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Growth of bismuth telluride thin film on Pt by electrochemical atomic layer epitaxy 被引量:3
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作者 朱文 杨君友 +3 位作者 郜鲜辉 侯杰 张同俊 崔昆 《中国有色金属学会会刊:英文版》 CSCD 2005年第2期404-409,共6页
An automated thin-layer flow cell electrodeposition system was developed for growing Bi2Te3 thin film by ECALE. The dependence of the Bi and Te deposition potentials on Pt electrode was studied. In the first attempt, ... An automated thin-layer flow cell electrodeposition system was developed for growing Bi2Te3 thin film by ECALE. The dependence of the Bi and Te deposition potentials on Pt electrode was studied. In the first attempt, this reductive Te underpotential deposition (UPD)/reductive Bi UPD cycle was performed to 100 layers. A better linearity of the stripping charge with the number of cycles has been shown and confirmed a layer-by-layer growth mode, which is consistent with an epitaxial growth. The 4∶3 stoichiometric ratio of Bi to Te suggests that the incomplete charge transfer in HTeO+2 reduction excludes the possibility of Bi2Te3 formation. X-ray photoelectron spectroscopy (XPS) analysis also reveals that the incomplete charge transfer in HTeO+2 occurs in Te direct deposition. The effective way of depositing Bi2Te3 on Pt consists in oxidative Te UPD and reductive Bi UPD. The thin film deposited by this procedure was characterized by X-ray diffraction(XRD), scanning electron microscopy(SEM) and X-ray photoelectron spectroscopy(XPS). A polycrystalline characteristic was confirmed by XRD. The 2∶3 stoichiometric ratio was confirmed by XPS. The SEM image indicates that the deposit looks like a series of buttons about (0.30.4 μm) in diameter, which is corresponding with calculated thickness of the epitaxial film. This suggests that the particle growth appears to be linear with the number of cycles, as it is consistent with a layer by layer growth mode. 展开更多
关键词 热电材料 碲化铋 薄膜生长 电化学原子外延附生
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Gas-sensing Properties of Bismuth Iron Molybdate Thin Films
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作者 胡兴定 《Rare Metals》 SCIE EI CAS CSCD 1997年第4期73-77,共5页
The thin film gas sensors of bismuth iron molybdate were prepared by ion beam sputtering technique. The prototype gas sensors studied have high sensitivity and selectivity to reducing gases, such as ethanol vapor, s... The thin film gas sensors of bismuth iron molybdate were prepared by ion beam sputtering technique. The prototype gas sensors studied have high sensitivity and selectivity to reducing gases, such as ethanol vapor, show a long term stability of response under most operating conditions and insensitivity to atmospheric humidity, and respond quickly comparing to traditional sintered gas sensors. The crystallographic structure and phase composition of these thin films were investigated with XRD, XPS and SEM techniques. 展开更多
关键词 bismuth iron molybdate Ion beam sputtering Thin film Gas sensing properties
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Electrochemical Deposition and Optimization of Thermoelectric Nanostructured Bismuth Telluride Thick Films
