In this paper,a lifted Haar transform(LHT)image compression optical chip has been researched to achieve rapid image compression.The chip comprises 32 same image compression optical circuits,and each circuit contains a...In this paper,a lifted Haar transform(LHT)image compression optical chip has been researched to achieve rapid image compression.The chip comprises 32 same image compression optical circuits,and each circuit contains a 2×2 multimode interference(MMI)coupler and aπ/2 delay line phase shifter as the key components.The chip uses highly borosilicate glass as the substrate,Su8 negative photoresist as the core layer,and air as the cladding layer.Its horizontal and longitudinal dimensions are 8011μm×10000μm.Simulation results present that the designed optical circuit has a coupling ratio(CR)of 0:100 and an insertion loss(IL)of 0.001548 d B.Then the chip is fabricated by femtosecond laser and testing results illustrate that the chip has a CR of 6:94 and an IL of 0.518 d B.So,the prepared chip possesses good image compression performance.展开更多
To simultaneously obtain high-resolution multi-wavelength (from visible to near infrared) tomographic images of the solar atmosphere, a high-performance multi-wavelength optical filter has to be used in solar imagin...To simultaneously obtain high-resolution multi-wavelength (from visible to near infrared) tomographic images of the solar atmosphere, a high-performance multi-wavelength optical filter has to be used in solar imaging telescopes. In this Letter, the fabrication of the multi-wavelength filter for solar tomographic imaging is described in detail. For this filter, Ta2O5 and SiO2 are used as high- and low-index materials, respectively, and the multilayer structure is optimized by commercial Optilayer software at a 7.5° angle of incidence. Experimentally, this multi-wavelength optical filter is prepared by a plasma ion-assisted deposition technique with optimized deposition parameters. High transmittance at 393.3, 396.8, 430.5, 525, 532.4, 656.8, 705.8, 854.2, 1083, and 1565.3 nm, as well as high reflectance at 500 and 589 nm are achieved. Excellent environmental durability, demonstrated via temperature and humidity tests, is also established.展开更多
基金the Natural Science Foundation of Hubei Province(No.2017CFB685)Hubei University of Technology"Advanced Manufacturing Technology and Equipment"Collaborative Innovation Center Open Research Fund(Nos.038/1201501 and 038/1201803)the College-level Project of Hubei University of Technology(Nos.4201/01758,4201/01802,4201/01889,and 4128/21025)。
文摘In this paper,a lifted Haar transform(LHT)image compression optical chip has been researched to achieve rapid image compression.The chip comprises 32 same image compression optical circuits,and each circuit contains a 2×2 multimode interference(MMI)coupler and aπ/2 delay line phase shifter as the key components.The chip uses highly borosilicate glass as the substrate,Su8 negative photoresist as the core layer,and air as the cladding layer.Its horizontal and longitudinal dimensions are 8011μm×10000μm.Simulation results present that the designed optical circuit has a coupling ratio(CR)of 0:100 and an insertion loss(IL)of 0.001548 d B.Then the chip is fabricated by femtosecond laser and testing results illustrate that the chip has a CR of 6:94 and an IL of 0.518 d B.So,the prepared chip possesses good image compression performance.
基金partially supported by the West Light Foundation of the Chinese Academy of Sciences
文摘To simultaneously obtain high-resolution multi-wavelength (from visible to near infrared) tomographic images of the solar atmosphere, a high-performance multi-wavelength optical filter has to be used in solar imaging telescopes. In this Letter, the fabrication of the multi-wavelength filter for solar tomographic imaging is described in detail. For this filter, Ta2O5 and SiO2 are used as high- and low-index materials, respectively, and the multilayer structure is optimized by commercial Optilayer software at a 7.5° angle of incidence. Experimentally, this multi-wavelength optical filter is prepared by a plasma ion-assisted deposition technique with optimized deposition parameters. High transmittance at 393.3, 396.8, 430.5, 525, 532.4, 656.8, 705.8, 854.2, 1083, and 1565.3 nm, as well as high reflectance at 500 and 589 nm are achieved. Excellent environmental durability, demonstrated via temperature and humidity tests, is also established.