Lewis acidic 1-allyl-3-methylimidazolium chloroaluminate ionic liquids were used as promising elec-trolytes in the low-temperature electrodeposition of aluminium.Systematic studies on deposition process have been perf...Lewis acidic 1-allyl-3-methylimidazolium chloroaluminate ionic liquids were used as promising elec-trolytes in the low-temperature electrodeposition of aluminium.Systematic studies on deposition process have been performed by cyclic voltammetry and chronoamperometry.The surface morphology and X-ray diffraction(XRD) patterns of deposits prepared at different experimental conditions were also investigated.It was shown that the nu-cleation density and growth rate of crystallites had a great effect on the structure of aluminium deposited.The crys-tallographic orientation of deposits was mainly influenced by temperature and current density.Smooth,dense and well adherent aluminium coatings were obtained on copper substrates at 10-25 mA?cm?2 and 313.2-353.2 K.More-over,the current efficiency of deposition and purity of aluminium have been significantly improved,demonstrating that the ionic liquids tested have a prospectful potential in electroplating and electrorefining of aluminium.展开更多
研究了在水溶液和离子液体中分别电镀铜,探究了添加剂、电流密度、电镀时间对镀层的影响,并通过扫描电子显微镜、元素能谱分析以及循环伏安法对电镀其进行表征。结果表明,在水溶液中电镀铜的最佳工艺条件为:聚乙二醇和烷基酚聚氧乙烯醚...研究了在水溶液和离子液体中分别电镀铜,探究了添加剂、电流密度、电镀时间对镀层的影响,并通过扫描电子显微镜、元素能谱分析以及循环伏安法对电镀其进行表征。结果表明,在水溶液中电镀铜的最佳工艺条件为:聚乙二醇和烷基酚聚氧乙烯醚作为添加剂,电流密度30 m A/cm2,电镀时间60 min;在离子液体中电镀铜的最佳工艺条件为:聚乙二醇和烷基酚聚氧乙烯醚作为添加剂,电流密度30 m A/cm2,电镀时间50 min。通过比较发现,在离子液体中镀铜排除了氢干扰,比在水溶液中镀铜具有显著的优势。展开更多
基金Supported by the National Basic Research Program of China (2009CB219901)the National Key Technology Research and Development Program of the Ministry of Science and Technology of China (2012BAF03B01)+1 种基金the National Natural Science Foundation of China (20906096,20873152)the Open-end Fund of State Key Laboratory of Multiphase Complex Systems (MPCS-2011-D-06)
文摘Lewis acidic 1-allyl-3-methylimidazolium chloroaluminate ionic liquids were used as promising elec-trolytes in the low-temperature electrodeposition of aluminium.Systematic studies on deposition process have been performed by cyclic voltammetry and chronoamperometry.The surface morphology and X-ray diffraction(XRD) patterns of deposits prepared at different experimental conditions were also investigated.It was shown that the nu-cleation density and growth rate of crystallites had a great effect on the structure of aluminium deposited.The crys-tallographic orientation of deposits was mainly influenced by temperature and current density.Smooth,dense and well adherent aluminium coatings were obtained on copper substrates at 10-25 mA?cm?2 and 313.2-353.2 K.More-over,the current efficiency of deposition and purity of aluminium have been significantly improved,demonstrating that the ionic liquids tested have a prospectful potential in electroplating and electrorefining of aluminium.
文摘研究了在水溶液和离子液体中分别电镀铜,探究了添加剂、电流密度、电镀时间对镀层的影响,并通过扫描电子显微镜、元素能谱分析以及循环伏安法对电镀其进行表征。结果表明,在水溶液中电镀铜的最佳工艺条件为:聚乙二醇和烷基酚聚氧乙烯醚作为添加剂,电流密度30 m A/cm2,电镀时间60 min;在离子液体中电镀铜的最佳工艺条件为:聚乙二醇和烷基酚聚氧乙烯醚作为添加剂,电流密度30 m A/cm2,电镀时间50 min。通过比较发现,在离子液体中镀铜排除了氢干扰,比在水溶液中镀铜具有显著的优势。
