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Origin of Photoluminescence of Neodymium-Implanted Silicon 被引量:1
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作者 肖志松 徐飞 +2 位作者 张通和 易仲珍 程国安 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第11期1377-1381,共5页
Neodymium is incorporated into single crystalline silicon on MEVVA (Metal Vapor Vacuum Arc) ion source.At room temperature,strong ultra violet and visible fluorescence are observed at the excitation wavelength of 220... Neodymium is incorporated into single crystalline silicon on MEVVA (Metal Vapor Vacuum Arc) ion source.At room temperature,strong ultra violet and visible fluorescence are observed at the excitation wavelength of 220nm.Luminescence intensity increases with the increase of ion fluence.XPS results manifest that Si-O,Nd-O,Si-Si and O-O bonds exist in the implanted layers.Luminescence mainly results from the radiation transition in the intra 4f shell of Nd 3+ ion.The defects' and damages' contribution to the luminescence is also presented. 展开更多
关键词 PHOTOLUMINESCENCE ion implantation rare earth
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Theoretical Investigation of Pinch off Voltage of Box-Like Ion-Implanted 4H-SiC MESFETs 被引量:1
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作者 王守国 张义门 张玉明 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第7期697-701,共5页
A precise theoretical calculation off the pinch of voltage of the box-like ion implantation 4H-SiC MESFETs is investigated with the consideration of the effects of the ion-implanted channel and the depth of MESFETs ch... A precise theoretical calculation off the pinch of voltage of the box-like ion implantation 4H-SiC MESFETs is investigated with the consideration of the effects of the ion-implanted channel and the depth of MESFETs channel.The implant depth profile is simulated using the Monte Carlo simulator TRIM.The effects of parameters such as temperature,acceptor density,and activation rate on channel depth a,pinch off voltage are studied. 展开更多
关键词 silicon carbide ion implantation MESFET pinch off voltage
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Effect of Implanted Chip System on Blood Pressure Regulation in Rabbits 被引量:1
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作者 高兴亚 王汉军 +4 位作者 朱国庆 郭瑞 张枫 张颖 陆祖宏 《Journal of Nanjing Medical University》 2004年第6期279-282,共4页
Objective: To evaluate the efficiency of an implanted chip system on blood pressure regulation. Methods: The mean arterial pressure (MAP) and heart rate (HR) were recorded in anesthetized rabbits. Based on the set poi... Objective: To evaluate the efficiency of an implanted chip system on blood pressure regulation. Methods: The mean arterial pressure (MAP) and heart rate (HR) were recorded in anesthetized rabbits. Based on the set point theory, an implanted chip system was designed to regulate the blood pressure by stimulating the aortic depressor nerve (ADN) according to the feedback of blood pressure. The blood pressure regulation induced by the implanted chip system was carried out twice (lasted for 15 min and 60 min respectively) and the change of MAP and HR during the regulation was compared with the control. Results: There was a significant decrease of MAP during the first regulation ([-32.0 ± 6.6] mmHg) and second regulation ([-27.4 ± 6.2] mmHg) compared with the control (P<0.01). The HR was also significantly decreased during regulation compared with the control. Both MAP and HR returned to the baseline immediately without rebound after the regulation ceased. Conclusion: The implanted chip system can regulate the blood pressure successfully and keep the blood pressure in a lower constant level without adaptation. 展开更多
关键词 implanted chip blood pressure set point HYPERTENSION
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Effect of heat treatment on surface composition of hydrogen implanted C-SiC coatings
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作者 杜纪富 胡永红 +3 位作者 董珍 张光学 李月生 赵龙 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第11期3300-3305,共6页
