Manganese silicide MnSi_(2-x) thin films have been prepared on n-type siliconsubstrates through solid phase reaction. The heterostructures were analyzed by X-ray diffraction,Rutherford backscattering spectroscopy, Fou...Manganese silicide MnSi_(2-x) thin films have been prepared on n-type siliconsubstrates through solid phase reaction. The heterostructures were analyzed by X-ray diffraction,Rutherford backscattering spectroscopy, Fourier transform infrared transmittance spectroscopy andthe four-point probe technique. The results show that two manganese silicides have been formedsequentially via the reaction of thin layer Mn with Si substrate at different irradiation annealingstages, i.e., MnSi at 450 deg C and MnSi_(1.73) at 550 deg C. MnSi_(1.73) phase exhibits preferredgrowth after irradiation with infrared. In situ four-point probe measurements of sheet resistanceduring infrared irradiation annealing show that nucleation of MnSi and phase transformation of MnSito MaSi_(1.73) occur at 410 deg C and 530 deg C, respectively; the MnSi phase shows metallicbehavior, while MnSi_(1.73) exhibits semiconducting behavior. Characteristic phonon bands ofMnSi_(2-x) silicides, which can be used for phase identification along with conventional XRDtechniques, have been observed by FTIR spectroscopy.展开更多
基金This work has been supported jointly by the National Natural Science Foundation ofChina (Crant No. 69806005)the Natural Scie
文摘Manganese silicide MnSi_(2-x) thin films have been prepared on n-type siliconsubstrates through solid phase reaction. The heterostructures were analyzed by X-ray diffraction,Rutherford backscattering spectroscopy, Fourier transform infrared transmittance spectroscopy andthe four-point probe technique. The results show that two manganese silicides have been formedsequentially via the reaction of thin layer Mn with Si substrate at different irradiation annealingstages, i.e., MnSi at 450 deg C and MnSi_(1.73) at 550 deg C. MnSi_(1.73) phase exhibits preferredgrowth after irradiation with infrared. In situ four-point probe measurements of sheet resistanceduring infrared irradiation annealing show that nucleation of MnSi and phase transformation of MnSito MaSi_(1.73) occur at 410 deg C and 530 deg C, respectively; the MnSi phase shows metallicbehavior, while MnSi_(1.73) exhibits semiconducting behavior. Characteristic phonon bands ofMnSi_(2-x) silicides, which can be used for phase identification along with conventional XRDtechniques, have been observed by FTIR spectroscopy.