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作者 Hesham M. A. Soliman Abdel-Hady B. Kashyout 《Engineering(科研)》 2011年第6期659-667,共9页
Bismuth telluride thick films are suitable for thermoelectric (TE) devices covering large areas and operating at small-to-moderate temperature differences (20 - 200 K). High efficiency and high coefficient of performa... Bismuth telluride thick films are suitable for thermoelectric (TE) devices covering large areas and operating at small-to-moderate temperature differences (20 - 200 K). High efficiency and high coefficient of performance (COP) are expected to be achieved by using thick films in some cooling applications. Bismuth telluride thick films fabrication have been achieved with Galvanostatic and Potentionstatic deposition. Stoichiometric bismuth telluride thick film was obtained by Galvanostatic deposition at current density of 3.1 mAcm-2. Bismuth telluride films with average growth rate of 10 μmh-1 and different composition were obtained. Effects of current density and composition of electrolyte in Galvanostatic deposition were studied. The current density affected the film compactness, where films deposited at lower current density were more compact than those deposited at higher current density. The morphology of the films did not depend on the current density, but chemical composition was observed when different composition of electrolyte was used. Effects of distance between electrodes, composition of electrolyte solution, and stirring in Potentionstatic deposition were studied. The shorter the distance between electrodes, the higher the electric field, thus the higher current density was applied and the deposited film was less compact. The current density increased more rapidly with stirring during electrodeposition which leads to less compact film. Through this study, films electrode-posited from solution containing 0.013 M Bi(NO3)3.5 H2O, 0.01 M TeO2 and 1 M HNO3 at 3.1 mA cm-2 for 6 hours without stirring and with interelectrode distance of 4.5 cm were free-standing with average film thickness of 60 μm and optimum film composition of Bi2Te3. The crystallite size of the later films was found to be around 4.3 nm using Scherrer’s equation from XRD patterns. Also, negative Seebeck coefficient for the same samples was revealed with an average value of -82 μV.K-1. 展开更多
关键词 bismuth TELLURIDE THERMOELECTRIC ELECTRODEPOSITION NANOSTRUCTURE Thick film
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Bismuth Substituted Yttrium Iron Garnet Single Crystal Films Prepared by Sol-gel Method
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作者 HUANG Min (Dept.of Inform. and Comput.Sci., City College,Zhejiang University,Hangzhou 310015, CHN ) 《Semiconductor Photonics and Technology》 CAS 2002年第4期259-262,共4页
Magneto-optic Faraday rotation effect and the amount of bismuth substituted in yttrium iron garnet single crystal films prepared by gel-coating on modified gadolinium-gallium garnet substrates are investigated, where ... Magneto-optic Faraday rotation effect and the amount of bismuth substituted in yttrium iron garnet single crystal films prepared by gel-coating on modified gadolinium-gallium garnet substrates are investigated, where the gel is synthesized by a sol-gel reaction of nitrates and ethylene glycol. The coated gel is annealed in air at temperatures up to 660 ℃ for 4 h, which is about 300 ℃ lower than that of liquid-phase epitaxy. The maximum amount of Bi substitution is x =2.7 and the crystallization temperature of garnet phase decreases with the increase of x down to 520 ℃ for x =2.7. In this film, a huge Faraday rotation of -8.1×10 4 (°)/cm at λ =0.633 μm is obtained. 展开更多
