Ni-containing carbon films were prepared by rf glow discharge decomposition of methane and nickel carbonyl. The deposited des contained C, Ni, H, O and small amounts of N. Nickel existed in forms of metric Ni and Ni2O...Ni-containing carbon films were prepared by rf glow discharge decomposition of methane and nickel carbonyl. The deposited des contained C, Ni, H, O and small amounts of N. Nickel existed in forms of metric Ni and Ni2O3. The oxidation of nickel mainly occurred on film surface. With lower Ni contents, the film maintained the structure of DLC film. With the increase of Ni content, the films showed some crystalline features of Ni and Ni2O3.展开更多
文摘Ni-containing carbon films were prepared by rf glow discharge decomposition of methane and nickel carbonyl. The deposited des contained C, Ni, H, O and small amounts of N. Nickel existed in forms of metric Ni and Ni2O3. The oxidation of nickel mainly occurred on film surface. With lower Ni contents, the film maintained the structure of DLC film. With the increase of Ni content, the films showed some crystalline features of Ni and Ni2O3.
