Thickness deposition is a crucial issue on the application of electroformed micro mold inserts. Edge concentration effect is the main source of the non-uniformity. The techniques of adopting a non-conducting shield, a...Thickness deposition is a crucial issue on the application of electroformed micro mold inserts. Edge concentration effect is the main source of the non-uniformity. The techniques of adopting a non-conducting shield, a secondary electrode and a movable cathode were explored to improve the thickness deposition uniformity during the nickel electroforming process. Regarding these techniques, a micro electroforming system with a movable cathode was particularly developed. The thickness variation of a 16 mm×16 mm electroformed sample decreased respectively from 150% to 35%, 12% and 18% by these three techniques. Combining these validated methods, anickelmold insert for microlens array was electroformed with satisfactory mechanical properties and high replication precision. It could be applied to the following injection molding process.展开更多
Fuze micro-electro-mechanical system(MEMS) has become a popular subject in recent years.Studies have been done for the application of MEMS-based fuze safety and arm devices.The existing researches mainly focused on ...Fuze micro-electro-mechanical system(MEMS) has become a popular subject in recent years.Studies have been done for the application of MEMS-based fuze safety and arm devices.The existing researches mainly focused on reducing the cost and volume of the fuze safety device.The reduction in volume allows more payload and,thus,makes small-caliber rounds more effective and the weapon system more affordable.At present,MEMS-based fuze safety devices are fabricated mainly by using deep reactive ion ething or LIGA technology,and the fabrication process research on the fuze MEMS safety device is in the exploring stage.In this paper,a new micro fabrication method of metal-based fuze MEMS safety device is presented based on ultra violet(UV)-LIGA technology.The method consists of SU-8 thick photoresist lithography process,micro electroforming process,no back plate growing process,and SU-8 photoresist sacrificial layer process.Three kinds of double-layer moveable metal devices have been fabricated on metal substrates directly with the method.Because UV-LIGA technology and no back plate growing technology are introduced,the production cycle is shortened and the cost is reduced.The smallest dimension of the devices is 40 μm,which meets the requirement of size.To evaluate the adhesion property between electroforming deposit layer and substrate qualitatively,the impact experiments have been done on the device samples.The experimental result shows that the samples are still in good condition and workable after undergoing impact pulses with 20 kg peak and 150 μs duration and completely met the requirement of strength.The presented fabrication method provides a new option for the development of MEMS fuze and is helpful for the fabrication of similar kinds of micro devices.展开更多
In this paper,we report the study of the process of fabricating a multi-layermetal micro-structure using UV-LIGA overlay technology,includingmask fabrication,substrate treatment,and UV-LIGA overlay processes.To solve ...In this paper,we report the study of the process of fabricating a multi-layermetal micro-structure using UV-LIGA overlay technology,includingmask fabrication,substrate treatment,and UV-LIGA overlay processes.To solve the process problems in the masking procedure,the swelling problemof the first layer of SU-8 thick photoresist was studied experimentally.The 5μmline-width compensation and closed 20μmand 30μmisolation strips were designed and fabricated around the micro-structure pattern.The pore problemin the Ni micro-electroforming layer was analyzed and the electroforming parameters were improved.The pH value of the electroforming solution should be controlled between 3.8 and 4.4 and the current density should be below 3 A/dm^2.To solve the problems of high inner stress and incomplete development of the micro-cylinder hole array with a diameter of 30μm,the lithography process was optimized.The pre-baking temperature was increased via gradient heating and rose every 5℃ from 65℃ to 85℃ and then remained at 85℃ for 50 min–1 h.In addition,the full contact exposure was used.Finally,a multi-layer metal micro-structure with high precision and good quality of microelectroforming layer was fabricated using UV-LIGA overlay technology.展开更多
The microstructures of copper liners of shaped charges prepared byelectroforming technique were investigated by transmission electron microscopy (TEM). Meanwhile, theorientations distributing of the grains in the elec...The microstructures of copper liners of shaped charges prepared byelectroforming technique were investigated by transmission electron microscopy (TEM). Meanwhile, theorientations distributing of the grains in the electroformed copper liners of shaped charges wasexamined by the electron backscattering Kikuchi pattern (EBSP) technique. TEM observations haverevealed that these electroformed copper liners of shaped charges have the grain size of about 1-3mu m and the grains have a preferential orientation distribution along the growth direction. EBSPanalysis has demonstrated that the as-formed copper liners of shaped charges exhibit amicro-texture, i.e. one type of fiber texture, and the preferred growth direction is normal to thesurface of the liners.展开更多
Modeling of the roughness in micro-nano scale and its influence have not been fully investigated, however the roughness will cause amplitude and phase errors of the radiating slot, and decrease the precision and effic...Modeling of the roughness in micro-nano scale and its influence have not been fully investigated, however the roughness will cause amplitude and phase errors of the radiating slot, and decrease the precision and efficiency of the SWA in Ku-band. Firstly, the roughness is simulated using the electromechanical coupled(EC) model. The relationship between roughness and the antenna's radiation properties is obtained. For verification, an antenna proto- type is manufactured and tested, and the simulation method is introduced. According to the prototype, a contrasting experiment dealing with the flatness of the radiating plane is conducted to test the simulation method. The advantage of the EC model is validated by comparisons of the EC model and two classical roughness models (sine wave and fractal function), which shows that the EC model gives a more accurate description model for roughness, the maxi- mum error is 13%. The existence of roughness strongly broadens the beamwidth and raises the side-lobe level of SWA, which is 1.2 times greater than the ideal antenna. In addition, effect of the EC model's evaluation indices is investigated, the most affected scale of the roughness is found, which is 1/10 of the working wavelength. The proposed research provides the instruction for antenna designing and manufacturing.展开更多
基金Projects(51305465,91123012)supported by the National Natural Science Foundation of China
文摘Thickness deposition is a crucial issue on the application of electroformed micro mold inserts. Edge concentration effect is the main source of the non-uniformity. The techniques of adopting a non-conducting shield, a secondary electrode and a movable cathode were explored to improve the thickness deposition uniformity during the nickel electroforming process. Regarding these techniques, a micro electroforming system with a movable cathode was particularly developed. The thickness variation of a 16 mm×16 mm electroformed sample decreased respectively from 150% to 35%, 12% and 18% by these three techniques. Combining these validated methods, anickelmold insert for microlens array was electroformed with satisfactory mechanical properties and high replication precision. It could be applied to the following injection molding process.
