Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing...Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing. The effects of the annealing on the structure and phase transition property of VO2 were discussed. X-ray photoelectron spectroscopy, X-ray diffraction tech- nique and Fourier transform infrared spectroscopy were employed to study the phase composition and structure of the thin films. The resistance-temperature property was measured. The results show that VO2 thin film is obtained after annealed at 320 ℃ for 3 h, its phase transition tempera- ture is 56 ℃, and the resistance changes by more than 2 orders. The vanadium oxide thin films are applicable in thermochromic smart windows, and the deposition and annealing process is compatible with micro electromechanical system process.展开更多
Polycrystalline Cr2AlC coatings were prepared on M38G superalloy using a two-step method consisting of magnetron sputtering from Cr-Al-C composite targets at room temperature and subsequent annealing at 620 ℃. Partic...Polycrystalline Cr2AlC coatings were prepared on M38G superalloy using a two-step method consisting of magnetron sputtering from Cr-Al-C composite targets at room temperature and subsequent annealing at 620 ℃. Particularly, various targets synthesized by hot pressing mixture of Cr, Al, and C powders at 650-1000 ℃ were used. It was found that regardless of the phase compositions and density of the com- posite targets, when the molar ratio of Cr：Al：C in the starting materials was 2：1：1, phase-pure crystalline Cr2AlC coatings were prepared by magnetron sputtering and post crystallization. The Cr2AIC coatings were dense and crack-free and had a duplex structure. The adhesion strength of the coating deposited on M38G superalloy from the 800 ℃ hot-pressed target and then annealed at 620 ℃ for 20 h in Ar exceeded 82 ± 6 MPa, while its hardness was 12 ± 3 GPa.展开更多
基金Natural Science Foundation of Tianjin(No.043100811)the Key Program of Natural Science Foundation of Tianjin(No.08JCZDJC17500)
文摘Low valence vanadium oxide(VO2-x) thin films were prepared on SiO2/Si substrates at room temperature by direct current facing targets reactive magnetron sputtering, and then proc- essed through rapid thermal annealing. The effects of the annealing on the structure and phase transition property of VO2 were discussed. X-ray photoelectron spectroscopy, X-ray diffraction tech- nique and Fourier transform infrared spectroscopy were employed to study the phase composition and structure of the thin films. The resistance-temperature property was measured. The results show that VO2 thin film is obtained after annealed at 320 ℃ for 3 h, its phase transition tempera- ture is 56 ℃, and the resistance changes by more than 2 orders. The vanadium oxide thin films are applicable in thermochromic smart windows, and the deposition and annealing process is compatible with micro electromechanical system process.
基金supported by the National Natural Science Foundation of China under Grant Nos.51271191,51571205 and 51401209
文摘Polycrystalline Cr2AlC coatings were prepared on M38G superalloy using a two-step method consisting of magnetron sputtering from Cr-Al-C composite targets at room temperature and subsequent annealing at 620 ℃. Particularly, various targets synthesized by hot pressing mixture of Cr, Al, and C powders at 650-1000 ℃ were used. It was found that regardless of the phase compositions and density of the com- posite targets, when the molar ratio of Cr：Al：C in the starting materials was 2：1：1, phase-pure crystalline Cr2AlC coatings were prepared by magnetron sputtering and post crystallization. The Cr2AIC coatings were dense and crack-free and had a duplex structure. The adhesion strength of the coating deposited on M38G superalloy from the 800 ℃ hot-pressed target and then annealed at 620 ℃ for 20 h in Ar exceeded 82 ± 6 MPa, while its hardness was 12 ± 3 GPa.