关键词 bismuth-substituted GARNET thin filmS FARADAY rotation effect Sol-gel method
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Electrodeposition and characterization of thermoelectric Bi_2Se_3 thin films 被引量:2
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作者 Xiao-long Li Ke-feng Cai Hui Li Ling Wang Chi-wei Zhou 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2010年第1期104-107,共4页
Bi2Se3 thin films were electrochemically deposited on Ti and indium tin oxide-coated glass substrates, respectively, at room temperature, using Bi(NO3)3·5H2O and SeO2 as starting materials in diluted HNO3 solut... Bi2Se3 thin films were electrochemically deposited on Ti and indium tin oxide-coated glass substrates, respectively, at room temperature, using Bi(NO3)3·5H2O and SeO2 as starting materials in diluted HNO3 solution. A conventional three-electrode cell was used with a platinum sheet as a counter electrode, and a saturated calomel electrode was used as a reference electrode. The films were annealed in argon atmosphere. The influence of cold isostatic pressing before annealing on the microstructure and thermoelectric properties of the films was investigated. X-ray diffraction analysis indicates that the film grown on the indium tin oxide-coated glass substrate is pure rhombohedral Bi2Se3, and the film grown on the Ti substrate consists of both rhombohedral and orthorhombic Bi2Se3. 展开更多
关键词 thermoelectric thin films bismuth selenide ELECTRODEPOSITION thermoelectric properties cold isostafic pressing
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Additive-aided electrochemical deposition of bismuth telluride in a basic electrolyte
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作者 Wu-jun Qiu Sheng-nan Zhang Tie-jun Zhu Xin-bing Zhao 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2010年第4期489-493,共5页
A new basic electrolyte with two cationic plating additives, polydiaminourea and polyaminosulfone, was investigated for the electrochemical deposition of the bismuth telluride film on a nickel-plated copper foil. Tell... A new basic electrolyte with two cationic plating additives, polydiaminourea and polyaminosulfone, was investigated for the electrochemical deposition of the bismuth telluride film on a nickel-plated copper foil. Tellurium starts to deposit at a higher potential (-0.35 V) than bismuth (-0.5 V) in this electrolyte. The tellurium-to-bismuth ratio increases while the deposition potential declines from -1 to -1.25 V, indicating a kinetically quicker bismuth deposition at higher potentials. The as-deposited film features good adhesion to the substrate and smooth morphology, and has a nearly amorphous crystal structure disclosed by X-ray diffraction patterns. 展开更多