基金supported by National Basic Research Program of China(973 Program,Grant No. 2007CB714502)National Natural Science Foundation of China (Grant No. 50675025)
文摘Fuze micro-electro-mechanical system(MEMS) has become a popular subject in recent years.Studies have been done for the application of MEMS-based fuze safety and arm devices.The existing researches mainly focused on reducing the cost and volume of the fuze safety device.The reduction in volume allows more payload and,thus,makes small-caliber rounds more effective and the weapon system more affordable.At present,MEMS-based fuze safety devices are fabricated mainly by using deep reactive ion ething or LIGA technology,and the fabrication process research on the fuze MEMS safety device is in the exploring stage.In this paper,a new micro fabrication method of metal-based fuze MEMS safety device is presented based on ultra violet(UV)-LIGA technology.The method consists of SU-8 thick photoresist lithography process,micro electroforming process,no back plate growing process,and SU-8 photoresist sacrificial layer process.Three kinds of double-layer moveable metal devices have been fabricated on metal substrates directly with the method.Because UV-LIGA technology and no back plate growing technology are introduced,the production cycle is shortened and the cost is reduced.The smallest dimension of the devices is 40 μm,which meets the requirement of size.To evaluate the adhesion property between electroforming deposit layer and substrate qualitatively,the impact experiments have been done on the device samples.The experimental result shows that the samples are still in good condition and workable after undergoing impact pulses with 20 kg peak and 150 μs duration and completely met the requirement of strength.The presented fabrication method provides a new option for the development of MEMS fuze and is helpful for the fabrication of similar kinds of micro devices.
文摘In this paper,we report the study of the process of fabricating a multi-layermetal micro-structure using UV-LIGA overlay technology,includingmask fabrication,substrate treatment,and UV-LIGA overlay processes.To solve the process problems in the masking procedure,the swelling problemof the first layer of SU-8 thick photoresist was studied experimentally.The 5μmline-width compensation and closed 20μmand 30μmisolation strips were designed and fabricated around the micro-structure pattern.The pore problemin the Ni micro-electroforming layer was analyzed and the electroforming parameters were improved.The pH value of the electroforming solution should be controlled between 3.8 and 4.4 and the current density should be below 3 A/dm^2.To solve the problems of high inner stress and incomplete development of the micro-cylinder hole array with a diameter of 30μm,the lithography process was optimized.The pre-baking temperature was increased via gradient heating and rose every 5℃ from 65℃ to 85℃ and then remained at 85℃ for 50 min–1 h.In addition,the full contact exposure was used.Finally,a multi-layer metal micro-structure with high precision and good quality of microelectroforming layer was fabricated using UV-LIGA overlay technology.
基金the National Natural Science Foundation of China (No. 59971008)
文摘The microstructures of copper liners of shaped charges prepared byelectroforming technique were investigated by transmission electron microscopy (TEM). Meanwhile, theorientations distributing of the grains in the electroformed copper liners of shaped charges wasexamined by the electron backscattering Kikuchi pattern (EBSP) technique. TEM observations haverevealed that these electroformed copper liners of shaped charges have the grain size of about 1-3mu m and the grains have a preferential orientation distribution along the growth direction. EBSPanalysis has demonstrated that the as-formed copper liners of shaped charges exhibit amicro-texture, i.e. one type of fiber texture, and the preferred growth direction is normal to thesurface of the liners.
基金Supported by National Natural Science Foundation of China(Grant Nos.51305322,51405364,51475348)
文摘Modeling of the roughness in micro-nano scale and its influence have not been fully investigated, however the roughness will cause amplitude and phase errors of the radiating slot, and decrease the precision and efficiency of the SWA in Ku-band. Firstly, the roughness is simulated using the electromechanical coupled(EC) model. The relationship between roughness and the antenna's radiation properties is obtained. For verification, an antenna proto- type is manufactured and tested, and the simulation method is introduced. According to the prototype, a contrasting experiment dealing with the flatness of the radiating plane is conducted to test the simulation method. The advantage of the EC model is validated by comparisons of the EC model and two classical roughness models (sine wave and fractal function), which shows that the EC model gives a more accurate description model for roughness, the maxi- mum error is 13%. The existence of roughness strongly broadens the beamwidth and raises the side-lobe level of SWA, which is 1.2 times greater than the ideal antenna. In addition, effect of the EC model's evaluation indices is investigated, the most affected scale of the roughness is found, which is 1/10 of the working wavelength. The proposed research provides the instruction for antenna designing and manufacturing.