C-SiC coatings were prepared on stainless steel substrate by the middle frequency magnetron sputtering (MFMS) and ion beam mixing technique. After deposition, these samples were implanted by 5 keV hydrogen ion beam ... C-SiC coatings were prepared on stainless steel substrate by the middle frequency magnetron sputtering (MFMS) and ion beam mixing technique. After deposition, these samples were implanted by 5 keV hydrogen ion beam at a dose of 1×1018 ion/cm2. Some samples were heat treated at different temperatures from 273 K to 1173 K separately. The surface morphology, surface concentration of the elements of the C-SiC coatings and element iron from substrate as well as their depth profiles were checked with SEM, XPS and SIMS analyses. The results show that the composition of the coatings is changed due to heat treatment at different temperatures. The C-50%SiC coating with an excellent hydrogen resistant property can act as hydrogen barrier at the temperature below 723 K. But the hydrogen resistant property of the coating becomes bad when it is used at the temperature of 1023 K. 展开更多
关键词 C-SiC coating hydrogen implantation heat treatment
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Characteristics of N^+ Implanted Layer of 4H-SiC
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作者 王守国 张义门 +1 位作者 张玉明 杨林安 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第12期1249-1253,共5页
The nitrogen ions implanted layer of p type 4H SiC epilayer is investigated.The fabrication processes and measurements of the implanted layer are given in details.The profile of implantation depth is simulated using... The nitrogen ions implanted layer of p type 4H SiC epilayer is investigated.The fabrication processes and measurements of the implanted layer are given in details.The profile of implantation depth is simulated using the Monte Carlo simulator TRIM.Lateral Schottky barrier diodes and transfer length method (TLM) measurement structure are made on nitrogen implanted layers for the testing.The concentration of activated donors N d is about 3 0×10 16 cm -3 .The resulting value for the activation rate in this study is 2 percent.The sheet resistance R sh is 30kΩ/□ and the resistivity ρ(R sh × d ) of the implanted layer is 0 72Ω·cm.The electron mobility calculated is about 300cm 2/(V·s) in the N implanted layer. 展开更多
关键词 silicon carbide ion implantation ANNEALING sheet resistance
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Structure and Magnetism of Co-implanted TiO2
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作者 丁斌峰 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 2011年第6期724-728,I0004,共6页
Crystalline Co nanocomposites in the rutile TiO2 were synthesized by 180 keV Co ion beam implantation at temperature of 623 K with the fluence of 4×10^16 cm^-2. The structural and magnetic properties of samples w... Crystalline Co nanocomposites in the rutile TiO2 were synthesized by 180 keV Co ion beam implantation at temperature of 623 K with the fluence of 4×10^16 cm^-2. The structural and magnetic properties of samples with different thermal treatment were characterized by synchrotron radiation X-ray diffraction (SR-XRD), high resolution transmission electron mi- croscopy (HRTEM), Rutherford backscattering/channeling and the superconducting quantum interference device magnetometer. The SR-XRD results reveal the formation of hcp and fce phases of Co clusters, and the SR-XRD and HRTEM show that Co nanocrystals (NCs) have been formed in TiO2 after ion implantation. With increasing of annealing temperature, the transition of hcp to fcc Co is observed, and the Co NCs sizes were increased with increasing post-annealing temperature. At annealing temperature 1073 K, the lattice damaged is significantly removed compared with the virgin sample. The Co NCs forming inside TiO2 are the major contribution of the measured ferromagnetism. 展开更多
关键词 NANOCOMPOSITE Ferromagnetic material Ion implantation
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Phenotype Observation and Variation Analysis of F_2 Generation of Ion Implanted Chili Pepper Seeds 被引量:1
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作者 汪宁 许峥 +4 位作者 张丰收 张涛 苏颖 连慕兰 周云龙 《Agricultural Science & Technology》 CAS 2011年第8期1103-1106,1132,共5页