关键词 thin films thermoelectric materials electrochemical deposition bismuth telluride basic electrolyte
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Studies on Preparation of Co-Bi Alloy Films by Electrodeposition From Nonaqueous Medium
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作者 LI Gao-ren TONG Ye-xiang LIU Guan-kun 《Chemical Research in Chinese Universities》 SCIE CAS CSCD 2003年第4期499-503,共5页
Cyclic voltammetry and potentiostatic electrolysis were used to investigate the preparation of Co-Bi alloy films in a LiClO 4-DMSO system. The experimental results indicate that the Co-Bi alloy films containing 14 35%... Cyclic voltammetry and potentiostatic electrolysis were used to investigate the preparation of Co-Bi alloy films in a LiClO 4-DMSO system. The experimental results indicate that the Co-Bi alloy films containing 14 35%-29 77% Co can be prepared via potentionstatic electrolysis on Cu substrates, at deposition potential -1 10--1 65 V( vs. SCE) and by controlling the system composition and deposition condition. They are uniform gray films with a metallic luster and they are adhered firmly to the Cu substrate. The films were analyzed by EDS, SEM and XRD. After heat treatment of crystallization at 275 ℃ for 1 h, the alloy phase of Co-Bi can be confirmed via the XRD pattern. 展开更多
关键词 bismuth Co-Bi alloy film ELECTRODEPOSITION DMSO
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STUDY ON CO-ELECTRODEPOSITION OF Bi-Fe ALLOY FILMS IN ORGANIC BATH
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作者 G.R. Li, Y.X. Tong and G.K. LiuSchool of Chemistry and Chemical Engineering, Zhongshan University, Guangzhou 510275, China 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2003年第6期507-512,共6页
The cyclic voltametry and potentiostatic electrolysis was used to investigate the preparation of Bi-Fe alloy films in LiClO4-DMSO (dimethylsulfoxide) system. The effects of several factors including the potential of d... The cyclic voltametry and potentiostatic electrolysis was used to investigate the preparation of Bi-Fe alloy films in LiClO4-DMSO (dimethylsulfoxide) system. The effects of several factors including the potential of deposition, current density and concentration of iron and bismuth in the solution on the Fe content in the alloy deposits were studied. Experimental results indicated that the amorphous alloy films of Bi-Fe containing Fe 4.40wt%-33.67wt% could be prepared by controlling the system composition and deposition conditions. They were gray, uniform, metallic luster and adhered firmly to the copper substrates analyzed by EDS, SEM and XRD. After heat treatment of crystallization at 270℃ for 1h, the crystal phase of Bi-Fe can be found in XRD patterns. 展开更多
关键词 bismuth Bi-Fe alloy film ELECTRODEPOSITION DMSO (dimethyl-sulfoxide)
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Origin of the metallic to insulating transition of an epitaxial Bi(111) film grown on Si(111)
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作者 庞斐 梁学锦 +2 位作者 廖昭亮 尹树力 陈东敏 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第8期543-547,共5页
