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MHD Stability Analysis and Flow Controls of Liquid Metal Free Surface Film Flows as Fusion Reactor PFCs 被引量:1
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作者 张秀杰 潘传杰 许增裕 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第12期1204-1214,共11页
Numerical and experimental investigation results on the magnetohydrodynamics(MHD) film flows along flat and curved bottom surfaces are summarized in this study. A simplified modeling has been developed to study the ... Numerical and experimental investigation results on the magnetohydrodynamics(MHD) film flows along flat and curved bottom surfaces are summarized in this study. A simplified modeling has been developed to study the liquid metal MHD film state, which has been validated by the existing experimental results. Numerical results on how the inlet velocity(V), the chute width(W) and the inlet film thickness(d0) affect the MHD film flow state are obtained. MHD stability analysis results are also provided in this study. The results show that strong magnetic fields make the stable V decrease several times compared to the case with no magnetic field,especially small radial magnetic fields(Bn) will have a significant impact on the MHD film flow state. Based on the above numerical and MHD stability analysis results flow control methods are proposed for flat and curved MHD film flows. For curved film flow we firstly proposed a new multi-layers MHD film flow system with a solid metal mesh to get the stable MHD film flows along the curved bottom surface. Experiments on flat and curved MHD film flows are also carried out and some firstly observed results are achieved. 展开更多
关键词 liquid metal MHD stability flow control film flows magnetic fusion reactor
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Image lithography in telluride suboxide thin film through controlling “virtual” bandgap 被引量:1
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作者 Tao Wei Jingsong Wei +1 位作者 Kui Zhang Long Zhang 《Photonics Research》 SCIE EI 2017年第1期22-26,共5页
In this work, TeO_(0.7)thin films were prepared by the reactive magnetron-controlling sputtering method. Complex gray-scale patterns were successfully fabricated on TeO_(0.7)thin films through the laser direct writing... In this work, TeO_(0.7)thin films were prepared by the reactive magnetron-controlling sputtering method. Complex gray-scale patterns were successfully fabricated on TeO_(0.7)thin films through the laser direct writing method.The structural origin of TeO_(0.7)thin film was investigated for gray-scale pattern formation. It is found that multiple gray-scale levels are dependent on the "virtual" bandgap energy of TeO_(0.7)thin films. The bandgap energy changes lead to refractive index and reflectivity difference. Thus, gray-scale tones can be formed. By accurately controlling laser energy, various "virtual" bandgaps can be generated in TeO_(0.7)thin films, and colorful gray-scale levels can be formed. Experimental results indicate that TeO_(0.7)thin film can be used as micro/nano image writing material. 展开更多
关键词 Te Image lithography in telluride suboxide thin film through controlling bandgap VIRTUAL
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An in situ growth method for property control of LPCVD polysilicon film 被引量:1
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作者 余洪斌 陈海清 +1 位作者 李俊 汪超 《Chinese Optics Letters》 SCIE EI CAS CSCD 2004年第8期489-492,共4页
Polysilicon films deposited by low-pressure chemical vapor deposition (LPCVD) exhibit large residual stress and stress gradient, depending on the deposition condition. An in situ growth method based on multilayer conc... Polysilicon films deposited by low-pressure chemical vapor deposition (LPCVD) exhibit large residual stress and stress gradient, depending on the deposition condition. An in situ growth method based on multilayer concept is presented to control the property for as-deposited polysilicon. A 3-μm thick polysilicon film with nine layers structure is demonstrated under the detailed analysis of multi-layer theory and material characteristic of polysilicon. The results show that a 3-μm-thick polysilicon film with 8-MPa overall residual tensile stress and 2.125-MPa/μm stress gradient through the film thickness is fabricated successfully. 展开更多
关键词 LPCVD An in situ growth method for property control of LPCVD polysilicon film
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Vapour-diffusion assisted growth of oriented α-cobalt hydroxide thin films 被引量:1
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作者 Dermot O’Hare 《Particuology》 SCIE EI CAS CSCD 2010年第3期188-191,共4页
Layered α-cobalt hydroxides Co(OH1.65 Cl0.35.0.5H2O (1), Co(OH)1.75(NO3)0.25.0.1H2O(2) with unique macro- and microscale morphologies have been synthesised by a low temperature, ammonia-controlled vapour-dif... Layered α-cobalt hydroxides Co(OH1.65 Cl0.35.0.5H2O (1), Co(OH)1.75(NO3)0.25.0.1H2O(2) with unique macro- and microscale morphologies have been synthesised by a low temperature, ammonia-controlled vapour-diffusion method. The materials have thin film morphologies and were characterized by X-ray powder diffraction (XRD) and field emission scanning electron microscopy (FESEM). 展开更多
关键词 Thin films Cobalt hydroxide Hydrotalcite Morphology control
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