[Objective]The aim was to investigate inheritance of the mutagenic properties caused by ion implantation from F1 to F2 generation in chili pepper.[Method]Chili pepper seeds were implanted with different ion combinatio... [Objective]The aim was to investigate inheritance of the mutagenic properties caused by ion implantation from F1 to F2 generation in chili pepper.[Method]Chili pepper seeds were implanted with different ion combinations at different doses,and the F1 generation seeds of five groups in which biological mutation occurred were selected to sow in the field.Then the main phenotype changes in F2 generation were observed,the biochemical changes caused by ion implantation were analyzed by determination of peroxidase isozyme.[Result]Seed implanted with 9×1011 P2+/cm2 and 1×1012 Cu2+/cm2(No.21)on its both sides could maintain the superiority in yield per plant to F2 generation,while the mutagenic effects of F1 generation in other groups were not inherited by the F2 generation.[Conclusion]The prominent biological characters induced in the seeds of group No.21 were relatively inherited,so the seeds were worth further breeding. 展开更多
关键词 Ion implantation Chili pepper Phenotype of F2 generation MUTATION HEREDITY
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Surface characteristics,corrosion behavior,and antibacterial property of Ag-implanted NiTi alloy 被引量:18
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作者 Peng Luo Sheng-Nan Wang +1 位作者 Ting-Ting Zhao Yan Li 《Rare Metals》 SCIE EI CAS CSCD 2013年第2期113-121,共9页
NiTi shape memory alloy was modified by Ag ion implantation with different incident doses to improve its antibacterial property. The atomic force microscopy, auger electron spectroscopy, and X-ray photoelectron spectr... NiTi shape memory alloy was modified by Ag ion implantation with different incident doses to improve its antibacterial property. The atomic force microscopy, auger electron spectroscopy, and X-ray photoelectron spectroscopy show that the surface of NiTi alloy is covered by TiO2 nano-film with embedded pure Ag with a peak concentration of 5.0 at% at the incident dose of 1.5 x10^17 ions.cm-a, and Ni concentration is reduced in the super- ficial surface layer. The surface roughness reaches the maximum value nearly twice higher than the control sample at the incident dose of 1.5x10^17 ions.cm-2. The potentiodynamic anodic polarization curves show that the Ag-implanted NiTi samples possess higher self-corrosion potential (Ecorr) and lower self-corrosion current density (icor0 but lower breakdown potential (Ebr). Therefore, the corrosion resistance of the Ag-NiTi is comparable to, if not better than, the untreated NiTi. The antibacterial tests reveal that there is a distinct reduction of the germ numbers on the Ag-NiTi, which is due to the direct contact between Ag and germ, and enhanced by the leaching Ag ions. 展开更多
关键词 NITI AG Ion implantation CORROSIONRESISTANCE Antibacterial property
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Antibacterial properties and corrosion resistance of AISI 420 stainless steels implanted by silver and copper ions 被引量:8
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作者 Hong-wei Ni Han-shuang Zhang Rong-sheng Chen Wei-ting Zhan Kai-fu Huo Zhen-yu Zuo 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2012年第4期322-327,共6页
Silver or copper ions are often chosen as antibacterial agents. But a few reports are concerned with these two antibacterial agents for preparation of antibacterial stainless steel (SS). The antibacterial properties... Silver or copper ions are often chosen as antibacterial agents. But a few reports are concerned with these two antibacterial agents for preparation of antibacterial stainless steel (SS). The antibacterial properties and corrosion resistance of AISI 420 stainless steel implanted by silver and copper ions were investigated. Due to the cooperative antibacterial effect of silver and copper ions, the Ag/Cu implanted SS showed excellent antibacterial activities against both Gram-negative Escherichia coli (E. coli) and Gram-positive Staphylococcus aureus (S. aureus) at a total implantation dose of 2~ 1017 ions/cm2. Electrochemical polarization curves revealed that the corrosion resistance of Ag/Cu implanted SS was slightly enhanced as compared with that of un-implanted SS, The implanted layer was characterized by X-ray photoelec- tron spectroscopy (XPS). Core level XPS spectra indicate that the implanted silver and copper ions exist in metallic state in the implanted layer. 展开更多
关键词 ion implantation antibacterial properties stainless steel Escherichia coli Staphylococcus aureus corrosion resistance
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Antibacterial and corrosive properties of copper implanted austenitic stainless steel 被引量:5