Transport characteristics of single crystal bismuth films on Si(111)-7×7 are found to be metallic or insulating at temperature below or above Tc, respectively. The transition temperature Tc decreases as the fil... Transport characteristics of single crystal bismuth films on Si(111)-7×7 are found to be metallic or insulating at temperature below or above Tc, respectively. The transition temperature Tc decreases as the film thickness increases. By combining thickness dependence of the films resistivity, we find the insulating behaviour results from the states inside film, while the metallic behaviour originates from the interface states. We show that quantum size effect in a Bi film, such as the semimetal-to-semiconductor transition, is only observable at a temperature higher than Tc. 展开更多
关键词 bismuth film interface states Rashba spin-splitting semimetal-to-semiconductor transition
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Preparation of Bi_(2-x)Sb_xTe_3 thermoelectric films by electrodeposition
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作者 Qinghua Huang Wei Wang Falong Jia Zhirong Zhang 《Journal of University of Science and Technology Beijing》 CSCD 2006年第3期277-280,共4页
Bi2-xSbxTe3 thermoelectric films were electrochemically deposited from the solution containing Bi^3+, HTeO2^+and SbO^+. ESEM (environmental scanning electron microscope) investigations indicated that the crystall... Bi2-xSbxTe3 thermoelectric films were electrochemically deposited from the solution containing Bi^3+, HTeO2^+and SbO^+. ESEM (environmental scanning electron microscope) investigations indicated that the crystalline state of Bi2-xSbxTe3 films transformed from equiaxed crystal to dendritic crystal with the negative shift of deposition potential. XRD and EDS were used to characterize the structure and composition of the electrodeposited films. The Seebeck coefficient and the temperature dependence of the resistance of Bi2-xSbxTe3 films were measured. The results showed that the composition of the film electrodeposited at -0.5 V is Bi2-xSbxTe3 with the largest Seebeck coefficient of 213 μV·K^-1. 展开更多
关键词 thermoelectric films bismuth antimony telluride compounds ELECTRODEPOSITION Seebeck coefficient morphology
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Preparation and Characterization of P-Type Bi<sub>0.45</sub>Sb<sub>1.55</sub>Te<sub>3</sub>Thin Film Using Pulsed CO<sub>2</sub>Laser
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作者 Rakdiaw Muangma Voravit Kosalathip +1 位作者 Taswal Kumpeerapun Pichet Limsuwan 《Materials Sciences and Applications》 2014年第5期285-291,共7页
P-type Bi0.45Sb1.55Te3 thermoelectric material was synthesized using cold pressing process. The obtained sample was prepared in the form of pellet with a diameter of 10 mm and 2 mm thick and used as a target for laser... P-type Bi0.45Sb1.55Te3 thermoelectric material was synthesized using cold pressing process. The obtained sample was prepared in the form of pellet with a diameter of 10 mm and 2 mm thick and used as a target for laser ablation. The laser source was a pulsed CO2 laser working at a wavelength of 10.6 μm with a laser energy density of 2 J/cm2 per pulse. P-type Bi0.45Sb1.55Te3 thermoelectric thin films were deposited on Si substrates for different ablation times of 1, 2 and 3 h. The cross-section and surface morphologies of the thermoelectric films were investigated using field emission scanning electron microscopy (FE-SEM). The results show that the thickness and average particle size of the films increased from 35 to 58 nm, and 28 to 35 nm, respectively, when the ablation time was increased from 1 to 3 h. The crystalline structure of the TE films was investigated by X-ray diffraction (XRD). 展开更多
