In this work, the influence of discharge modes on the excimer XeCl emission (308 nm) has been studied by adding helium gas into the xenon and chlorine mixture. It is found that the transition from filament discharge t...In this work, the influence of discharge modes on the excimer XeCl emission (308 nm) has been studied by adding helium gas into the xenon and chlorine mixture. It is found that the transition from filament discharge to glow /filament - combined discharge leads to the decrease in excimer emission. We are the first one to use a flowing water film as an outer transparent electrode, and achieve a higher UV intensity, compared with the case by using a metal mesh as the outer electrode. The influence of the gas temperature both in the reactor Tg and in a discharge channel Tc on the excimer emission has been analyzed preliminarily. Finally, it has been expected that the replacement of chlorine gas Cl2 by another chlorine gas may reduce the heat generated in the discharge processes and give rise to the excimer XeCl* radiation.展开更多
文摘In this work, the influence of discharge modes on the excimer XeCl emission (308 nm) has been studied by adding helium gas into the xenon and chlorine mixture. It is found that the transition from filament discharge to glow /filament - combined discharge leads to the decrease in excimer emission. We are the first one to use a flowing water film as an outer transparent electrode, and achieve a higher UV intensity, compared with the case by using a metal mesh as the outer electrode. The influence of the gas temperature both in the reactor Tg and in a discharge channel Tc on the excimer emission has been analyzed preliminarily. Finally, it has been expected that the replacement of chlorine gas Cl2 by another chlorine gas may reduce the heat generated in the discharge processes and give rise to the excimer XeCl* radiation.
