Filtered cathodic vacuum arc(FCVA)deposition is regarded as an important technique for the synthesis of tetrahedral amorphous carbon(ta-C)films due to its high ionization rate,high deposition rate and effective filtra...Filtered cathodic vacuum arc(FCVA)deposition is regarded as an important technique for the synthesis of tetrahedral amorphous carbon(ta-C)films due to its high ionization rate,high deposition rate and effective filtration of macroparticles.Probing the plasma characteristics of arc discharge contributes to understanding the deposition mechanism of ta-C films on a microscopic level.This work focuses on the plasma diagnosis of an FCVA discharge using a Langmuir dualprobe system with a discrete Fourier transform smoothing method.During the ta-C film deposition,the arc current of graphite cathodes and deposition pressure vary from 30 to 90 A and from 0.3 to 0.9 Pa,respectively.The plasma density increases with arc current but decreases with pressure.The carbon plasma density generated by the arc discharge is around the order of10^(10)cm^(-3).The electron temperature varies in the range of 2-3.5 eV.As the number of cathodic arc sources and the current of the focused magnetic coil increase,the plasma density increases.The ratio of the intensity of the D-Raman peak and G-Raman peak(I_(D)/I_(G))of the ta-C films increases with increasing plasma density,resulting in a decrease in film hardness.It is indicated that the mechanical properties of ta-C films depend not only on the ion energy but also on the carbon plasma density.展开更多
For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular be...For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular beam epitaxy till now which limited there application in low temperature device process.In the article,the microstructure,optical and electrical of BTO and In_(2)O_(3) mixed transparent conductive BaInSnO_(x)(BITO)film deposited by filtered cathodic vacuum arc technique(FCVA)on glass substrate at room temperature were firstly reported.The BITO film with thickness of 300 nm had mainly In_(2)O_(3) polycrystalline phase,and minor polycrystalline BTO phase with(001),(011),(111),(002),(222)crystal faces which were first deposited at room temperature on amorphous glass.The transmittance was 70%–80%in the visible light region with linear refractive index of 1.94 and extinction coefficient of 0.004 at 550-nm wavelength.The basic optical properties included the real and imaginary parts,high frequency dielectric constants,the absorption coefficient,the Urbach energy,the indirect and direct band gaps,the oscillator and dispersion energies,the static refractive index and dielectric constant,the average oscillator wavelength,oscillator length strength,the linear and the third-order nonlinear optical susceptibilities,and the nonlinear refractive index were all calculated.The film was the n-type conductor with sheet resistance of 704.7Ω/□,resistivity of 0.02Ω⋅cm,mobility of 18.9 cm2/V⋅s,and carrier electron concentration of 1.6×10^(19) cm^(−3) at room temperature.The results suggested that the BITO film deposited by FCVA had potential application in transparent conductive films-based low temperature device process.展开更多
The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and m...The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and make the deposition proces s at ambient temperature. In this work, high quality TiN thin films were deposi ted on silicon substrates at low temperature using the improved filtered cathodi c arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the T iN thin films. The effects of the negative substrate bias on the grain size, pre ferred crystalline orientation, surface roughness of TiN thin films were discuss ed.展开更多
In this study two types of TIN films were prepared, one using the filtered cathodic arc plasma (FCAP) technique with an in-plane "S" triter, and the other using the multi-arc ion-plating (MAIP), and both deposit...In this study two types of TIN films were prepared, one using the filtered cathodic arc plasma (FCAP) technique with an in-plane "S" triter, and the other using the multi-arc ion-plating (MAIP), and both deposited under the same parameters. Comparisons of the texture, hardness, roughness, tribological and electrochemical corrosion behaviors of the two types of TiN films were given. The TiN films obtained by the FCAP technology were found to be highly uniform, smooth and macroparticle-free. The TiN films deposited by FCAP had a (111) preferred orientation, while there was no texture in the films deposited by MAIP. Under low load the two kinds of TiN coatings had very different wear mechanisms; the films of FCAP had a lower wear rate and friction coefficient compared with the TiN films deposited by the MAIP technique. The dense and hole-free structure of TiN films of FCAP could effectively avoid the avalanche of TiN films from the substrate during corrosion tests.展开更多
Direct current metal filtered cathodic vacuum arc (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylen...Direct current metal filtered cathodic vacuum arc (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylene gas on the microstructure and mechanical properties of the films were investigated. The results show that the phase of TiC in the (111) preferential crystallographic orientation exists in the film,and the main existing pattern of carbon is sp2. With increasing the acetylene flow rate,the contents of Ti and TiC phase of the film gradually reduce; however,the thickness of the film increases. When the substrate bias voltage reaches -600 V,the internal stress of the film reaches 1.6 GPa. The micro-hardness and elastic modulus of the film can reach 33.9 and 237.6 GPa,respectively,and the friction coefficient of the film is 0.25.展开更多