关键词 LASER Ablation PULSED CO2 LASER bismuth ANTIMONY TELLURIDE Thermoelectric Thin film
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Electrical characteristics and microstructures of Pr_6O_(11)-doped Bi_4Ti_3O_(12) thin films
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作者 陈敏 黄可龙 +3 位作者 梅孝安 黄重庆 刘靖 蔡安辉 《中国有色金属学会会刊:英文版》 CSCD 2009年第1期138-142,共5页
Pr6O11-doped bismuth titanate (BixPryTi3O12, BPT) thin films with random orientation were fabricated on Pt/Ti/SiO2/Si substrates by rf magnetron sputtering technique, and the structures and ferroelectric properties of... Pr6O11-doped bismuth titanate (BixPryTi3O12, BPT) thin films with random orientation were fabricated on Pt/Ti/SiO2/Si substrates by rf magnetron sputtering technique, and the structures and ferroelectric properties of the films were investigated. XRD studies indicate that all of BPT films consist of single phase of a bismuth-layered structure with well-developed rod-like grains. For samples with y=0.06 , 0.3, 1.2 and 1.5, I—E characteristics exhibit negative differential resistance behaviors and their ferroelectric hysteresis loops are characterized by large leakage current. Whereas for samples with y=0.6 and 0.9, I—E characteristics are of simple ohmic behaviors and their ferroelectric hysteresis loops are saturated and undistorted. The remanent polarization (Pr) and coercive field (Ec) of the BPT Film with y=0.9 are above 35 μC/cm2 and 80 kV/cm, respectively. 展开更多
关键词 特种合金 铁电体 铁电薄膜 掺杂
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Bi_(2)O_(3)电致变色薄膜的膜厚甄选
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作者 吴浩 赵加栋 +1 位作者 刘春雨 俞圣雯 《上海大学学报(自然科学版)》 CAS CSCD 北大核心 2024年第1期43-53,共11页
为了得到能够呈现出合理电致变色性能的Bi_(2)O_(3)薄膜,需要筛选其膜厚.通过磁控溅射法制备得到厚度为20~300 nm的Bi_(2)O_(3)薄膜,并利用UH4150紫外可见(ultravioletvisible,UV-Vis)分光光度计和CHI-660e电化学工作站测试薄膜的电致... 为了得到能够呈现出合理电致变色性能的Bi_(2)O_(3)薄膜,需要筛选其膜厚.通过磁控溅射法制备得到厚度为20~300 nm的Bi_(2)O_(3)薄膜,并利用UH4150紫外可见(ultravioletvisible,UV-Vis)分光光度计和CHI-660e电化学工作站测试薄膜的电致变色性能.采用扫描电子显微镜(scanning electron microscope,SEM)和X射线衍射仪(X-ray diffraction,XRD)分别检测了薄膜的表面形貌和物相结构.对变色对比度(ΔT_(λ=550 nm))、电致变色效率(η)以及性能保留度(R_(ΔT)、R_(η))的表现进行综合甄别,发现膜厚介于60~120 nm之间的Bi_(2)O_(3)薄膜的ΔT和η分别达到25%和10 cm^(2)/C,并且具有较高的电致变色性能保留度(R_(ΔT)=20%、R_(η)=44.6%).这可能与该厚度区间薄膜的主要物相为具有较高离子导电性的δ相有关. 展开更多
关键词 膜厚 氧化铋 电致变色 薄膜
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CaBi_(2)Nb_(2)O_(9)铁电薄膜的生长取向调控和性能研究
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作者 任冠源 李宜冠 +2 位作者 丁冬海 梁瑞虹 周志勇 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2024年第11期1228-1234,共7页
