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Sheet Resistance and Gas-Sensing Properties of Tin Oxide Thin Films by Plasma Enhanced Chemical Vapor Deposition 被引量:1
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作者 刘彭义 陈俊芳 孙汪典 《Plasma Science and Technology》 SCIE EI CAS CSCD 2004年第2期2259-2264,共6页
Tin oxide (SnO2) thin films are prepared at different temperatures by plasmaenhanced chemical vapor deposition (PECVD). The structural characterizations of the films are investigated by various analysis techniques. X-... Tin oxide (SnO2) thin films are prepared at different temperatures by plasmaenhanced chemical vapor deposition (PECVD). The structural characterizations of the films are investigated by various analysis techniques. X-ray diffraction patterns (XRD) show that the phase of SnO2 films are different at different deposition temperatures. The sheet resistance of the films decreases with increase of deposition temperature. X-ray photoelectron spectroscopy (XPS) shows that the SnO2 thin film is non-stoichiometric. The sheet resistance increases with increase in oxygen flow. Sb-doped SnO2 thin films are more sensitive to alcohol than carbon monoxide, and its maximum sensitivity is about 220%. 展开更多
关键词 SnO2 thin film PECVD sheet resistance gas sensibility
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