Ion Beam Polishing for K9 Glass

K9 glass is a common material of optics and micro system, with cheaper price and better processing function. With the development of the optical and micro system, the technique of manufacturing micron/nanometer dimensions microstructure and micro device on K9 glass has used in photoelectron, microwave and diffraction optics device et al The coarse surface of optics and microwave device can cause the light scattering and signal losing, and the function of device reduced. So the supersmooth surface plays an important role in optic and microwave device.

K9玻璃激光损伤的组合测试实验

光学玻璃作为高功率激光器重要的光学元件,准确测量它的损伤阈值对系统性能研究有重要意义。本文采用同批次K9玻璃进行了激光损伤测试实验,分别采用等离子体闪光法、图像法以及光谱法测试样品损伤阈值,实验结果表明:单纯等离子体闪光法、图像法、光谱法都可能出现判别不准确情况,无法准确确定样品损伤阈值。采用光谱法和图像法组合测试方法能够更可靠地得到损伤阈值。得到的K9在1064μm波长下损伤阈值结果为22.47 J/cm^2。验证了组合测试方法的可靠性。

Experimental Investigation on Constrained Abrasive Fluid Polishing for Optical Glass

To find a cost effective,high-precision and environmental friendly way of polishing for optical glass,a series of experiments were focused on about constrained abrasive fluid polishing. Since abrasive particles can repeatedly impact the workpiece in a multidirectional way with high energy, the constrained abrasive fluid polishing method for optical glass has been proposed based on the abrasive fluid machining theory and elastic emission machining theory. A constrained abrasive fluid polishing system was designed and developed to polish K9 glass samples. Results show that K9 glass obtains a high accuracy with less fluid. Experiments indicate that,in a more effective,high-precision and environmental friendly way,constrained abrasive fluid polishing is possible to improve the quality of workpiece surface compared with free abrasive fluid polishing. In the process of removing materials of constrained abrasive fluid polishing,it gives priority to removing the materials of high spot and the high frequency error of smooth local zone can be modified. The abrasive particles can repeatedly impact the workpiece in a multidirectional way,and there are certain relationship among surface quality,material removal rate, and parameters such as speed,clearance, angle, time and particle size. In the process of constrained abrasive fluid polishing, it shows a high material removal rate,and it needn't to clamp workpieces. As a result,it could improve the processing efficiency significantly. The research on constrained abrasive fluid polishing has a practical significance and practical value in industrial production.

Investigation of the laser ultrasound propagation in K9 glass using optical interferometry

The propagating of laser-generated ultrasonic waves in K9 glass was investigated. Many methods have been developed to detect the laser ultrasound since laser ultrasonic waves can be used to measure material parameters or characterize materials properties. In order to reduce the measuring time, a Mach–Zehnder interferometer, a full field measuring tool,was preferred in this paper. The ultrasonic wave was produced on the K9 glass surface by a Q-switched Nd:YAG laser absorbed in a liquid layer. The interferograms were then taken at various delay times by a CCD camera after single pulse induced laser ultrasonic waves. Ultrasonic waves in the K9 glass can be observed from interferogram images. The results provide an understanding of laser ultrasound propagation in K9 glass in the lifetime.

Study on the protection of Er-doped phosphate glass waveguide surface in ion-exchange processing

A novel method, sputtering K9 glass film, is proposed to solve the surface corrosion of Er-doped phosphate glass during ion-exchange processing for optical waveguide fabrication. The corrosion causes are analyzed to be the intrinsically weak stabilization of phosphate glass structure, hydrophile and weakly acidic property of phosphate radical. Experimental results show that the K9 glass film could not only protect the Er-doped phosphate glass surface from being corroded but also give no influence on the waveguide fabrication. The effect of thickness of K9 glass film on the optical property of waveguide is also investigated and the op- timal thickness is found to be 60―80 nm. It provides a good base for further fabri- cation of active phosphate glass optical waveguide devices.