铋层状铌酸铋钙(CaBi_(2)Nb_(2)O_(9),CBN)铁电薄膜具有良好的铁电性能和疲劳特性,是铁电随机存储器的重要候选材料之一。铋层状结构薄膜a轴外延生长对其高质量集成和应用具有重要意义,然而CBN结构的各向异性使其根据晶体学调节自发极... 铋层状铌酸铋钙(CaBi_(2)Nb_(2)O_(9),CBN)铁电薄膜具有良好的铁电性能和疲劳特性,是铁电随机存储器的重要候选材料之一。铋层状结构薄膜a轴外延生长对其高质量集成和应用具有重要意义,然而CBN结构的各向异性使其根据晶体学调节自发极化更具挑战性。本研究采用脉冲激光沉积技术,在MgO(100)衬底上通过改变沉积温度的方式,实现了CBN薄膜的取向生长。在500、600和700℃沉积温度下分别生长出(115)、(200)和(00l)取向的CBN薄膜,并且随着沉积温度升高,CBN薄膜发生了(115)-(200)-(00l)取向的转变。扫描电子显微镜(SEM)结果表明,600℃是CBN薄膜在MgO衬底上高质量a轴外延生长的最优沉积温度,薄膜与衬底键合良好,粗糙度较低。高分辨X射线衍射(HRXRD)和高分辨透射电子显微镜(HRTEM)分析表明,(200)取向的CBN薄膜为异质外延生长,其与MgO衬底之间形成半共格界面,CBN/MgO异质结构外延关系为(100)[001]CBN//(100)[001]MgO。CBN界面处的(200)平均间距为0.5312 nm,结合晶格匹配关系,提出了一种可能的外延匹配方式:4个CBN晶胞共同占用5个MgO晶格。此外,通过压电力显微镜(PFM)发现了(115)取向CBN薄膜具有纳米畴结构,以及(200)取向CBN薄膜表现出良好的面外极化翻转。 展开更多
关键词 外延薄膜 生长机制 取向调控 铌酸铋钙
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铁酸铋薄膜柔性化微纳制造及铁电性能
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作者 乔骁骏 李雅青 丑修建 《半导体技术》 北大核心 2024年第2期138-142,共5页
研究了铁酸铋薄膜的柔性化可控制造方法及其电畴调控动态。利用脉冲激光沉积法制备了周期性畴结构的铁酸铋薄膜,结合可控剥离技术,完成了铁酸铋薄膜从刚性基底到柔性基底的制备过程。利用原子力显微镜和压电力显微镜技术对柔性化铁酸铋... 研究了铁酸铋薄膜的柔性化可控制造方法及其电畴调控动态。利用脉冲激光沉积法制备了周期性畴结构的铁酸铋薄膜,结合可控剥离技术,完成了铁酸铋薄膜从刚性基底到柔性基底的制备过程。利用原子力显微镜和压电力显微镜技术对柔性化铁酸铋薄膜的微观形貌和铁电特性进行表征。结果表明,柔性化后的铁酸铋薄膜保持完整的表面形貌特征(粗糙度保持不变),电畴反转特性保持可调,且保持良好的铁电特性及电畴反转响应。该研究为铁酸铋薄膜的柔性化制备提供了一种新思路。 展开更多
关键词 铁电薄膜 柔性 铁酸铋 极化 电畴反转
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GaAsBi半导体材料的制备及应用研究进展
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作者 马玉麟 郭祥 丁召 《人工晶体学报》 北大核心 2024年第1期25-37,共13页
稀铋Ⅲ-Ⅴ半导体材料在电子和光电子领域具有广泛的应用前景,其制备方法主要有分子束外延法(MBE)和金属有机物气相外延法(MOVPE)。本文聚焦于具有较大带隙收缩、温度不敏感以及强自旋轨道分裂等特殊物理特性的GaAs_(x)Bi_(1-x)半导体材... 稀铋Ⅲ-Ⅴ半导体材料在电子和光电子领域具有广泛的应用前景,其制备方法主要有分子束外延法(MBE)和金属有机物气相外延法(MOVPE)。本文聚焦于具有较大带隙收缩、温度不敏感以及强自旋轨道分裂等特殊物理特性的GaAs_(x)Bi_(1-x)半导体材料,对其制备方法和研究进展进行了综述。研究人员对GaAsBi材料的研究主要集中在薄膜、多量子阱、纳米线和量子点材料的制备。在薄膜材料方面,侧重于研究制备工艺条件对GaAsBi薄膜的影响,例如低衬底温度、低生长速率和非常规的Ⅴ/Ⅲ束流比;在多量子阱材料方面,采用双衬底温度技术有效减少Bi偏析问题;对于纳米线和量子点材料,金属Bi作为表面活性剂可以改善材料的形貌和光学性能。然而,目前在该材料研究和应用方面仍存在挑战,如薄膜材料的结晶质量恶化和金属Bi分凝团聚,以及量子点材料中Bi的均匀性和形成机制的争议。解决这些问题对于提高GaAs_(x)Bi_(1-x)半导体材料的质量和促进器件发展具有重要意义。 展开更多
关键词 稀铋Ⅲ-Ⅴ半导体材料 GaAsBi薄膜 多量子阱材料 量子点材料 MBE MOVPE
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Surface modification by ligand growth strategy for dense copper bismuth film as photocathode to enhance hydrogen production activity
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作者 Zhouzhou WANG Qingwei WU +1 位作者 Jieming WANG Ying YU 《Frontiers in Energy》 SCIE EI CSCD 2024年第1期89-100,共12页
Hydrogen production from photoelectrochemical(PEC)water splitting has been regarded as a promising way to utilize renewable and endless solar energy.However,semiconductor film grown on photoelectrode suffers from nume... Hydrogen production from photoelectrochemical(PEC)water splitting has been regarded as a promising way to utilize renewable and endless solar energy.However,semiconductor film grown on photoelectrode suffers from numerous challenges,leading to the poor PEC performance.Herein,a straightforward sol-gel method with the ligand-induced growth strategy was employed to obtain dense and homogeneous copper bismuthate photocathodes for PEC hydrogen evolution reaction.By various characterizations,it was found that the nucleation and surface growth of CuBi_(2)O_(4)layer induced by 2-methoxyethanol ligand(2-CuBi_(2)O_(4))demonstrated a decent crystallinity and coverage,as well as a large grain size and a low oxygen vacancy concentration,leading to the good ability of light absorption and carrier migration.Consequently,under simulated sunlight irradiation(AM1.5G,100 mW/cm^(2)),the 2-CuBi_(2)O_(4)photocathode achieved an enhanced photocurrent density of−1.34 mA·cm^(−2)at 0.4 V versus the reversible hydrogen electrode and a promising applied bias photon-to-current efficiency of 0.586%.This surface modification by ligand growth strategy will shed light on the future design of advanced photoelectrodes for PEC water splitting. 展开更多
