Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the...Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.展开更多
Ti-Si-N composite coatings were synthesized on a novel combining cathode and middle-frequency magnetron sputtering system, designed on an industrial scale. Ti was produced from the arc target and Si from magnetron tar...Ti-Si-N composite coatings were synthesized on a novel combining cathode and middle-frequency magnetron sputtering system, designed on an industrial scale. Ti was produced from the arc target and Si from magnetron target during deposition. The influences of negative bias voltage and Si content on the hardness and microstructure of the coatings were investigated. The composite coatings prepared under optimized conditions were characterized to be nc-TiN/a-Si3N4 structure with grain sizes of TiN ranging from 8-15 nm and exhibited a high hardness of 40 GPa. The enhancement of the hardness is suggested to be caused by the nanograin-amorphous structure effects.展开更多
Thick CrN coatings were deposited on Si （111） substrates by electron source assisted mid-frequency magnetron sputtering working at 40 kHz. The deposition rate, structure, and microhardness of the coatings were stron...Thick CrN coatings were deposited on Si （111） substrates by electron source assisted mid-frequency magnetron sputtering working at 40 kHz. The deposition rate, structure, and microhardness of the coatings were strongly influenced by the negative bias voltage （Vb）. The deposition rate reached 8.96 μm/h at a Vb of -150 V. X-ray diffraction measurement revealed strong CrN （200） orientation for films prepared at low bias voltages. At a high bias voltage of Vb less than -25 V both CrN （200） and （111） were observed. Large and homogeneous grains were observed by both atomic force microscopy and scanning electron microscopy in samples prepared under optimal conditions. The samples exhibited a fibrous microstructure for a low bias voltage and a columnar structure for VD less than -150 V.展开更多
研制了一台以NiosII嵌入式处理器为核心的非平衡磁控溅射(Unbalanced Magnetron Sputtering,简称UMS)高性能电源。采用片上可编程系统(System on a Programmable Chip,简称SOPC)的解决方案,结合嵌入式系统的优势,加入智能化复合控制策...研制了一台以NiosII嵌入式处理器为核心的非平衡磁控溅射(Unbalanced Magnetron Sputtering,简称UMS)高性能电源。采用片上可编程系统(System on a Programmable Chip,简称SOPC)的解决方案,结合嵌入式系统的优势,加入智能化复合控制策略和高频DPWM多自由度调制方法,以满足等离子体负载特性及工艺需求。测试结果表明,该电源具备高稳流、高离子束电流多自由度输出特性以及优异的电弧管理能力,为UMS先进工艺的探索提供了良好的技术平台。展开更多
文摘Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.
基金Funded by the Natural Science Foundation of China(No.10435060 andNo. 10675095)
文摘Ti-Si-N composite coatings were synthesized on a novel combining cathode and middle-frequency magnetron sputtering system, designed on an industrial scale. Ti was produced from the arc target and Si from magnetron target during deposition. The influences of negative bias voltage and Si content on the hardness and microstructure of the coatings were investigated. The composite coatings prepared under optimized conditions were characterized to be nc-TiN/a-Si3N4 structure with grain sizes of TiN ranging from 8-15 nm and exhibited a high hardness of 40 GPa. The enhancement of the hardness is suggested to be caused by the nanograin-amorphous structure effects.
基金supported by National Natural Science Foundation of China(Nos.10435060,10675095)
文摘Thick CrN coatings were deposited on Si （111） substrates by electron source assisted mid-frequency magnetron sputtering working at 40 kHz. The deposition rate, structure, and microhardness of the coatings were strongly influenced by the negative bias voltage （Vb）. The deposition rate reached 8.96 μm/h at a Vb of -150 V. X-ray diffraction measurement revealed strong CrN （200） orientation for films prepared at low bias voltages. At a high bias voltage of Vb less than -25 V both CrN （200） and （111） were observed. Large and homogeneous grains were observed by both atomic force microscopy and scanning electron microscopy in samples prepared under optimal conditions. The samples exhibited a fibrous microstructure for a low bias voltage and a columnar structure for VD less than -150 V.
文摘研制了一台以NiosII嵌入式处理器为核心的非平衡磁控溅射(Unbalanced Magnetron Sputtering,简称UMS)高性能电源。采用片上可编程系统(System on a Programmable Chip,简称SOPC)的解决方案,结合嵌入式系统的优势,加入智能化复合控制策略和高频DPWM多自由度调制方法,以满足等离子体负载特性及工艺需求。测试结果表明,该电源具备高稳流、高离子束电流多自由度输出特性以及优异的电弧管理能力,为UMS先进工艺的探索提供了良好的技术平台。
