With the continuous advancement in topology optimization and additive manufacturing(AM)technology,the capability to fabricate functionally graded materials and intricate cellular structures with spatially varying micr...With the continuous advancement in topology optimization and additive manufacturing(AM)technology,the capability to fabricate functionally graded materials and intricate cellular structures with spatially varying microstructures has grown significantly.However,a critical challenge is encountered in the design of these structures–the absence of robust interface connections between adjacent microstructures,potentially resulting in diminished efficiency or macroscopic failure.A Hybrid Level Set Method(HLSM)is proposed,specifically designed to enhance connectivity among non-uniform microstructures,contributing to the design of functionally graded cellular structures.The HLSM introduces a pioneering algorithm for effectively blending heterogeneous microstructure interfaces.Initially,an interpolation algorithm is presented to construct transition microstructures seamlessly connected on both sides.Subsequently,the algorithm enables the morphing of non-uniform unit cells to seamlessly adapt to interconnected adjacent microstructures.The method,seamlessly integrated into a multi-scale topology optimization framework using the level set method,exhibits its efficacy through numerical examples,showcasing its prowess in optimizing 2D and 3D functionally graded materials(FGM)and multi-scale topology optimization.In essence,the pressing issue of interface connections in complex structure design is not only addressed but also a robust methodology is introduced,substantiated by numerical evidence,advancing optimization capabilities in the realm of functionally graded materials and cellular structures.展开更多
Inverse lithography technology （ILT） is one of the promising resolution enhancement techniques （RETs）, as the advanced integrated circuits （IC） technology nodes still use the 193 nm light source. Among all the a...Inverse lithography technology （ILT） is one of the promising resolution enhancement techniques （RETs）, as the advanced integrated circuits （IC） technology nodes still use the 193 nm light source. Among all the algorithms for ILT, the level-set-based ILT （LSB-ILT） is a feasible choice with good production result in practice. However, existing ILT algorithms optimize masks at nominal process condition without giving sufficient attention to the process variations, and thus the optimized masks show poor performance with focus and dose variations. In this paper, we put forward a new LSB-ILT algorithm for process robustness improvement with fast convergence. In order to account for the process variations in the optimization, we adopt a new form of the cost function by adding the objective function of process variation band （PV band） to the nominal cost. We also adopt the hybrid conjugate gradient （CG） method to reduce the runtime of the algorithm. We perform experiments on ICCAD 2013 benchmarks and the results show that our algorithm outperforms the top two winners of the ICCAD 2013 contest by 6.5%. We also adopt the attenuated phase shift mask （att-PSM） in the experiment with test cases from industry. The results show that our new algorithm has a fast convergence speed and reduces the process manufacturability index （PMI） by 38.77% compared with the LSB-ILT algorithm without the consideration of PV band.展开更多
基金the National Key Research and Development Program of China(Grant Number 2021YFB1714600)the National Natural Science Foundation of China(Grant Number 52075195)the Fundamental Research Funds for the Central Universities,China through Program No.2172019kfyXJJS078.
文摘With the continuous advancement in topology optimization and additive manufacturing(AM)technology,the capability to fabricate functionally graded materials and intricate cellular structures with spatially varying microstructures has grown significantly.However,a critical challenge is encountered in the design of these structures–the absence of robust interface connections between adjacent microstructures,potentially resulting in diminished efficiency or macroscopic failure.A Hybrid Level Set Method(HLSM)is proposed,specifically designed to enhance connectivity among non-uniform microstructures,contributing to the design of functionally graded cellular structures.The HLSM introduces a pioneering algorithm for effectively blending heterogeneous microstructure interfaces.Initially,an interpolation algorithm is presented to construct transition microstructures seamlessly connected on both sides.Subsequently,the algorithm enables the morphing of non-uniform unit cells to seamlessly adapt to interconnected adjacent microstructures.The method,seamlessly integrated into a multi-scale topology optimization framework using the level set method,exhibits its efficacy through numerical examples,showcasing its prowess in optimizing 2D and 3D functionally graded materials(FGM)and multi-scale topology optimization.In essence,the pressing issue of interface connections in complex structure design is not only addressed but also a robust methodology is introduced,substantiated by numerical evidence,advancing optimization capabilities in the realm of functionally graded materials and cellular structures.
基金This work was supported by the National Natural Science Foundation of China under Grant Nos. 61204111 and 61474098. A preliminary version of the paper was published in the Proceedings of CAD/Graphics 2013.
文摘Inverse lithography technology （ILT） is one of the promising resolution enhancement techniques （RETs）, as the advanced integrated circuits （IC） technology nodes still use the 193 nm light source. Among all the algorithms for ILT, the level-set-based ILT （LSB-ILT） is a feasible choice with good production result in practice. However, existing ILT algorithms optimize masks at nominal process condition without giving sufficient attention to the process variations, and thus the optimized masks show poor performance with focus and dose variations. In this paper, we put forward a new LSB-ILT algorithm for process robustness improvement with fast convergence. In order to account for the process variations in the optimization, we adopt a new form of the cost function by adding the objective function of process variation band （PV band） to the nominal cost. We also adopt the hybrid conjugate gradient （CG） method to reduce the runtime of the algorithm. We perform experiments on ICCAD 2013 benchmarks and the results show that our algorithm outperforms the top two winners of the ICCAD 2013 contest by 6.5%. We also adopt the attenuated phase shift mask （att-PSM） in the experiment with test cases from industry. The results show that our new algorithm has a fast convergence speed and reduces the process manufacturability index （PMI） by 38.77% compared with the LSB-ILT algorithm without the consideration of PV band.