TiAIN]Cu nanocomposite coatings with Cu concentration of 0-1.4 at.% were deposited on the high- speed steel (HSS) substrates by filtered cathodic arc ion plating technique. The chemical composition, microstructure, ...TiAIN]Cu nanocomposite coatings with Cu concentration of 0-1.4 at.% were deposited on the high- speed steel (HSS) substrates by filtered cathodic arc ion plating technique. The chemical composition, microstructure, morphology, adhesion strength, mechanical and tribological properties of the TiAIN/Cu coatings were characterized and analyzed. The results reveal that the coating structure and properties depend on not only the Cu concentration, hut also the deposition condition. The addition of Cu significantly decreases the grain size and weakens the texture in the TiAlN/Cu coatings. With increasing the Cu concentration, the coating hardness decreases slightly from 30.7 GPa of the pure TiAlN coating to 28.5 GPa of the TiAlN/Cu coating with 1.4 at,% Cu. All the TiAlN/Cu coatings present sufficient adhesion strength. In addition, the existing state of additive Cu in the TiAlN/Cu coatings is also investigated.展开更多
Objective The high energy ion bombardment technique is applied to enhancing the adhesion of the tetrahedral amorphous carbon (TAC) films deposited by the filtered cathode vacuum arc (FCVA). Methods The abrasion method...Objective The high energy ion bombardment technique is applied to enhancing the adhesion of the tetrahedral amorphous carbon (TAC) films deposited by the filtered cathode vacuum arc (FCVA). Methods The abrasion method, scratch method, heating and shaking method as well as boiling salt solution method is used to test the adhesion of the TAC films on various material substrates. Results The test results show that the adhesion is increased as the ion bombardment energy increases. However, if the bombardment energy were over the corresponding optimum value, the adhesion would be enhanced very slowly for the harder material substrates and drops quickly, for the softer ones. Conclusion The optimum values of the ion bombardment energy are larger for the harder materials than that for the softer ones.展开更多
Tetrahedral amorphous carbon(ta‐C)has emerged as an excellent coating material for improving the reliability of application components under high normal loads.Herein,we present the results of our investigations regar...Tetrahedral amorphous carbon(ta‐C)has emerged as an excellent coating material for improving the reliability of application components under high normal loads.Herein,we present the results of our investigations regarding the mechanical and tribological properties of a 2‐μm‐thick multilayer ta‐C coating on high‐speed steel substrates.Multilayers composed of alternating soft and hard layers are fabricated using filtered a cathodic vacuum arc with alternating substrate bias voltages(0 and 100 V or 0 and 150 V).The thickness ratio is discovered to be 1:3 for the sp2‐rich and sp3‐rich layers.The results show that the hardness and elastic modulus of the multilayer ta‐C coatings increase with the sp3 content of the hard layer.The hardness reached approximately 37 GPa,whereas an improved toughness and a higher adhesion strength(>29 N)are obtained.The friction performance(μ=0.07)of the multilayer coating is similar to that of the single layer ta‐C thick coating,but the wear rate(0.13×10^(–6) mm^(3)/(N∙m))improved under a high load of 30 N.We further demonstrate the importance of the multilayer structure in suppressing crack propagation and increasing the resistance to plastic deformation(H3/E2)ratio.展开更多
基金supported by the National Key Research and Development Program of China(No.2016YFB0101206)the Science and Technology Program of Wuhu(No.2021hg11)the Natural Science Foundation of the Anhui Higher Education in Institutions of China(No.2022AH050300)。
文摘Filtered cathodic vacuum arc(FCVA)deposition is regarded as an important technique for the synthesis of tetrahedral amorphous carbon(ta-C)films due to its high ionization rate,high deposition rate and effective filtration of macroparticles.Probing the plasma characteristics of arc discharge contributes to understanding the deposition mechanism of ta-C films on a microscopic level.This work focuses on the plasma diagnosis of an FCVA discharge using a Langmuir dualprobe system with a discrete Fourier transform smoothing method.During the ta-C film deposition,the arc current of graphite cathodes and deposition pressure vary from 30 to 90 A and from 0.3 to 0.9 Pa,respectively.The plasma density increases with arc current but decreases with pressure.The carbon plasma density generated by the arc discharge is around the order of10^(10)cm^(-3).The electron temperature varies in the range of 2-3.5 eV.As the number of cathodic arc sources and the current of the focused magnetic coil increase,the plasma density increases.The ratio of the intensity of the D-Raman peak and G-Raman peak(I_(D)/I_(G))of the ta-C films increases with increasing plasma density,resulting in a decrease in film hardness.It is indicated that the mechanical properties of ta-C films depend not only on the ion energy but also on the carbon plasma density.