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作者 Juan Xiong Bo-fan Xu Hong-wei Ni 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2009年第3期293-298,共6页
Copper ions were implanted into austenitic stainless steel (SS) by metal vapor vacuum arc with a energy of 100 keV and an ions dose range of (0.5-8.0)× 10^17 cm^-2. The Cu-implanted SS was annealed in an Ar a... Copper ions were implanted into austenitic stainless steel (SS) by metal vapor vacuum arc with a energy of 100 keV and an ions dose range of (0.5-8.0)× 10^17 cm^-2. The Cu-implanted SS was annealed in an Ar atmosphere furnace. Glancing X-ray diffraction (GXRD), transmission electron microscopy (TEM) and Auger electron spectroscopy (AES) were used to reveal the phase compositions, microstructures, and concentration profiles of copper ions in the implanted layer. The results show that the antibacterial property of Cu-implanted SS is attributed to Cu9.9Fe0.1, which precipitated as needles. The depth of copper in Cu-implanted SS with annealing treatment is greater than that in Cu-implanted SS without annealing treatment, which improves the antibacterial property against S. aureus. The salt wetting-drying combined cyclic test was used to evaluate the corrosion-resistance of antibacterial SS, and the results reveal that the antibacterial SS has a level of corrosion-resistance equivalent to that of un-implanted SS. 展开更多
关键词 copper ion implantation stainless steel antibacterial property corrosion resistance
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Inhibitory activity of polysaccharide extracts from three kinds of edible fungi on proliferation of human hepatoma SMMC-7721 cell and mouse implanted S180 tumor 被引量:5
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作者 Jiang SM Xiao ZM Xu ZH 《World Journal of Gastroenterology》 SCIE CAS CSCD 1999年第5期404-407,共4页
AIM To determine the activities ofpolysaccharide extracts from Flammulina velutipes (Curt. ex Fr. ) Sing (FV), Lentinusedodes (LE) and Agaricus bisporus Sing (AB)on the proliferation of human hepatoma SMMC-7721 cells ... AIM To determine the activities ofpolysaccharide extracts from Flammulina velutipes (Curt. ex Fr. ) Sing (FV), Lentinusedodes (LE) and Agaricus bisporus Sing (AB)on the proliferation of human hepatoma SMMC-7721 cells in vitro and on mouse implanted S-180tumors in vivo.METHODS The polysaccharide extracts were isolated from the fruit bodies of FV, LE and AB by the methods of hot-water extraction, Sevag’sremoval of proteins, ethanol precipitation,trypsin digestion and ethanol fractionalprecipitation. Human hepatoma SMMC-7721 cells were treated with 50 mg/L Polysaccharide extracts, and the mitosis index, mitochondria activity and cell proliferation were detected at different times in both control and experimental groups. The mice with S-180 implanted tumors were injected with the polysaccharide extracts at 24 mg/ kg body weight for 9 d and the tumorweight was measured on the 15th day.RESULTS The mitosis index of hepatoma cells in vitro could be significantly decreased by treatment with the polysaccharide extracts fromthe three kinds of edible fungi (P < 0 .005 ). Thecell numbers and mitochondria activity of SMMC7721 cells treated with polysaccharide extracts were lower than those in control groups (P <0.005). The inhibition rates of polysaccharide extracts against implanted S-180 tumors in mice were 52.8%, 56.6% and 51 .9% respectivelycompared with that in c0ntrol gr0ups.CONCLUSI0N The POIysaccharide extractsfrom the three kinds of edible fungi could inhibitnot only the Cultured malignant cells in vitfO butalso impIanted Sl80 tum0r i0 vivo. 展开更多
关键词 polysaccharide edible fungi liver neoplasm carcinoma hepatocellular SMMC7721 TUMOR cell cultured implanted tumor S-180 CELL PROLIFERATION
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Formation of Nickel Based Ohmic Contact to High Energy Vanadium Implanted n-Type 4H-SiC
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作者 王超 张义门 +3 位作者 张玉明 郭辉 徐大庆 王悦湖 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第11期1701-1705,共5页
