a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radic...a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radicals in plasma originating from source gases dissociation are analyzed by relative irradiance measurement. The bonding configurations and binding state of a-C:F films are measured with Fourier-transformed infrared spectrometer (FTIR) and x-ray photoelectron spectroscopy (XPS). The results show that a-C:F films are mainly composed of CF radical at lower powers but of CF2 radical at higher powers. The deposition of films is related to the radicals generated in plasma and the main bonding configurations are dependent on the ratio of CF to CF2 radicals in films.展开更多
We propose a new path for preparing nanostructured carbon films(NCFs)by using electron cyclotron resonance(ECR)plasma sputtering with ion-electron hybrid irradiation for controlling the frictional behavior.The frictio...We propose a new path for preparing nanostructured carbon films(NCFs)by using electron cyclotron resonance(ECR)plasma sputtering with ion-electron hybrid irradiation for controlling the frictional behavior.The frictional behavior of the NCF was measured by using a pin-on-disk tribometer with a nanoprobe displacement sensor,and the transition curves of the friction coefficient and microdisplacement of the NCFs were examined.The friction mechanism was discussed by transmission electron microscopy(TEM)observation on the wear track.From the results,we found a new method to prepare NCFs,which has the potential to achieve low friction at the early stage of sliding contact.In addition,the technology of ECR plasma with ion-electron hybrid irradiation provides a new vision to rebuild a nanostructured surface from an original surface for controlling the frictional behavior.展开更多
文摘a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radicals in plasma originating from source gases dissociation are analyzed by relative irradiance measurement. The bonding configurations and binding state of a-C:F films are measured with Fourier-transformed infrared spectrometer (FTIR) and x-ray photoelectron spectroscopy (XPS). The results show that a-C:F films are mainly composed of CF radical at lower powers but of CF2 radical at higher powers. The deposition of films is related to the radicals generated in plasma and the main bonding configurations are dependent on the ratio of CF to CF2 radicals in films.
基金the National Nature Science Foundation of China under Nos.of 90923027 and 51175405.
文摘We propose a new path for preparing nanostructured carbon films(NCFs)by using electron cyclotron resonance(ECR)plasma sputtering with ion-electron hybrid irradiation for controlling the frictional behavior.The frictional behavior of the NCF was measured by using a pin-on-disk tribometer with a nanoprobe displacement sensor,and the transition curves of the friction coefficient and microdisplacement of the NCFs were examined.The friction mechanism was discussed by transmission electron microscopy(TEM)observation on the wear track.From the results,we found a new method to prepare NCFs,which has the potential to achieve low friction at the early stage of sliding contact.In addition,the technology of ECR plasma with ion-electron hybrid irradiation provides a new vision to rebuild a nanostructured surface from an original surface for controlling the frictional behavior.
