increasing the cooling rate in the order of H （slow cooling in furnace） → L （cooling in furnace） → K （cooling in air）. With the increase in cooling rate, the grain size and density decreased, the breakdown voltage （VImA/mm） increased, and the nonlinear coefficient （α） and leakage current （IL） exhibited extremum. The sample with the cooling type L showed the best properties with the breakdown voltage of 2650 V/ram, o：of 20.3, IL of 5.2 laA, and density of 5.42 g/cm^3. The barrier height （ФB）, donor concentration （Nd）, density of the interface states （Nd）, and barrier width （ω） all exhibited extremum during the alteration in cooling rate. The different relative amount of Bi-rich phase and its distribution as well as the characteristic parameters of grain boundary, resulting from the alteration of cooling rate, led to the changes in the properties of varistor ceramics.

Optical and electrical properties of TiO_2/Au/TiO_2 multilayer coatings in large area deposition at room temperature

TiO2/Au/TiO2 multilayer thin films were deposited at polymer substrate at room temperature using dc （direct current） magnetron sputtering method. By varying the thickness of each layer, the optical and electrical properties of the TiOz/Au/TiO2 multilayer films can be tailored to suit different applications. The thickness and optical properties of the Au layer and the quality of the Au-dielectric interfaces are critical for the electrical and optical performance of the Au-dielectric multilayer thin films. At the thickness of 8 rim, the Au layer forms a continuous structure having the lowest resistivity and it must be thin for high transmittance. The multilayer stack can be optimized to have a sheet resistance of 6 D./sq. at a transmittance over 80% at 680 nm in wavelength. The peak transmittance shifts towards the long wavelength region when the thickness of the two TiO2 （upper and lower） layers increases. When the film thickness of the two TiO2 film is 45 nm, a high transmittance value is obtained for the entire visible light wavelength region.

Effects of （LiCe） co-substitution on the structural and electrical properties of CaBi2Nb209 ceramics

The piezoelectric, dielectric, and ferroelectric properties of the （LiCe） co-substituted calcium bismuth niobate （CaBi2Nb209, CBNO） are investigated. The piezoelectric properties of CBNO ceramics are significantly enhanced and the dielectric loss tan 5 decreased. This makes poling using （LiCe） co-substitution easier. The ceramics （where represents A-site Ca2＋ vacancies, possess a pure layered structure phase and no other phases can be found. The Cao.ss（LiCe）0.04[]0.04Bi2Nb209 ceramics possess optimal piezoelectric properties, with piezoelectric coefficient （d33） and Curie temperature （Tc） found to be 13.3 pC/N and 960 ℃ respectively. The dielectric and piezoelectric properties of the （LiCe） co-substituted CBNO ceramics exhibit very stable temperature behaviours. This demonstrates that the CBNO ceramics are a promising candidate for ultrahigh temperature applications.

Electrical Properties of Expanded Graphite Intercalation Compounds

The intercalation compounds of CuCl2 were synthesized with expanded graphite, whose magnitude of the electrical conductivity is about 10(3)S(.)cm(-1). Their electrical conductivity is 3 similar to6 times as high as that of the expanded graphite, and about 10 times as high as that of GIC made of the non-expanded graphite. The microanalysis results of chemical compounds by X-ray energy spectrum scanning of TEM testified that the atomic ratio of chloride and cupric is nonstoichoimetric. The multivalence and exchange of electrovalence of the cupric ion was confirmed by the XPS-ESCA. Vacancy of chlorine anion increases the concentration of charge carrier. The special stage structure, made of graphite and chloride, produces a weak chemical bond belt and provides a carrier space in the direction of GIC layer. These factors develop the electrical properties.

Electrical properties of m×n cylindrical network

We consider the problem of electrical properties of an m×n cylindrical network with two arbitrary boundaries,which contains multiple topological network models such as the regular cylindrical network,cobweb network,globe network,and so on.We deduce three new and concise analytical formulae of potential and equivalent resistance for the complex network of cylinders by using the RT-V method(a recursion-transform method based on node potentials).To illustrate the multiplicity of the results we give a series of special cases.Interestingly,the results obtained from the resistance formulas of cobweb network and globe network obtained are different from the results of previous studies,which indicates that our research work creates new research ideas and techniques.As a byproduct of the study,a new mathematical identity is discovered in the comparative study.

Thermal stability and electrical properties of copper nitride with In or Ti

Thin films of ternary compounds CuxlnyN and CuxTiyN were grown by magnetron sputtering to improve the thermal stability of Cu3N, a material that decomposes below 300 ℃, and thus promises many interesting applications in directwriting. The effect of In or Ti incorporation in altering the structure and physical properties of copper nitride was evaluated by characterizing the film structure, surface morphology, and temperature dependence of electrical resistivity. More Ti than In can be accommodated by copper nitride without completely deteriorating the Cu3N lattice. A small amount of In or Ti can improve the crystallinity, and consequently the surface morphology. While the decomposition temperature is rarely influenced by In, the Ti-doped sample, Cu59.31Ti2.64N38.05, shows an X-ray diffraction pattern dominated by characteristic Cu3N peaks, even after annealing at 500 ℃. Both In and Ti reduce the bandgap of the original Cu3N phase, resulting in a smaller electrical resistivity at room temperature. The samples with more Ti content manifest metal-semiconductor transition when cooled from room temperature down to 50 K. These results can be useful in improving the applicability of copper-nitride-based thin films.

