In 2011,a new class of 2D materials was discovered;after 2012,they began to be concerned;in 2017,the“gold rush”of the materials was triggered,and they are exactly MXenes.2D MXenes,a new class of transition metal car...In 2011,a new class of 2D materials was discovered;after 2012,they began to be concerned;in 2017,the“gold rush”of the materials was triggered,and they are exactly MXenes.2D MXenes,a new class of transition metal carbides,carbonitrides and nitrides,have become the star and cutting-edge research materials in the field of emerging batteries systems due to their unique 2D structure,abundant surface chemistry,and excellent physical and electrochemical properties.This review focuses on the MXene materials and summarizes the recent advancements in the synthesis techniques and properties,in addition to a detailed discussion on the electrochemical energy storage applications,including alkali-ion(Li^(+),Na^(+),K^(+))storage,lithium-sulfur(Li–S)batteries,sodiumsulfur(Na–S)batteries,and metal anode protection.Special attentions are given to the elaborate design of nano-micro structures of MXenes for the various roles as electrodes,multifunctional components,S hosts,modified separators,and metal anode protective layers.The paper ends with a prospective summary of the promising research directions in terms of synthesis,structure,properties,analysis,and production on MXene materials.展开更多
Titanium-aluminum-nitride（TiAlN） films were grown by plasma-enhanced atomic layer deposition（PEALD）on 316 L stainless steel at a deposition temperature of 200 °C. A supercycle, consisting of one AlN and ten T...Titanium-aluminum-nitride（TiAlN） films were grown by plasma-enhanced atomic layer deposition（PEALD）on 316 L stainless steel at a deposition temperature of 200 °C. A supercycle, consisting of one AlN and ten TiN subcycles, was used to prepare TiAlN films with a chemical composition of Ti（0.25）Al（0.25）N（0.50）. The addition of AlN to TiN resulted in an increased electrical resistivity of TiAlN films of 2800 μΩ cm, compared with 475 μΩ cm of TiN films, mainly due to the high electrical resistivity of AlN and the amorphous structure of TiAlN. However, potentiostatic polarization measurements showed that amorphous TiAlN films exhibited excellent corrosion resistance with a corrosion current density of 0.12 μA/cm^2, about three times higher than that of TiN films, and about 12.5 times higher than that of 316 L stainless steel.展开更多
基金support from the Liao Ning Revitalization Talents Program(No.XLYC1907144)Dalian Youth Science and Technology Star Project Support Program(No.2017RQ104).
文摘In 2011,a new class of 2D materials was discovered;after 2012,they began to be concerned;in 2017,the“gold rush”of the materials was triggered,and they are exactly MXenes.2D MXenes,a new class of transition metal carbides,carbonitrides and nitrides,have become the star and cutting-edge research materials in the field of emerging batteries systems due to their unique 2D structure,abundant surface chemistry,and excellent physical and electrochemical properties.This review focuses on the MXene materials and summarizes the recent advancements in the synthesis techniques and properties,in addition to a detailed discussion on the electrochemical energy storage applications,including alkali-ion(Li^(+),Na^(+),K^(+))storage,lithium-sulfur(Li–S)batteries,sodiumsulfur(Na–S)batteries,and metal anode protection.Special attentions are given to the elaborate design of nano-micro structures of MXenes for the various roles as electrodes,multifunctional components,S hosts,modified separators,and metal anode protective layers.The paper ends with a prospective summary of the promising research directions in terms of synthesis,structure,properties,analysis,and production on MXene materials.
基金supported by the Global Frontier R&D Program (2013M3A6B1078874) on Center for Hybrid Interface Materials (HIM) funded by the Ministry of Science, ICT & Future Planning, Republic of Koreasupported by a grant from the Industrial R&D Program for Core Technology of Materials funded by the Ministry of Industry and Energy (10060331), Republic of Korea
文摘Titanium-aluminum-nitride（TiAlN） films were grown by plasma-enhanced atomic layer deposition（PEALD）on 316 L stainless steel at a deposition temperature of 200 °C. A supercycle, consisting of one AlN and ten TiN subcycles, was used to prepare TiAlN films with a chemical composition of Ti（0.25）Al（0.25）N（0.50）. The addition of AlN to TiN resulted in an increased electrical resistivity of TiAlN films of 2800 μΩ cm, compared with 475 μΩ cm of TiN films, mainly due to the high electrical resistivity of AlN and the amorphous structure of TiAlN. However, potentiostatic polarization measurements showed that amorphous TiAlN films exhibited excellent corrosion resistance with a corrosion current density of 0.12 μA/cm^2, about three times higher than that of TiN films, and about 12.5 times higher than that of 316 L stainless steel.