The diffusion behavior of vanadium (V) implanted in SiC is investigated by secondary ion mass spec- trometry. Significant redistribution, especially out-diffusion of vanadium towards the sample surface, is not ob- s... The diffusion behavior of vanadium (V) implanted in SiC is investigated by secondary ion mass spec- trometry. Significant redistribution, especially out-diffusion of vanadium towards the sample surface, is not ob- served after 1650℃ annealing. Higher carrier concentration is obtained due to a lack of compensation of vanadium in the surface region. The electrical characteristics of Ni contacts to V-implanted n-type 4H-SiC are investigated using a linear transmission line method. A specific contact resistance as low as 4.4 × 10^-3Ω · cmA^2 is achieved after annealing at 1050℃ for 10min in gas ambient consisting of 90% N2 and 10% H2 X-ray diffraction analysis shows the formation of Ni2 Si and graphite phase at the interface after annealing. This provides the evidence that the car- bon vacancies,resulting from the out-diffusion of carbon atoms from SiC, contribute to the formation of ohmic contact through the reduction of effective Schottky barrier height for the transport of electrons. 展开更多
关键词 ohmic contact semi-insulating SiC V ion implantation diffusion carbon vacancies
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Residual Stress Measurement for Ion-implanted NiTi Alloy by Using Moiré Interferometry and Hole-drilling Combined Method 被引量:2
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作者 WANG Qiang WANG Biao +1 位作者 MA De-cai DAI Fu-long 《Chinese Journal of Aeronautics》 SCIE EI CAS CSCD 2006年第B12期23-26,共4页
Residual stresses in ion-implanted NiTi alloy are measured by a combined method ofMoir6 interferometry and hole-drilling. Oxygen ions are implanted into the NiTi alloy under a voltage of 30 kV by a dose of 1.0×10... Residual stresses in ion-implanted NiTi alloy are measured by a combined method ofMoir6 interferometry and hole-drilling. Oxygen ions are implanted into the NiTi alloy under a voltage of 30 kV by a dose of 1.0×10^17ions/cm^2 for one hour. Subsequently, in order to avoid dimensional error, a hole is drilled exactly in the center of the sample. The distribution of residual stresses around the hole is measured. It is indicated that the method which combines the Moire interferometry with hole-drilling is able to be used to measure residual stresses produced by ion implantation. 展开更多
关键词 ion implantation residual stress Moire interferometry hole-drilling
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An Implanted Closed-loop Chip System for Heart Rate Control:System Design and Effects in Conscious Rats 被引量:3
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作者 Yuxuan Zhou Yuan Yuan +4 位作者 Juan Gao Ling Yang Feng Zhang Guoqing Zhu Xingya Gao 《The Journal of Biomedical Research》 CAS 2010年第2期107-114,共8页
Objective: To evaluate the efficiency of an implanted chip system for the control of heart rate (HR). Methods: The HR was recorded in six conscious Sprague-Dawley (SD) rats. An implanted chip system was designed... Objective: To evaluate the efficiency of an implanted chip system for the control of heart rate (HR). Methods: The HR was recorded in six conscious Sprague-Dawley (SD) rats. An implanted chip system was designed to regulate the HR by stimulating the right cervical vagus nerve according to the feedback of real time HR. Each rat was subjected to 30-min regulation and 30-min recovery. The change of HR during the regulation period was compared with the control. The ECG was recorded during the experiment for 24 h. Results: The ECG signals were successfully recorded during the experiment. The HR was significantly decreased during the period of regulation compared with control (-79.3 ± 34.5, P 〈 0.01, n = 6) and then recovered to normal after regulation. Conclusion: The described implanted chip system can regulate the HR to a designated set point. 展开更多
关键词 closed-loop regulation implanted chip system set point heart rate vagus nerve stimulation Remote-controlled animal
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The electrical properties of sulfur-implanted cubic boron nitride thin films 被引量:2
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作者 邓金祥 秦扬 +4 位作者 孔乐 杨学良 李廷 赵卫平 杨萍 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第4期458-460,共3页
