In this paper, a new intelligent control method is introduced, which combines stipulations, optimal control method with knowledge based control. Using nonlinear programming method and expert experience for the compli...In this paper, a new intelligent control method is introduced, which combines stipulations, optimal control method with knowledge based control. Using nonlinear programming method and expert experience for the complicated nonlinear object, the good control result can be achieved. The effect of this method is shown by a simulation of three stage inverted pendulums.展开更多
This work presents an implementation of an innovative single phase multilevel inverter using capacitors with reduced switches. The proposed Capacitor pattern H-bridge Multilevel Inverter (CPHMLI) topology consists of ...This work presents an implementation of an innovative single phase multilevel inverter using capacitors with reduced switches. The proposed Capacitor pattern H-bridge Multilevel Inverter (CPHMLI) topology consists of a proper number of Capacitor connected with switches and power sources. The advanced switching control supplied by Pulse Width Modulation (PDPWM) to attain mixed staircase switching state. The charging and discharging mode are achieved by calculating the voltage error at the load. Furthermore, to accomplish the higher voltage levels at the output with less number of semiconductors switches and simple commutation designed using CPHMLI topology. To prove the performance and effectiveness of the proposed approach, a set of experiments performed under various load conditions using MATLAB tool.展开更多
Efficiently modulating the velocity distribution and flow pattern of non-Newtonian fluids is a critical challenge in the context of dual shaft eccentric mixers for process intensification,posing a significant barrier ...Efficiently modulating the velocity distribution and flow pattern of non-Newtonian fluids is a critical challenge in the context of dual shaft eccentric mixers for process intensification,posing a significant barrier for the existing technologies.Accordingly,this work reports a convenient strategy that changes the kinetic energy to controllably regulate the flow patterns from radial flow to axial flow.Results showed that the desired velocity distribution and flow patterns could be effectively obtained by varying the number and structure of baffles to change kinetic energy,and a more uniform velocity distribution,which could not be reached normally in standard baffle dual shaft mixers,was easily obtained.Furthermore,a comparative analysis of velocity and shear rate distributions is employed to elucidate the mechanism behind the generation of flow patterns in various dual-shaft eccentric mixers.Importantly,there is little difference in the power number of the laminar flow at the same Reynolds number,meaning that the baffle type has no effect on the power consumption,while the power number of both unbaffle and U-shaped baffle mixing systems decreases compared with the standard baffle mixing system in the transition flow.Finally,at the same rotational condition,the dimensionless mixing time of the U-shaped baffle mixing system is 15.3%and 7.9%shorter than that of the standard baffle and the unbaffle mixing system,respectively,which shows the advantage of the U-shaped baffle in stirring rate.展开更多
In this paper,the anisotropic etching process of Si(100) wafers in tetramethyl ammonium hydroxide(TMAH) solution with isopropyl alcohol(IPA) is investigated in detail. An inverted trapezoidal pattern is developed. A s...In this paper,the anisotropic etching process of Si(100) wafers in tetramethyl ammonium hydroxide(TMAH) solution with isopropyl alcohol(IPA) is investigated in detail. An inverted trapezoidal pattern is developed. A series of experiments are performed by changing TMAH concentration,IPA concentration,etching temperature and etching time. The structure of inverted trapezoidal patterns and roughness of the bottom surface are characterized by scanning electron microscopy(SEM) and atomic force microscopy(AFM). The results show that with TMAH concentration increases,the roughness of bottom surface will decrease. The addition of IPA into TMAH solution improves the morphology of the bottom surface significantly. Low temperature is beneficial to get a smooth bottom surface. Furthermore,etching time can change the bottom surface roughness. A model is proposed to explain the etching processes. The hillock area ratio of the bottom surface has the same tendency as the etching area ratio. Finally,smooth silicon inverted trapezoidal patterns are obtained for epitaxial growth of Ga N-based light emitting diode(LED) devices.展开更多
文摘In this paper, a new intelligent control method is introduced, which combines stipulations, optimal control method with knowledge based control. Using nonlinear programming method and expert experience for the complicated nonlinear object, the good control result can be achieved. The effect of this method is shown by a simulation of three stage inverted pendulums.
文摘This work presents an implementation of an innovative single phase multilevel inverter using capacitors with reduced switches. The proposed Capacitor pattern H-bridge Multilevel Inverter (CPHMLI) topology consists of a proper number of Capacitor connected with switches and power sources. The advanced switching control supplied by Pulse Width Modulation (PDPWM) to attain mixed staircase switching state. The charging and discharging mode are achieved by calculating the voltage error at the load. Furthermore, to accomplish the higher voltage levels at the output with less number of semiconductors switches and simple commutation designed using CPHMLI topology. To prove the performance and effectiveness of the proposed approach, a set of experiments performed under various load conditions using MATLAB tool.
基金supported by the National Natural Science Foundation of China(22078030,52021004)Natural Science Foundation of Chongqing(2022NSCO-LZX0014)+1 种基金Fundamental Research Funds for the Central Universities(2022CDJQY-005,2023CDJXY-047)National Key Research and Development Project(2022YFC3901204)。
文摘Efficiently modulating the velocity distribution and flow pattern of non-Newtonian fluids is a critical challenge in the context of dual shaft eccentric mixers for process intensification,posing a significant barrier for the existing technologies.Accordingly,this work reports a convenient strategy that changes the kinetic energy to controllably regulate the flow patterns from radial flow to axial flow.Results showed that the desired velocity distribution and flow patterns could be effectively obtained by varying the number and structure of baffles to change kinetic energy,and a more uniform velocity distribution,which could not be reached normally in standard baffle dual shaft mixers,was easily obtained.Furthermore,a comparative analysis of velocity and shear rate distributions is employed to elucidate the mechanism behind the generation of flow patterns in various dual-shaft eccentric mixers.Importantly,there is little difference in the power number of the laminar flow at the same Reynolds number,meaning that the baffle type has no effect on the power consumption,while the power number of both unbaffle and U-shaped baffle mixing systems decreases compared with the standard baffle mixing system in the transition flow.Finally,at the same rotational condition,the dimensionless mixing time of the U-shaped baffle mixing system is 15.3%and 7.9%shorter than that of the standard baffle and the unbaffle mixing system,respectively,which shows the advantage of the U-shaped baffle in stirring rate.
基金supported by the National Natural Science Foundation of China(Nos.51472229,61422405,51202238,61306051 and 61474109)the “100 Talent Program” of Chinese Academy of Sciencesthe Opening Funding of State Key Lab of Silicon Materials(No.SKL2014-4)
文摘In this paper,the anisotropic etching process of Si(100) wafers in tetramethyl ammonium hydroxide(TMAH) solution with isopropyl alcohol(IPA) is investigated in detail. An inverted trapezoidal pattern is developed. A series of experiments are performed by changing TMAH concentration,IPA concentration,etching temperature and etching time. The structure of inverted trapezoidal patterns and roughness of the bottom surface are characterized by scanning electron microscopy(SEM) and atomic force microscopy(AFM). The results show that with TMAH concentration increases,the roughness of bottom surface will decrease. The addition of IPA into TMAH solution improves the morphology of the bottom surface significantly. Low temperature is beneficial to get a smooth bottom surface. Furthermore,etching time can change the bottom surface roughness. A model is proposed to explain the etching processes. The hillock area ratio of the bottom surface has the same tendency as the etching area ratio. Finally,smooth silicon inverted trapezoidal patterns are obtained for epitaxial growth of Ga N-based light emitting diode(LED) devices.