Adaptive Output Regulation of a Class of Nonlinear Output Feedback Systems With Unknown High Frequency Gain

This paper presents an output feedback design approach based on the adaptive control scheme developed for nonlinearly parameterized systems,to achieve global output regulation for a class of nonlinear systems in output feedback form.We solve the output regulation problem without the knowledge of the sign and the value of the high frequency gain a priori.It is not necessary to have both the limiting assumptions that the exogenous signal co and the unknown parameter ju belong to a prior known compact set and the high frequency gain has a determinate lower and upper bounds.The effectiveness of the proposed algorithm is shown with the help of an example.

Physical modeling of direct current and radio frequency characteristics for In P-based InAlAs/InGaAs HEMTs

Direct current（DC） and radio frequency（RF） performances of InP-based high electron mobility transistors（HEMTs）are investigated by Sentaurus TCAD. The physical models including hydrodynamic transport model, Shockley–Read–Hall recombination, Auger recombination, radiative recombination, density gradient model and high field-dependent mobility are used to characterize the devices. The simulated results and measured results about DC and RF performances are compared, showing that they are well matched. However, the slight differences in channel current and pinch-off voltage may be accounted for by the surface defects resulting from oxidized InAlAs material in the gate-recess region. Moreover,the simulated frequency characteristics can be extrapolated beyond the test equipment limitation of 40 GHz, which gives a more accurate maximum oscillation frequency( f;) of 385 GHz.

Device research on GaAs-based InAlAs/InGaAs metamorphic high electron mobility transistors grown by metal organic chemical vapour deposition

This paper applies a novel quad-layer resist and e-beam lithography technique to fabricate a GaAs-based InAlAs/InGaAs metamorphic high electron mobility transistor （HEMT） grown by metal organic chemical vapour deposition （MOCVD）. The gate length of the metamorphic HEMT was 150 nm, the maximum current density was 330 mA/mm, the maximum transconductanee was 470 mS/mm, the threshold voltage was -0.6 V, and the maximum current gain cut-off frequency and maximum oscillation frequency were 102 GHz and 450 GHz, respectively. This is the first report on tri-termination devices whose frequency value is above 400 GHz in China. The excellent frequency performances promise the possibility of metamorphic HEMTs grown by MOCVD for millimetre-wave applications, and more outstanding device performances would be obtained after optimizing the material structure, the elaborate T-gate and other device processes further.

Impact of symmetric gate-recess length on the DC and RF characteristics of InP HEMTs

We fabricated a set of symmetric gate-recess devices with gate length of 70 nm.We kept the source-to-drain spacing(L_(SD))unchanged,and obtained a group of devices with gate-recess length(L_(recess))from 0.4µm to 0.8µm through process improvement.In order to suppress the influence of the kink effect,we have done SiN_(X) passivation treatment.The maximum saturation current density(ID_(max))and maximum transconductance(g_(m,max))increase as L_(recess) decreases to 0.4µm.At this time,the device shows ID_(max)=749.6 mA/mm at V_(GS)=0.2 V,V_(DS)=1.5 V,and g_(m,max)=1111 mS/mm at V_(GS)=−0.35 V,V_(DS)=1.5 V.Meanwhile,as L_(recess) increases,it causes parasitic capacitance C_(gd) and g_(d) to decrease,making f_(max) drastically increases.When L_(recess)=0.8µm,the device shows f_(T)=188 GHz and f_(max)=1112 GHz.

ZP-CI/OFDM:A Power Efficient Wireless Transmission Technology

Low power efficiency is a deficiency in traditional Orthogonal Frequency Division Multiplexing （OFDM） systems. To counter this problem, a new wireless transmission technology based on Zero-Padding Carrier Interferometry OFDM （ZP-CI/OFDM） is proposed. In a ZP-CI/OFDM system, transmission symbols are spread to all OFDM subcarriers via carrier interferometry codes. This reduces the Peak-to-Average Power Ratio （PAPR） that traditional OFDM suffers and also exploits frequency diversity gain. By zero-padding at the transmitter, advanced receiver technologies can be adopted for ZP-CI/OFDM so that frequency diversity gain can be further utilized and the power efficiency of the system is improved.

