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Density behaviors of Ge nanodots self-assembled by ion beam sputtering deposition
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作者 熊飞 杨涛 +1 位作者 宋肇宁 杨培志 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第5期557-563,共7页
Self-assembled Ge nanodots with areal number density up to 2.33× 1010 cm-2 and aspect ratio larger than 0.12 are prepared by ion beam sputtering deposition. The dot density, a function of deposition rate and Ge c... Self-assembled Ge nanodots with areal number density up to 2.33× 1010 cm-2 and aspect ratio larger than 0.12 are prepared by ion beam sputtering deposition. The dot density, a function of deposition rate and Ge coverage, is observed to be limited mainly by the transformation from two-dimensional precursors to three-dimensional islands, and to be associated with the adatom behaviors of attachment and detachment from the islands. An unusual increasing temperature dependence of nanodot density is also revealed when a high ion energy is employed in sputtering deposition, and is shown to be related to the breaking down of the superstrained wetting layer. This result is attributed to the interaction between energetic atoms and the growth surface, which mediates the island nucleation. 展开更多
关键词 Ge nanodot SELF-ORGANIZATion ion beam sputtering deposition adatom behavior
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Nano-sized Thin Films Fabricated by Ion Beam Sputtering and Its Properties
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作者 周继承 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2007年第4期600-602,共3页
Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorpho... Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorphous to crystalline state. The film thickness was measured with a-stylus surface profiler, the structure and the compositions of the films were confirmed by low angle X-ray diffraction and scanning auger electron microprobe respectively, and the surface topography was characterized by scanning electron microscope and scanning probe microscope. Electrical property of the films was measured by fourpoint probe. The experimental results illustrate that the combined processes of ion beam sputtering and rajid thermal process are effective for fabrication nanoscale Ni-Cr alloy thin film with good properties. 展开更多
关键词 ion beam sputtering deposition film rapid thermal process nanoscale NiCr thin film
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Preparation of YBa_2Cu_3O_(7-x) Superconductor Film by Ion Beam Sputtering
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作者 胡倾宇 闻立时 +1 位作者 乔桂文 庄育智 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1989年第5期366-368,共3页
Since the discovery of high T;super-conductor, much effort was made toits application. More and more evidencehas revealed that most promising fieldof high T;superconductor first to havesuccess must be the microelectro... Since the discovery of high T;super-conductor, much effort was made toits application. More and more evidencehas revealed that most promising fieldof high T;superconductor first to havesuccess must be the microelectronics andcomputer. Superconductor films for mi-croelectronic application are preparedby PVD method, such as electron beamevaporation, pulsed laser evaporation andmagnetron sputtering. In this paper, thepreliminary results of ion beam sputteringdeposition of YBaCuO film are reported 展开更多
关键词 superconductor film ion beam sputtering
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Structure and Magnetic Properties of Fe-N Films Prepared by Dual Ion Beam Sputtering
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作者 诸葛兰剑 吴雪梅 +2 位作者 汤乃云 叶春兰 姚伟国 《Plasma Science and Technology》 SCIE EI CAS CSCD 2001年第6期1049-1054,共6页
Fe-N films were prepared on Si substrate by dual ion beam sputtering (DIBS). It is found that the crystal structure of the films varies from α-Fe, to ε-Fe2-3N, ε-Fe2-3N +γ-Fe4N, and finally γ'-Fe4N with the i... Fe-N films were prepared on Si substrate by dual ion beam sputtering (DIBS). It is found that the crystal structure of the films varies from α-Fe, to ε-Fe2-3N, ε-Fe2-3N +γ-Fe4N, and finally γ'-Fe4N with the increase in substrate temperature (TS). The magnetic properties of the films were investigated by a vibrating sample magnetometer (VSM). The structure of the films is insensitive to the ratios of N2/Ar in main ion source(MIS), and is mainly influenced by the substrate temperature (Ts). 展开更多
关键词 FE Structure and Magnetic Properties of Fe-N Films Prepared by Dual ion beam sputtering
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Infrared transition properties of vanadium dioxide thin films across semiconductor-metal transition 被引量:4
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作者 LIANG Jiran HU Ming +4 位作者 KAN Qiang LIANG Xiuqin WANG Xiaodong LI Guike CHEN Hongda 《Rare Metals》 SCIE EI CAS CSCD 2011年第3期247-251,共5页