Cubic boron nitride (c-BN) thin films are deposited on p-type Si wafers using radio frequency (RF) sputtering and then doped by implanting S ions. Wile implantation energy of the ions is 19 keV, and the implantati... Cubic boron nitride (c-BN) thin films are deposited on p-type Si wafers using radio frequency (RF) sputtering and then doped by implanting S ions. Wile implantation energy of the ions is 19 keV, and the implantation dose is between 1015 ions/cm2 and 1016 ions/cm2. The doped c-BN thin films are then annealed at a temperature between 400℃ and 800℃. The results show that the surface resistivity of doped and annealed c-BN thin films is lowered by two to three orders, and the activation energy of c-BN thin films is 0.18 eV. 展开更多
关键词 cubic boron nitride ion implantation surface resistivity activation energy
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Total dose radiation response of modified commercial silicon-on-insulator materials with nitrogen implanted buried oxide 被引量:2
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作者 郑中山 刘忠立 +1 位作者 于芳 李宁 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第11期361-366,共6页
Nitrogen ions of various doses are implanted into the buried oxide (BOX) of commercial silicon-on-insulator (SOI) materials, and subsequent annealings are carried out at various temperatures. The total dose radiat... Nitrogen ions of various doses are implanted into the buried oxide (BOX) of commercial silicon-on-insulator (SOI) materials, and subsequent annealings are carried out at various temperatures. The total dose radiation responses of the nitrogen-implanted SOI wafers are characterized by the high frequency capacitance-voltage (C-V) technique after irradi- ation using a Co-60 source. It is found that there exist relatively complex relationships between the radiation hardness of the nitrogen implanted BOX and the nitrogen implantation dose at different irradiation doses. The experimental results also suggest that a lower dose nitrogen implantation and a higher post-implantation annealing temperature are suitable for improving the radiation hardness of SOI wafer. Based on the measured C V data, secondary ion mass spectrometry (SIMS), and Fourier transform infrared (FTIR) spectroscopy, the total dose responses of the nitrogen-implanted SOI wafers are discussed. 展开更多
关键词 SILICON-ON-INSULATOR total dose radiation hardness nitrogen implantation
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One-year experience with the Cochlear^(TM) Paediatric Implanted Recipient Observational Study(Cochlear P-IROS) in New Delhi, India 被引量:1
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作者 Shomeshwar Singh Shashank Vashist Thathya V.Ariyaratne 《Journal of Otology》 CSCD 2015年第2期57-65,共9页
Background: Currently, there is a significant lack of data concerning long-term outcomes following paediatric cochlear implantation in terms of quality of life. There is a need for a long-term, prospective study in t... Background: Currently, there is a significant lack of data concerning long-term outcomes following paediatric cochlear implantation in terms of quality of life. There is a need for a long-term, prospective study in this regard. This study aims at highlighting the preliminary results, one year post surgery of a five year prospective study. Methods: The CochlearTM Paediatric Implanted Recipient Observational Study (P-IROS) is a prospective, patient outcomes registry for routinely implanted children. The study collects data using questionnaires post-surgery and at regular intervals up to five years. Results: At our Centre, 159 cochlear implant surgery procedures were carried out between January 2014 and December 2014. Category of Auditory Performance II score increased from ‘0' to ‘3' at six months and to ‘5' at 12 months for children aged 0-3 years, although this was not statistically significant. However, the same trend was statistically significant for the age 3-6 year and age 6-10 year brackets. The quality of life of the child improved significantly. Analysis of communication mode revealed a statistically significant overall shift to the auditory-oral mode from total communication. Conclusion: Cochlear implantation is a life-changing intervention. The evidence in support of what it can achieve safely is clear. However, the costs associated with it raise the question if it will remain an effective option for life in all children. The Cochlear P-IROS is an attempt to answer the same over a five year period. Our study in New Delhi, so far concludes that cochlear implantation in a population with limited access to funds is very effective, one year after surgery. 展开更多
