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Dynamic Changes in DNA Damage and Repair Biomarkers with Employment Length among Nickel Smelting Workers 被引量:2
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作者 WU Shan BAI Ya Na +5 位作者 PU Hong Quan HE Jie ZHENG Tong Zhang LI Hai Yan DAI Min CHENG Ning 《Biomedical and Environmental Sciences》 SCIE CAS CSCD 2015年第9期679-682,共4页
Our study explored the dynamic changes in andthe relationship between the DNA damage marker8-hydroxy-2'-deoxyguanosine (8-OHdG) and theDNA repair marker 8-hydroxyguanine DNAglycosidase 1 (hOGG1) according to the ... Our study explored the dynamic changes in andthe relationship between the DNA damage marker8-hydroxy-2'-deoxyguanosine (8-OHdG) and theDNA repair marker 8-hydroxyguanine DNAglycosidase 1 (hOGG1) according to the length ofoccupational employment in nickel smeltingworkers. One hundred forty nickel-exposedsmelting workers and 140 age-matched unexposedoffice workers were selected from the Jinchangcohort. The 8-OHdG levels in smelting workers wassignificantly higher than in office workers (Z=-8.688,P〈0.05) and the 8-OHdG levels among nickelsmelting workers in the 10-14 y employment lengthcategory was significantly higher than among allpeers. The hOGG1 levels among smelting workerswere significantly lower than those of non-exposedworkers (Z=-8.948, P〈0.05). There were significantdifferences between employment length andhOGG1 levels, with subjects employed in nickelsmelting for 10-14 y showing the highest levels ofhOGG1. Correlation analysis showed positivecorrelations between 8-OHdG and hOGG1 levels(r=0.413; P〈0.01). DNA damage was increased withemployment length among nickel smelting workersand was related to the inhibition of hOGG1 repaircapacity. 展开更多
关键词 DNA Dynamic Changes in DNA damage and Repair Biomarkers with Employment length among Nickel Smelting Workers length
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Photoluminescence Analysis of Electron Damage for Minority Carrier Diffusion Length in GaInP/GaAs/Ge Triple-Junction Solar Cells
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作者 Rui Wu Jun-Ling Wang +1 位作者 Gang Yan Rong Wang 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第4期70-73,共4页
Photoluminescence(PL) measurements are carried out to investigate the degradation of GaInP top cell and GaAs middle cell for GaInP/GaAs/Ge triple-junction solar cells irradiated with 1.0, 1.8 and 11.5 MeV electrons ... Photoluminescence(PL) measurements are carried out to investigate the degradation of GaInP top cell and GaAs middle cell for GaInP/GaAs/Ge triple-junction solar cells irradiated with 1.0, 1.8 and 11.5 MeV electrons with fluences ranging up to 3 × 10^15, 1 × 10^15 and 3 × 10^14 cm^-2, respectively. The degradation rates of PL intensity increase with the electron fluence and energy. Furthermore, the damage coefficient of minority carrier diffusion length is estimated by the PL radiative efficiency. The damage coefficient increases with the electron energy. The relation of damage coefficient to electron energy is discussed with the non-ionizing energy loss(NIEL), which shows a quadratic dependence between damage coefficient and NIEL. 展开更多
关键词 In Photoluminescence Analysis of Electron damage for Minority Carrier Diffusion length in GaInP/GaAs/Ge Triple-Junction Solar Cells Ge
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