Vanadium dioxide thin films were fabricated through annealing vanadium oxide thin films deposited by dual ion beam sputtering. X-ray diffraction (XRD), atom force microscopy (AFM), and Fourier transform infrared s... Vanadium dioxide thin films were fabricated through annealing vanadium oxide thin films deposited by dual ion beam sputtering. X-ray diffraction (XRD), atom force microscopy (AFM), and Fourier transform infrared spectrum (FTIR) were employed to measure the crystalline structure, surface morphology, and infrared optical transmittance. The phase transition properties were characterized by transmittance. The results show that the annealed vanadium oxide thin film is composed of monoclinic VO2, with preferred orientation of (011). The maximum of transmittance change is beyond 65% as the temperature increases from 20 to 80 C. The reversible changes in optical transmittance against temperature were observed. The change rate of transmittance at short wavelength is higher than that at long wavelength at the same temperature across semiconductor-metal phase transition. This phenomenon was discussed using diffraction effect. 展开更多
关键词 vanadium dioxide infrared transition diffraction effect dual ion beam sputtering ANNEALING
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Synthesis,Characterization and Photoluminescence of Well-Ordered ZnO Micropillars Grown on ZnO Buffer Layers
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作者 LU Hongbing TIAN Yu HU Meifeng SHUAI Min LI Jinchai 《Wuhan University Journal of Natural Sciences》 CAS 2007年第6期1043-1046,共4页
Using ZnO buffer layers prepared by simply thermal oxidation of ion beam sputtered Zn films, highly oriented and uniformly aligned single-crystalline ZnO micropillars arrays have been synthesized by thermal evaporatio... Using ZnO buffer layers prepared by simply thermal oxidation of ion beam sputtered Zn films, highly oriented and uniformly aligned single-crystalline ZnO micropillars arrays have been synthesized by thermal evaporation of Zn powder with flee catalysts at low temperature of 430℃ The ZnO micropillars show sharp hexagonal umbrella-like tips with thin ZnO nanowire grown on the tips. The umbrella-like tips grow in a layer-by-layer mode along the direction of [001]. The growth mechanism has been discussed. The formation of the micropillars basically depends on the gradually decreasing Zn vapor pressure and subsequently cooling process. The photoluminescence (PL) spectrum indicates a moderately good crystal quality of the ZnO micropillars. Our results may reinforce the understanding of the formation mechanism of different ZnO nano/microstructures. This kind of complex microstructures may find potential applications in multifunctional microdevices, optoelectronic and field emission devices. 展开更多
关键词 ZNO ion beam sputtering buffer layer crystal growth optical property
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Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process
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作者 Sina Malobabic Marco Jupé Detlev Ristau 《Light(Science & Applications)》 SCIE EI CAS CSCD 2015年第1期109-116,共8页
In the present state of the art,ion beam sputtering is used to produce low-loss dielectric optics.During the manufacturing of a dielectric layer stack,the deposition material must be changed,which requires rapid mecha... In the present state of the art,ion beam sputtering is used to produce low-loss dielectric optics.During the manufacturing of a dielectric layer stack,the deposition material must be changed,which requires rapid mechanical movement of vacuum components.These mechanical components can be regarded as a risk factor for contamination during the coating process,which limits the quality of high-end laser components.To minimize the particle contamination,we present a novel deposition concept that does not require movable components to change the coating material during the coating process.A magnetic field guiding technique has been developed,which enables the tuning of the refractive index in the layer structure by sputtering mixtures with varying compositions of two materials using a single-ion source.The versatility of this new concept is demonstrated for a highreflection mirror. 展开更多
关键词 EM field separation ion beam sputtering plasma guiding
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Gas-sensing Properties of Bismuth Iron Molybdate Thin Films
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作者 胡兴定 《Rare Metals》 SCIE EI CAS CSCD 1997年第4期73-77,共5页
The thin film gas sensors of bismuth iron molybdate were prepared by ion beam sputtering technique. The prototype gas sensors studied have high sensitivity and selectivity to reducing gases, such as ethanol vapor, s... The thin film gas sensors of bismuth iron molybdate were prepared by ion beam sputtering technique. The prototype gas sensors studied have high sensitivity and selectivity to reducing gases, such as ethanol vapor, show a long term stability of response under most operating conditions and insensitivity to atmospheric humidity, and respond quickly comparing to traditional sintered gas sensors. The crystallographic structure and phase composition of these thin films were investigated with XRD, XPS and SEM techniques. 展开更多
关键词 Bismuth iron molybdate ion beam sputtering Thin film Gas sensing properties
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