基金Project supported by the Enterprise Science and Technology Correspondent for Guangdong Province,China (Grant No.GDKTP2021015200)。
文摘For the crystalline temperature of BaSnO_(3)(BTO)was above 650℃,the transparent conductive BTO-based films were always deposited above this temperature on epitaxy substrates by pulsed laser deposition or molecular beam epitaxy till now which limited there application in low temperature device process.In the article,the microstructure,optical and electrical of BTO and In_(2)O_(3) mixed transparent conductive BaInSnO_(x)(BITO)film deposited by filtered cathodic vacuum arc technique(FCVA)on glass substrate at room temperature were firstly reported.The BITO film with thickness of 300 nm had mainly In_(2)O_(3) polycrystalline phase,and minor polycrystalline BTO phase with(001),(011),(111),(002),(222)crystal faces which were first deposited at room temperature on amorphous glass.The transmittance was 70%–80%in the visible light region with linear refractive index of 1.94 and extinction coefficient of 0.004 at 550-nm wavelength.The basic optical properties included the real and imaginary parts,high frequency dielectric constants,the absorption coefficient,the Urbach energy,the indirect and direct band gaps,the oscillator and dispersion energies,the static refractive index and dielectric constant,the average oscillator wavelength,oscillator length strength,the linear and the third-order nonlinear optical susceptibilities,and the nonlinear refractive index were all calculated.The film was the n-type conductor with sheet resistance of 704.7Ω/□,resistivity of 0.02Ω⋅cm,mobility of 18.9 cm2/V⋅s,and carrier electron concentration of 1.6×10^(19) cm^(−3) at room temperature.The results suggested that the BITO film deposited by FCVA had potential application in transparent conductive films-based low temperature device process.
基金This work was supported by the National Natural Science Foundation of China(No.10074022)the Excellent Young Teachers Prograom of MOE,China.
文摘The filtered cathodic vacuum-arc (FCVA) technique is a supplementary and alterna tive technique with respect to convendtional physical and chemical vapour deposi tion which can remove macro-particles effectively and make the deposition proces s at ambient temperature. In this work, high quality TiN thin films were deposi ted on silicon substrates at low temperature using the improved filtered cathodi c arc plasma (FCAP) technique. AFM, XRD, TEM were employed to characterize the T iN thin films. The effects of the negative substrate bias on the grain size, pre ferred crystalline orientation, surface roughness of TiN thin films were discuss ed.
基金the National Natural Science Foundation of China (No. 20571042)the Natural Science Foundation of the Education Department of Henan Province, China (No. 2007430001)the Natural Science Foundation of Henna University (No. 06YBZR008).
