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Design,modelling,and simulation of a floating gate transistor with a novel security feature
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作者 H.Zandipour M.Madani 《Journal of Semiconductors》 EI CAS CSCD 2020年第10期33-37,共5页
This study proposes a new generation of floating gate transistors(FGT)with a novel built-in security feature.The new device has applications in guarding the IC chips against the current reverse engineering techniques,... This study proposes a new generation of floating gate transistors(FGT)with a novel built-in security feature.The new device has applications in guarding the IC chips against the current reverse engineering techniques,including scanning capacitance microscopy(SCM).The SCM measures the change in the C–V characteristic of the device as a result of placing a minute amount of charge on the floating gate,even in nano-meter scales.The proposed design only adds a simple processing step to the conventional FGT by adding an oppositely doped implanted layer to the substrate.This new structure was first analyzed theoretically and then a two-dimensional model was extracted to represent its C–V characteristic.Furthermore,this model was verified with a simulation.In addition,the C–V characteristics relevant to the SCM measurement of both conventional and the new designed FGT were compared to discuss the effectiveness of the added layer in masking the state of the transistor.The effect of change in doping concentration of the implanted layer on the C–V characteristics was also investigated.Finally,the feasibility of the proposed design was examined by comparing its I–V characteristics with the traditional FGT. 展开更多
关键词 floating gate transistor(FGT) scanning capacitance microscopy(SCM) metal–oxide–semiconductor(mos)capacitance non-volatile memory(NVM) reverse engineering
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An efficient method for comprehensive modeling and parasitic extraction of cylindrical through-silicon vias in 3D ICs 被引量:1
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作者 姚蔷 叶佐昌 喻文健 《Journal of Semiconductors》 EI CAS CSCD 2015年第8期150-156,共7页
To build an accurate electric model for through-silicon vias (TSVs) in 3D integrated circuits (ICs), a resistance and capacitance (RC) circuit model and related efficient extraction technique are proposed. The c... To build an accurate electric model for through-silicon vias (TSVs) in 3D integrated circuits (ICs), a resistance and capacitance (RC) circuit model and related efficient extraction technique are proposed. The circuit model takes both semiconductor and electrostatic effects into account, and is valid for low and medium signal frequencies. The electrostatic capacitances are extracted with a floating random walk based algorithm, and are then combined with the voltage-dependent semiconductor capacitances to form the equivalent circuit. Compared with the method used in Synopsys's Sdevice, which completely simulates the electro/semiconductor effects, the proposed method is more efficient and is able to handle the general TSV layout as well. For several TSV structures, the experimental results validate the accuracy of the proposed method for the frequency range from l0 kHz to 1 GHz. The proposed method demonstrated 47× speedup over the Sdevice for the largest 9-TSV case. 展开更多
关键词 3D IC through silicon via (TSV) parasitic extraction floating random walk algorithm metal-oxide- semiconductor (mos capacitance
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