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On the English Translations of “姐姐”(“jiejie”)and “妹妹”(“meimei”)Fictive Terms of Address in Honglou Meng
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作者 高洁 《海外英语》 2017年第22期154-158,共5页
Based on a thorough case study of Yang's and Hawks' translations of the fictive kinship terms of address"姐姐/妹妹"in Honglou Meng, this paper analyzes the cultural and contextual connotations of the... Based on a thorough case study of Yang's and Hawks' translations of the fictive kinship terms of address"姐姐/妹妹"in Honglou Meng, this paper analyzes the cultural and contextual connotations of the terms in the original, discusses comparatively the misinterpretations of the translations from target readers and explores the cultural orientations and translation strategies of the two versions, proposing that in translating these cultural-and-contextual-bound terms, translators should be bi-culturally conscious and take into account target readers' interpretation as well as make cultural compensations so as to bring out the exact people relations and retain contextual and cultural connotations. 展开更多
关键词 fictive terms of address Honglou Meng cultural misinterpretation cultural orientation
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Influence of Annealing on the Structure of Silica Glass
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作者 苏英 YIN Hong +1 位作者 HE Xingyang 周永恒 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2013年第5期902-906,共5页
Two types of high-purity synthetic silica glasses were annealed with different processes in precision annealing furnace. The thermal stress and structure of samples were analyzed by two types of stress instruments and... Two types of high-purity synthetic silica glasses were annealed with different processes in precision annealing furnace. The thermal stress and structure of samples were analyzed by two types of stress instruments and Fourier transform infrared spectrometer. After being annealed at1 070 ℃ for 6 days and then cooled slowly, optical path difference (OPD) caused by stress in the center and edge of Type III silica glass with a diameter of 150 mm and thickness of 50 mm decreased from 6 to 2 nm/cm. Meanwhile, with the same annealing process, fictive temperature of small-size Type III glass decreased to 939 ℃, and structural stability of silica glass was improved. In addition, after being annealed at 1 100 ℃ for 5 hours and then cooled slowly, internal stress in Type IV silica glass with a thickness of 1 mm was basically eliminated, and its fietive temperature decreased from 1 421 to 966 ℃. 展开更多
关键词 silica glass ANNEALING thermal stress fictive temperature
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Difference in Structural Relaxation Times of Inner Surface and Inner Bulk Region of Silica Glass Arc Tube
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作者 Takuya Honma Nobuhiro Tamura +1 位作者 Kazuya Saito Edson Sekiya 《New Journal of Glass and Ceramics》 2013年第1期48-52,共5页
The fictive temperature and structural relaxation of a silica glass arc tube were investigated to elucidate the origin of cracking in the arc tubes used in high-intensity discharge lamps for vacuum ultraviolet light s... The fictive temperature and structural relaxation of a silica glass arc tube were investigated to elucidate the origin of cracking in the arc tubes used in high-intensity discharge lamps for vacuum ultraviolet light sources. The structural relaxation time near the inner surface was decreased much more than that in the inner bulk region, resulting in a large difference in the fictive temperature between these two areas at high-intensity discharge lamp operating temperatures. This difference should induce strain in the silica glass network. On the basis of our results, we suggest ways to avoid cracking and extend the lifetime of high-intensity discharge lamps. 展开更多
关键词 STRUCTURAL RELAXATION Time Fictive Temperature High-Intensity DISCHARGE LAMPS
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Cooling rate calibration and mapping of ultra-short pulsed laser modifications in fused silica by Raman and Brillouin spectroscopy
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作者 Michael Bergler Kristian Cvecek +3 位作者 Ferdinand Werr Martin Brehl Dominique De Ligny Michael Schmidt 《International Journal of Extreme Manufacturing》 2020年第3期161-172,共12页
This paper focuses on the preparation of a new extended set of calibrations of cooling rate(fictive temperature)in fused silica determined by inelastic light scattering and its subsequent use to characterize the local... This paper focuses on the preparation of a new extended set of calibrations of cooling rate(fictive temperature)in fused silica determined by inelastic light scattering and its subsequent use to characterize the local cooling rate distribution in ultra-short pulsed(USP)laser modification.In order to determine the thermal history(e.g.cooling rate and fictive temperature)of fused silica,high-resolution inelastic light-scattering experiments(Raman and Brillouin spectroscopy)were investigated.Calibrations were performed and compared to the existing literature to quantify structural changes due to a change of fictive temperature.Compared to existing calibrations,this paper provides an extension to lower and higher cooling rates.Using this new set of calibrations,we characterized a USP laser modification in fused silica and calculated the local fictive temperature distribution.An equation relating the fictive temperature(Tf)to cooling rates is given.A maximum cooling rate of 3000 K min-1 in the glass transition region around 1200℃ was deduced from the Raman analysis.The Brillouin observations are sensitive to both the thermal history and the residual stress.By comparing the Raman and Brillouin observations,we extracted the local residual stress distribution with high spatial resolution.For the first time,combined Raman and Brillouin inelastic light scattering experiments show the local distribution of cooling rates and residual stresses(detailed behavior of the glass structure)in the interior and the surrounding of an USP laser modified zone. 展开更多
关键词 glass structure ultra-short pulsed laser fused silica cooling rate fictive temperature Raman spectroscopy Brillouin spectroscopy
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