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Simulation study on single event burnout in linear doping buffer layer engineered power VDMOSFET 被引量:3
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作者 贾云鹏 苏洪源 +2 位作者 金锐 胡冬青 吴郁 《Journal of Semiconductors》 EI CAS CSCD 2016年第2期90-93,共4页
The addition of a buffer layer can improve the device's secondary breakdown voltage, thus, improving the single event burnout (SEB) threshold voltage. In this paper, an N type linear doping buffer layer is proposed... The addition of a buffer layer can improve the device's secondary breakdown voltage, thus, improving the single event burnout (SEB) threshold voltage. In this paper, an N type linear doping buffer layer is proposed. According to quasi-stationary avalanche simulation and heavy ion beam simulation, the results show that an op- timized linear doping buffer layer is critical. As SEB is induced by heavy ions impacting, the electric field of an optimized linear doping buffer device is much lower than that with an optimized constant doping buffer layer at a given buffer layer thickness and the same biasing voltages. Secondary breakdown voltage and the parasitic bipolar turn-on current are much higher than those with the optimized constant doping buffer ~ayer. So the linear buffer layer is more advantageous to improving the device's SEB performance. 展开更多
关键词 single event burnout (SEB) quasi-static avalanche linear doping buffer layer heavy ion au beam
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