关键词 Cochlear implant surgery Heating loss Cochlear implant outcome Category of Auditory Performance Quality of life
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Optical and structural properties of Ge-ion-implanted fused silica after annealing in different ambient conditions 被引量:1
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作者 向霞 陈猛 +3 位作者 陈美艳 祖小涛 朱莎 王鲁闽 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第1期551-556,共6页
Ge^+ ions are implanted into fused silica glass at room temperature and a fluence of 1 × 10^17 cm^-2. The as-implanted samples are annealed in O2, N2 and Ar atmospheres separately. Ge^0, GeO and GeO2 coexist in ... Ge^+ ions are implanted into fused silica glass at room temperature and a fluence of 1 × 10^17 cm^-2. The as-implanted samples are annealed in O2, N2 and Ar atmospheres separately. Ge^0, GeO and GeO2 coexist in the as-implanted and annealed samples. Annealing in different atmospheres at 600℃ leads each composite to change its content. After annealing at 1000℃, there remains some amount of Ge^0 in the substrates. However, the content of Ge decreases due to out-diffusion. After annealing in N2, Si N composite is formed. The absorption peak of GeO appears at 240 nm after annealing in O2 atmosphere, and a new absorption peak occurs at 418 nm after annealing in N2 atmosphere, which is attributed to the Si N composite. There is no absorption peak appearing after annealing in Ar atmosphere. Transmission electron microscopic images confirm the formation of Ge nanoparticles in the as-implanted sample and GeO2 nanoparticles in the annealed sample. In the present study, the GeO content and the GeO2 content depend on annealing temperature and atmosphere. Three photolumineseence emission band peaks at 290, 385 and 415 nm appear after ion implantation and they become strong with the increase of annealing temperature below 700℃ and their photoluminescences recover to the values of as-grown samples after annealing at 700℃. Optical absorption and photoluminescence depend on the annealing temperature and atmosphere. 展开更多
关键词 NANOPARTICLES optical absorption PHOTOLUMINESCENCE ion implantation
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Role of MR-DWI and MR-PWI in the radiotherapy of implanted pulmonary VX-2 carcinoma in rabbits 被引量:5
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作者 Qiang Zhang Mingmin Zhang +6 位作者 Zhaoxin Liu Baoqi Shi Fuliang Qi Haijiang Wang Yuan Lv Haijiao Jin Weijing Zhang 《Chinese Journal of Cancer Research》 SCIE CAS CSCD 2014年第5期532-542,共11页
Objective: To detect the activity of tumor cells and tumor blood flow before and after the radiotherapy of implanted pulmonary VX-2 carcinoma in rabbit models by using magnetic resonance diffusion-weighted imaging(M... Objective: To detect the activity of tumor cells and tumor blood flow before and after the radiotherapy of implanted pulmonary VX-2 carcinoma in rabbit models by using magnetic resonance diffusion-weighted imaging(MR-DWI) and magnetic resonance perfusion weighted imaging(MR-PWI), and to evaluate the effectiveness and safety of the radiotherapy based on the changes in the MR-DWI and MR-PWI parameters at different treatment stages.Methods: A total of 56 rabbit models with implanted pulmonary VX-2 carcinoma were established, and then equally divided into treatment group and control group. MR-DWI and MR-PWI were separately performed using a Philips Acheiva 1.5T MRI machine(Philips, Netherland). MRI image processing was performed using special perfusion software and the WORKSPACE advanced workstation for MRI. MRDWI was applied for the observation of tumor signals and the measurement of apparent diffusion coefficient(ADC) values; whereas MR-PWI was used for the measurement of wash in rate(WIR), wash out rate(WOR), and maximum enhancement rate(MER). The radiation treatment was performed using Siemens PRIMUS linear accelerator. In the treatment group, the radiotherapy was performed 21 days later on a once weekly dosage of 1,000 c Gy to yield a total dosage of 5,000 c Gy.Results: The ADC parameters in the region of interest on DWI were as follows: on the treatment day for the implanted pulmonary VX-2 carcinoma, the t values at the center and the edge of the lesions were 1.352 and 1.461 in the treatment group and control group(P〉0.05). During weeks 0-1 after treatment, the t values at the center and the edge