An Improvement in Electrical Properties of Asphalt Concrete

Materials such as Koch AH-70,basalt aggregate,limestone powder and graphite particles were used to prepare conductive asphalt concrete,which is a new type of multifunctional concrete.The mix proportion by weight was shown as follows.Fine aggregates (2.36-4.75 mm)∶fine aggregates (<2.36mm)∶limestone powder∶asphalt=120∶240∶14∶30.The content of added graphite particles ranged from 0% to 20%(by the weight of asphalt concrete).A conductive asphalt concrete with a resistivity around 10-10 3Ω·m was obtained.Special attention was paid to the effects of graphite content,graphite physical-chemical properties,asphalt content and temperature on the resistivity.Furthermore,an attempt was made to develop an electrically conductive model for asphalt concrete.

Effects of Si δ-Doping Condition and Growth Interruption on Electrical Properties of InP-Based High Electron Mobility Transistor Structures

The InGaAs/InAIAs/InP high electron mobility transistor （HEM：F） structures with lattice-matched and pseudo- morphic channels are grown by gas source molecular beam epitaxy. Effects of Si ^-doping condition and growth interruption on the electrical properties are investigated by changing the Si-cell temperature, doping time and growth process. It is found that the optimal Si ^-doping concentration （Nd） is about 5.0 x 1012 cm-2 and the use of growth interruption has a dramatic effect on the improvement of electrical properties. The material structure and crystal interface are analyzed by secondary ion mass spectroscopy and high resolution transmission elec- tron microscopy. An InGaAs/InAiAs/InP HEMT device with a gate length of lOOnm is fabricated. The device presents good pinch-off characteristics and the kink-effect of the device is trifling. In addition, the device exhibits fT = 249 GHa and fmax 〉 400 GHz.

Degradation behavior of electrical properties of GaInAs(1.0 eV)and GaInAs(0.7 eV)sub-cells of IMM4J solar cells under 1-MeV electron irradiation

In this work the degradation effects of the Ga_（0.7）In_（0.3）As（1.0 eV） and Ga_（0.42）In_（0.58）As（0.7 eV） sub-cells for IMM4J solar cells are investigated after 1-MeV electron irradiation by using spectral response and photoluminescence（PL） signal amplitude analysis, as well as electrical property measurements. The results show that, compared with the electrical properties of traditional single junction（SJ） GaAs（1.41 eV） solar cell, the electrical properties（such as Isc, Voc, and Pmax）of the newly sub-cells degrade similarly as a function of log ？, where ？ represents the electron fluence. It is found that the degradation of Voc is much more than that of Isc in the irradiated Ga_（0.42）In_（0.58）As（0.7 eV） cells due to the additional intrinsic layer, leading to more serious damage to the space charge region. However, of the three types of SJ cells with the gap widths of 0.7, 1.0, and 1.4 eV, the electric properties of the Ga_（0.7）In_（0.3）As（1.0 eV） cell decrease largest under each irradiation fluence. Analysis on the spectral response indicates that the Jsc of the Ga_（0.7）In_（0.3）As（1.0 eV） cell also shows the most severe damage. The PL amplitude measurements qualitatively confirm that the degradation of the effective minority carrier life-time（τeff） in the SJ Ga_（0.7）In_（0.3）As cells is more drastic than that of SJ GaAs cells during the irradiation. Thus,the output current of Ga_（0.7）In_（0.3）As sub-cell should be controlled in the irradiated IMM4J cells.

Lattice Effect on Magnetic and Electrical Properties of Ln_(2/3)Pb_(1/3)MnO_3(Ln=La,Pr,Nd)Films

Lattice effect on magnetic and electrical transport properties of Ln2/3Pb1/3MnO3 （Ln=La, Pr, Nd） films prepared by RF magnetron sputtering technique were investigated. With the decrease of the average ions radius 〈rA〉, the structure of Ln2/3Pb1/3MnO3 （Ln=La, Pr, Nd） targets transit from the rhombohedral phase to the orthorhombic phase, and the Curie temperature reduces rapidly with the decrease of 〈rA〉. The electrical properties show that films are the metallic state which can be fitted to the formula： ρ（T）=ρ0 ＋ ρ1T^2 ＋ ρ2T^4.5 at low temperatures. The temperature range of the ferromagnetic metallic state becomes narrow with the decrease of 〈rA〉. The phenomenon can be explained by the lattice effect.