Frequency up-conversion imaging with 60-dB gain using picosecond optical parametric amplifier

A weak infrared （IR） image amplifier with more than 60-dB optical gain and is developed from a picosecond （PS） 355-nm pumped gated optical parametric frequency up-conversion amplifier （OPA） in a/% BaB204 （BBO） crystal. The IR image at 1064 nm is amplified and up-converted into the visible region at 532 nm by parametric amplification and up-conversion. With the optimized optical gain, the lowest detectable energy of the image can be as low as 1.8 femto-Joule per pulse, which is three orders of magnitude lower than the detection limit of a charge-coupled device （CCD） camera. The transversal resolution of the OPA imaging is investigated, and the approaches for higher detection sensitivity and higher transversal resolution are proposed.

Analog and radio-frequency performance analysis of silicon-nanotube MOSFETs

This work presents a comparative study of the influence of various parameters on the analog and RF properties of silicon-nanotube MOSFETs and nanowire-based gate-all-around（GAA） MOSFETs.The important analog and RF performance parameters of SiNT FETs and GAA MOSFETs,namely drain current（/d）,transconductance to drain current ratio（g_m/I_d）,I_（on）/I_（off）,the cut-off frequency（f_T） and the maximum frequency of oscillation（/max） are evaluated with the help of Y- and H-parameters which are obtained from a 3-D device simulator,ATLAS^（TM）.It is found that the silicon-nanotube MOSFETs have far more superior analog and RF characteristics（g_m/I_d,f_T and /max） compared to the nanowire-based gate-all-around GAA MOSFETs.The silicon-nanotube MOSFET shows an improvement of ~2.5 and 3 times in the case of f_T and /max values respectively compared with the nanowire-based gate-all-around（GAA） MOSFET.

An extrinsic f_(max)＞100 GHz InAlN/GaN HEMT with AlGaN back barrier

We report the DC and RF performance of InAlN/GaN high-electron mobility transistors with AlGaN back barrier grown on SiC substrates. These presented results confirm the high performance that is reachable by InAlN-based technology. The InAlN/GaN HEMT sample showed a high 2DEG mobility of 1550 cmE/（V-s） at a 2DEG density of 1.7 × 1013 cm-2. DC and RF measurements were performed on the unpassivated device with 0.2 μm ＂T＂ gate. The maximum drain current density at Vcs = 2 V is close to 1.05 A/mm in a reproducible way. The reduction in gate leakage current helps to increase the frequency performance of AlGaN back barrier devices. The power gain cut-off frequency of a transistor with an A1GaN back barrier is 105 GHz, which is much higher than that of the device without an A1GaN back barrier at the same gate length. These results indicate InAlN/GaN HEMT is a promising candidate for millimeter-wave application.

Investigation and statistical modeling of InAs-based double gate tunnel FETs for RF performance enhancement

In this paper,RF performance analysis of In As-based double gate（DG）tunnel field effect transistors（TFETs）is investigated in both qualitative and quantitative fashion.This investigation is carried out by varying the geometrical and doping parameters of TFETs to extract various RF parameters,unity gain cut-off frequency（f_t）,maximum oscillation frequency（f_（max））,intrinsic gain and admittance（Y）parameters.An asymmetric gate oxide is introduced in the gate-drain overlap and compared with that of DG TFETs.Higher ON-current（ION）of about 0.2 mA and less leakage current（IOFF）of 29 f A is achieved for DG TFET with gate-drain overlap.Due to increase in transconductance（g_m）,higher ft and intrinsic gain is attained for DG TFET with gate-drain overlap.Higher f_（max） of 985 GHz is obtained for drain doping of 5×10^（17）cm^（-3） because of the reduced gate-drain capacitance（C_（gd））with DG TFET with gate-drain overlap.In terms of Y-parameters,gate oxide thickness variation offers better performance due to the reduced values of Cgd.A second order numerical polynomial model is generated for all the RF responses as a function of geometrical and doping parameters.The simulation results are compared with this numerical model where the predicted values match with the simulated values.

A VHF RFPGA with adaptive phase-correction technique

This paper presents a VHF（30-300 MHz） RF programmable gain amplifier（PGA） with an adaptive phase correction technique.The proposed technique effectively mitigates phase errors over the VHF band,and the RFPGA as a whole satisfies all the specifications of the China mobile multimedia broadcasting VHF band applications.The RFPGA is implemented with a TSMC 0.25μm CMOS process.Measurement results reveal a gain range of around 61 dB,an ⅡP3 of-7 dBm at maximum gain,a power consumption of 10.2 mA at maximum gain,and a phase imbalance of less than 0.3 degrees.