文摘In this study two types of TIN films were prepared, one using the filtered cathodic arc plasma (FCAP) technique with an in-plane "S" triter, and the other using the multi-arc ion-plating (MAIP), and both deposited under the same parameters. Comparisons of the texture, hardness, roughness, tribological and electrochemical corrosion behaviors of the two types of TiN films were given. The TiN films obtained by the FCAP technology were found to be highly uniform, smooth and macroparticle-free. The TiN films deposited by FCAP had a (111) preferred orientation, while there was no texture in the films deposited by MAIP. Under low load the two kinds of TiN coatings had very different wear mechanisms; the films of FCAP had a lower wear rate and friction coefficient compared with the TiN films deposited by the MAIP technique. The dense and hole-free structure of TiN films of FCAP could effectively avoid the avalanche of TiN films from the substrate during corrosion tests.
文摘Direct current metal filtered cathodic vacuum arc (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylene gas on the microstructure and mechanical properties of the films were investigated. The results show that the phase of TiC in the (111) preferential crystallographic orientation exists in the film,and the main existing pattern of carbon is sp2. With increasing the acetylene flow rate,the contents of Ti and TiC phase of the film gradually reduce; however,the thickness of the film increases. When the substrate bias voltage reaches -600 V,the internal stress of the film reaches 1.6 GPa. The micro-hardness and elastic modulus of the film can reach 33.9 and 237.6 GPa,respectively,and the friction coefficient of the film is 0.25.
基金supported by the National Key Basic Research Program of China(“973”Program,No.2012CB625100)the Natural Science Foundation of Liaoning Province(No.2013020093)
文摘TiAIN]Cu nanocomposite coatings with Cu concentration of 0-1.4 at.% were deposited on the high- speed steel (HSS) substrates by filtered cathodic arc ion plating technique. The chemical composition, microstructure, morphology, adhesion strength, mechanical and tribological properties of the TiAIN/Cu coatings were characterized and analyzed. The results reveal that the coating structure and properties depend on not only the Cu concentration, hut also the deposition condition. The addition of Cu significantly decreases the grain size and weakens the texture in the TiAlN/Cu coatings. With increasing the Cu concentration, the coating hardness decreases slightly from 30.7 GPa of the pure TiAlN coating to 28.5 GPa of the TiAlN/Cu coating with 1.4 at,% Cu. All the TiAlN/Cu coatings present sufficient adhesion strength. In addition, the existing state of additive Cu in the TiAlN/Cu coatings is also investigated.
文摘Objective The high energy ion bombardment technique is applied to enhancing the adhesion of the tetrahedral amorphous carbon (TAC) films deposited by the filtered cathode vacuum arc (FCVA). Methods The abrasion method, scratch method, heating and shaking method as well as boiling salt solution method is used to test the adhesion of the TAC films on various material substrates. Results The test results show that the adhesion is increased as the ion bombardment energy increases. However, if the bombardment energy were over the corresponding optimum value, the adhesion would be enhanced very slowly for the harder material substrates and drops quickly, for the softer ones. Conclusion The optimum values of the ion bombardment energy are larger for the harder materials than that for the softer ones.
基金This work was supported by the Fundamental Research Program of the Korea Institute of Materials Science(KIMS/PNK7000)the Fundamental R&D Program of the Ministry of Science,Information&Communication Technology(ICT)Future Planning in Republic of Korea.
文摘Tetrahedral amorphous carbon(ta‐C)has emerged as an excellent coating material for improving the reliability of application components under high normal loads.Herein,we present the results of our investigations regarding the mechanical and tribological properties of a 2‐μm‐thick multilayer ta‐C coating on high‐speed steel substrates.Multilayers composed of alternating soft and hard layers are fabricated using filtered a cathodic vacuum arc with alternating substrate bias voltages(0 and 100 V or 0 and 150 V).The thickness ratio is discovered to be 1:3 for the sp2‐rich and sp3‐rich layers.The results show that the hardness and elastic modulus of the multilayer ta‐C coatings increase with the sp3 content of the hard layer.The hardness reached approximately 37 GPa,whereas an improved toughness and a higher adhesion strength(>29 N)are obtained.The friction performance(μ=0.07)of the multilayer coating is similar to that of the single layer ta‐C thick coating,but the wear rate(0.13×10^(–6) mm^(3)/(N∙m))improved under a high load of 30 N.We further demonstrate the importance of the multilayer structure in suppressing crack propagation and increasing the resistance to plastic deformation(H3/E2)ratio.