of the lesions were 1.336 and 1.137(P〉0.05). During weeks 1-2, the t values were 1.731 and 1.736(P〈0.05). During weeks 2-3, the t values were 1.742 and 1.749(P〈0.05). During weeks 3-4, the t values were 2.050 and 2.127(P〈0.05). During weeks 4-5, the t values were 2.764 and 2.985(P〈0.05). The ADC values in the treatment group were significantly higher than in the control group. After the radiotherapy(5,000 c Gy), the tumors remarkably shrank, along with low signal on DWI, decreased signal on ADC map, and remarkably increased ADC values. As shown on PWI, on the treatment day for the implanted pulmonary VX-2 carcinoma, the t values of the WIR, WOR, and MER at the center of the lesions were 1.05, 1.31, and 1.33 in the treatment group and control group(P〉0.05); in addition, the t values of the WIR, WOR, and MER at the edge of the lesions were 1.35, 1.07, and 1.51(P〉0.05). During weeks 0-1 after treatment, the t values of the WIR, WOR, and MER at the center of the lesions were 1.821, 1.856, and 1.931(P〈0.05); in addition, the t values of the WIR, WOR, and MER at the edge of the lesions were 1.799, 2.016, and 2.137(P〈0.05). During weeks 1-1 after treatment, the t values of the WIR, WOR, and MER at the center of the lesions were 2.574, 2.156, and 2.059(P〈0.05) and the t values of the WIR, WOR, and MER at the edge of the lesions were 1.869, 2.058, and 2.057(P〈0.05). During weeks 2-3 after treatment, the t values of the WIR, WOR, and MER at the center of the lesions were 2.461, 2.098, and 2.739(P〈0.05) and the t values of the WIR, WOR, and MER at the edge of the lesions were 2.951, 2.625, and 2.154(P〈0.05). During weeks 3-4 after treatment, the t values of the WIR, WOR, and MER at the center of the lesions were 2.584, 2.107, and 2.869(P〈0.05) and the t values of the WIR, WOR, and MER at the edge of the lesions were 2.057, 2.637, and 2.951(P〈0.05). During weeks 4-5 after treatment, the t values of the WIR, WOR, and MER at the center of the lesions were 2.894, 2.827, and 3.285(P〈0.05) and the t values of the WIR, WOR, andMER at the edge of the lesions were 3.45, 3.246, and 3.614(P〈0.05). After the radiotherapy(500 c Gy), the tumors shrank on the T1 WI, WIR, WOR, and MER; meanwhile, the PWI parameter gradually decreased and reached its minimum value.Conclusions: MR-DWI and MR-PWI can accurately and directly reflect the inactivation of tumor cells and the tumor hemodynamics in rabbit models with implanted pulmonary VX-2 carcinoma, and thus provide theoretical evidences for judging the clinical effectiveness of radiotherapy for the squamous cell carcinoma of the lung. 展开更多
关键词 Magnetic resonance diffusion-weighted imaging(MR-DWI) magnetic resonance perfusion weighted imaging(MR-PWI) implanted pulmonary VX-2 carcinoma in rabbits RADIOTHERAPY
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Thermal annealing induced photocarrier radiometry enhancement for ion implanted silicon wafers 被引量:1
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作者 刘显明 李斌成 黄秋萍 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第9期519-524,共6页
An experimental study on the photocarrier radiometry signals of As^+ ion implanted silicon wafers before and after rapid thermal annealing is performed. The dependences of photocarrier radiometry amplitude on ion imp... An experimental study on the photocarrier radiometry signals of As^+ ion implanted silicon wafers before and after rapid thermal annealing is performed. The dependences of photocarrier radiometry amplitude on ion implantation dose (1×10^11-1×10^16/cm^2), implantation energy (20-140 keV) and subsequent isochronical annealing temperature (500- 1100℃ are investigated. The results show that photocarrier radiometry signals are greatly enhanced for implanted samples annealed at high temperature, especially for those with a high implantation dose. The reduced surface recombination rate resulting from a high built-in electric field generated by annealing-activated impurities in the pn junction is believed to be responsible for the photocarrier radiometry signal enhancement. Photocarrier radiometry is contactless and can therefore be used as an effective in-line tool for the thermal annealing process monitoring of the ion-implanted wafers in semiconductor industries. 展开更多
关键词 photocarrier radiometry ion implantation thermal annealing SILICON
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