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Study on Hardness of Ion Implantation Layer
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作者 Xu Shiru, Qiu Chengferg, Zhang Qiaogen, Li Zhong Yang Zhigui Electronic Engineering Department of Xi’an Jiaotong University, Xi’an, China 《真空科学与技术学报》 EI CAS CSCD 1992年第Z1期183-186,共4页
The surface layer of beryllium, specimen, has been strengthened by ion implantation. Its microhardness was measured. The hardness of surface layer has been calculated from the microhardness. The experimental data of t... The surface layer of beryllium, specimen, has been strengthened by ion implantation. Its microhardness was measured. The hardness of surface layer has been calculated from the microhardness. The experimental data of the wear rate indirectly Confirmed the reasonableness of the result of calculation. It is shown that the hardness of the surface layer strengthened, by ion implantation is nine times higher than that of beryllium itself. The relation between hardness and implantation dose was analysed and the best dose was obtained. 展开更多
关键词 RATE In Study on hardness of Ion Implantation Layer
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Effect of Axial Magnetic Field on the Microstructure, Hardness and Wear Resistance of TiN Films Deposited by Arc Ion Plating 被引量:4
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作者 Yan-Hui Zhao Wen-Jin Yang +3 位作者 Chao-Qian Guo Yu-Qiu Chen Bao-Hai Yu Jin-Quan Xiao 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2015年第8期984-993,共10页
TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties... TiN films were deposited on stainless steel substrates by arc ion plating. The influence of an axial magnetic field was examined with regard to the microstructure, chemical elemental composition, mechanical properties and wear resistance of the films. The results showed that the magnetic field puts much effect on the preferred orientation, chemical composition, hardness and wear resistance of TiN films. The preferred orientation of the TiN films changed from(111) to(220) and finally to the coexistence of(111) and(220) texture with the increase in the applied magnetic field intensity. The concentration of N atoms in the TiN films increases with the magnetic field intensity, and the concentration of Ti atoms shows an opposite trend. At first, the hardness and elastic modulus of the TiN films increase and reach a maximum value at 5 m T and then decrease with the further increase in the magnetic field intensity. The high hardness was related to the N/Ti atomic ratio and to a well-pronounced preferred orientation of the(111) planes in the crystallites of the film parallel to the substrate surface. The wear resistance of the Ti N films was significantly improved with the application of the magnetic field, and the lowest wear rate was obtained at magnetic field intensity of 5 m T. Moreover, the wear resistance of the films was related to the hardness H and the H3/E*2 ratio in the manner that a higher H3/E*2 ratio was conducive to the enhancement of the wear resistance. 展开更多
关键词 Magnetic field Arc ion plating TiN films hardness Wear resistance
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Effect of Axial Magnetic Field on the Microstructure and Mechanical Properties of CrN Films Deposited by Arc Ion Plating 被引量:2
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作者 Yan-Hui Zhao Li Xu +3 位作者 Chao-Qian Guo Wen-Jin Yang Guo-Qiang Lin Bao-Hai Yu 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2016年第6期546-553,共8页
CrN films were deposited on the high-speed-steel substrates by arc ion plating. The effect of an axial magnetic field on the microstructure and mechanical properties was investigated. The chemical composition, microst... CrN films were deposited on the high-speed-steel substrates by arc ion plating. The effect of an axial magnetic field on the microstructure and mechanical properties was investigated. The chemical composition, microstructure, surface morphology, surface roughness, hardness and film/substrate adhesion of the film were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, scanning electron microscope(SEM), surface morphology analyzer, Vickers microhardness test and scratch test. The results showed that the magnetic field puts much effect on the microstructure,chemical composition, hardness and film/substrate adhesion of the Cr N films. The N content increases and Cr content decreases when the magnetic flux density increases from 0 to 30 m T. All of the Cr N films were found to be substoichiometric. With an increase in the magnetic flux density, the film structures change in such way: Cr_2N →Cr_(2-N)+CrN→CrN+Cr_2N→CrN.The SEM results showed that the number of macroparticles(MPs) on the film surface is significantly reduced when the magnetic flux density increases to 10 mT or higher. The surface roughness decreases with the magnetic field, which is attributed to the fewer MPs and sputtered craters on the film surface. The hardness value increases from 2074 HV_(0.025) at 0 mT(without magnetic field) and reaches a maximum value of 2509 HV_(0.025) at 10 m T.The further increase in the magnetic flux density leads to a decrease in the film hardness. The critical load of film/substrate adhesion shows a monotonous increase with the increase in magnetic flux density. 展开更多
关键词 Magnetic field Arc ion plating CrN films hardness Adhesion
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