Surfaces with controllable micro structures are significant in fundamental development of superhydrophobicity. However,preparation of superhydrophobic surfaces with array structures on metal substrates is not effectiv...Surfaces with controllable micro structures are significant in fundamental development of superhydrophobicity. However,preparation of superhydrophobic surfaces with array structures on metal substrates is not effective using existing methods. A new method was presented to fabricate super-hydrophobic post arrays on aluminum(Al) substrates using mask electrochemical machining and fluoridation. Electrochemical etching was first applied on Al plates with pre-prepared photoresist arrays to make the post array structures. Surface modification was subsequently applied to reduce the surface energy, followed by interaction with water to realize superhydrophobicity. Simulation and experimental verification were conducted to investigate how machining parameters affect the array structures. Analysis of the water contact angle was implemented to explore the relationship between wettability and micro structures.The results indicate that superhydrophobic surfaces with controllable post structures can be fabricated through this proposed method, producing surfaces with high water static contact angles.展开更多
Several approaches to fabricate micro optical elements by use of half tone masks are studied and compared. It is shown that half tone masks employed in filtering image systems can obtain gray patterns with considerabl...Several approaches to fabricate micro optical elements by use of half tone masks are studied and compared. It is shown that half tone masks employed in filtering image systems can obtain gray patterns with considerably high precision, but it is hard to operate from the viewpoint of operation. The method using contacting lithography technology or laser ablation can be easily operated with the cost of reducing fabrication precision and the trouble of choosing appropriate materials. For all of these methods, the coding of half tone masks with corrections for the nonlinear characteristics of coding, imaging and photoresist is recommended.展开更多
基金Supported by National Natural Science Foundation of China(Grant No.51605078)Science Fund for Creative Research Groups of NSFC(51621064)National Basic Research Program of China(973 Program,Grant No.2015CB057304)
文摘Surfaces with controllable micro structures are significant in fundamental development of superhydrophobicity. However,preparation of superhydrophobic surfaces with array structures on metal substrates is not effective using existing methods. A new method was presented to fabricate super-hydrophobic post arrays on aluminum(Al) substrates using mask electrochemical machining and fluoridation. Electrochemical etching was first applied on Al plates with pre-prepared photoresist arrays to make the post array structures. Surface modification was subsequently applied to reduce the surface energy, followed by interaction with water to realize superhydrophobicity. Simulation and experimental verification were conducted to investigate how machining parameters affect the array structures. Analysis of the water contact angle was implemented to explore the relationship between wettability and micro structures.The results indicate that superhydrophobic surfaces with controllable post structures can be fabricated through this proposed method, producing surfaces with high water static contact angles.
基金supported by 973 Program of China under Grant No.2006CB302900part by the National Natural Science Foundation of China under Grant No.60825405 and No.60778018
文摘Several approaches to fabricate micro optical elements by use of half tone masks are studied and compared. It is shown that half tone masks employed in filtering image systems can obtain gray patterns with considerably high precision, but it is hard to operate from the viewpoint of operation. The method using contacting lithography technology or laser ablation can be easily operated with the cost of reducing fabrication precision and the trouble of choosing appropriate materials. For all of these methods, the coding of half tone masks with corrections for the nonlinear characteristics of coding, imaging and photoresist is recommended.