关键词 copper bismuthate PHOTOCATHODE ligand growth strategy dense film PEC
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碲化铋基柔性热电器件研究进展
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作者 顾晓凤 戈镇洲 +2 位作者 舒元春 彭德权 陈金伟 《材料研究与应用》 CAS 2024年第5期695-709,共15页
碲化铋基柔性热电器件具有体积小、质量轻、可变形、可弯折的特点,能够实现高密度阵列集成,契合未来电子信息领域对高性能、微型化、低功耗器件的发展需求。该种器件适用于复杂几何结构和不规则曲率变化的表面,能够满足物联网、可穿戴... 碲化铋基柔性热电器件具有体积小、质量轻、可变形、可弯折的特点,能够实现高密度阵列集成,契合未来电子信息领域对高性能、微型化、低功耗器件的发展需求。该种器件适用于复杂几何结构和不规则曲率变化的表面,能够满足物联网、可穿戴设备、微电子芯片行业对微能源供应、小空间快速制冷、个人热量管理的需求。综述了近年来碲化铋基柔性热电器件研究进展和存在的问题,并对其未来的发展方向进行了展望。虽然碲化铋基柔性热电器件的研究取得了一定的进展,但整体上仍处于实验室阶段,实现大规模商用应用还有一段距离,今后应侧重于输出功率的提升、穿戴舒适性和美观性、服役稳定性和使用寿命,以及降低制造难度方面的研究。碲化铋基柔性热电器件主要分为块体型、薄膜型和纺织物型3大类型。块体型器件的输出功率一般可达1×10^(-5)W·cm^(-2),但其柔韧性和穿戴舒适性不足,可通过提高碲化铋基热电材料本身的ZT值、优化负载电阻、选择热导率低的封装材料,以及合理设计封装元件尺寸和热电臂的形状、数目和连接方式等方法来持续提高其热电性能,可通过开发柔韧性更高、甚至具备自愈能力的封装材料和连接材料来提升其柔韧性和穿戴舒适性。薄膜型器件的输出功率一般在1×10-6—1×10^(-9)W·cm^(-2)之间,还达不到实际应用需求,通过提升碲化铋基薄膜制备技术并优化工艺参数来提高薄膜本身热电性能,开发热稳定性、电阻率、导热系数更优的热电界面材料,从而降低接触热阻导致的界面热损失,提高输出功率和转换效率,通过选择柔韧性和机械稳定性更高的基底材料来其使用寿命。纺织物型器件具有较好的拉伸、弯曲和剪切性能,能满足穿戴的舒适性要求,但热电性能较差,输出功率也普遍在1×10-6—1×10^(-9)W·cm^(-2)之间,且稳定性不足,可通过改进涂印和浸渍工艺来提高纱线表面碲化铋基热电材料的均匀性,创新热电纱线组装的结构以在织物厚度方向上更好地建立温差,从而提高其热电性能。本研究为碲化铋基柔性热电器件的应用提供了理论参考。 展开更多
关键词 碲化铋 柔性 热电 器件 块体型 薄膜型 纺织物型 性能
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浓度梯度掺杂实现BiFeO_(3)薄膜自极化
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作者 戴乐 刘洋 +6 位作者 高轩 王书豪 宋雅婷 唐明猛 DMITRY V Karpinsky 刘丽莎 汪尧进 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2024年第1期99-106,I0006,I0007,共10页
BiFeO_(3)是一种非常有前途的无铅铁电材料,与大多数传统铁电材料相比,它具有更大的极化和更高的居里温度,为高温应用提供了可能。受到衬底强烈的夹持效应、较大的矫顽场和漏电流的影响,BiFeO_(3)薄膜难以被极化。自极化是解决这一问题... BiFeO_(3)是一种非常有前途的无铅铁电材料,与大多数传统铁电材料相比,它具有更大的极化和更高的居里温度,为高温应用提供了可能。受到衬底强烈的夹持效应、较大的矫顽场和漏电流的影响,BiFeO_(3)薄膜难以被极化。自极化是解决这一问题的可行方法。本研究采用溶胶-凝胶法在Pt(111)/Ti/SiO_(2)/Si衬底上生长了BiFeO_(3)薄膜,向上梯度薄膜(从衬底BiFeO_(3)过渡到薄膜表面Bi_(0.80)Ca_(0.20)FeO_(2.90))以及向下梯度薄膜(从衬底Bi_(0.80)Ca_(0.20)FeO_(2.90)过渡到薄膜表面BiFeO_(3))。通过细致地调控薄膜内部缺陷的定向分布形成内置电场,从而导致薄膜具有自极化特性。压电力显微镜结果表明:在BiFeO_(3)薄膜中,Ca的梯度方向可以调控自极化的方向。此外,类似二极管的单向导通特性验证了薄膜的自极化是由Ca的浓度梯度掺杂导致。X射线光电子能谱结果表明,氧空位的梯度分布导致的内置电场可能是造成自极化现象的原因。本研究为实现铁电薄膜的自极化提供了一种新的策略,并在以自极化的内置电场为驱动,提高光伏或光敏器件性能方面具有潜在的应用前景。 展开更多
关键词 自极化 梯度掺杂 铁酸铋薄膜 溶胶-凝胶法
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Si(111)邻位面衬底上InSb薄膜的外延生长及其可见光电导特性
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作者 杜绍增 方晨旭 +1 位作者 刘婷 李含冬 《半导体光电》 CAS 北大核心 2024年第5期811-816,共6页
锑化铟(InSb)因其在红外探测、高速电子学和量子计算等领域的卓越性能备受关注。文章探索了Si(111)邻位面衬底上InSb薄膜的异质外延生长,并研究了其光电导特性。尝试采用Bi缓冲层结合InSb两步法生长策略解决Si与InSb晶格失配和热膨胀系... 锑化铟(InSb)因其在红外探测、高速电子学和量子计算等领域的卓越性能备受关注。文章探索了Si(111)邻位面衬底上InSb薄膜的异质外延生长,并研究了其光电导特性。尝试采用Bi缓冲层结合InSb两步法生长策略解决Si与InSb晶格失配和热膨胀系数差异大的问题,在平坦Si(111)衬底上获得了高质量InSb(111)单晶薄膜。然而,在具有高密度台阶结构特征的Si(111)斜切衬底表面上生长得到的Bi(001)缓冲层存在大量倒反畴缺陷,在该表面上进一步生长得到的InSb薄膜均为多晶结构。所制备的InSb/Bi/Si异质结构在模拟日光辐照条件下显示出负光电导效应,应与异质结构界面态对InSb层光生载流子的捕获效应有关。 展开更多
关键词 INSB薄膜 SI衬底 临位面外延 Bi缓冲层
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