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High-speed through-silicon via filling method using Cu-cored solder balls
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作者 赫然 王惠娟 +5 位作者 于大全 周静 戴风伟 宋崇申 孙瑜 万里兮 《Journal of Semiconductors》 EI CAS CSCD 2012年第8期135-138,共4页
A novel low-cost and high-speed via filling method using Cu-cored solder balls was investigated for through-silicon via manufacture.Cu-cored solder balls with a total diameter of 100μm were used to fill 150μm deep,... A novel low-cost and high-speed via filling method using Cu-cored solder balls was investigated for through-silicon via manufacture.Cu-cored solder balls with a total diameter of 100μm were used to fill 150μm deep,110μm wide vias in silicon.The wafer-level filling process can be completed in a few seconds,which is much faster than using the traditional electroplating process.Thermo-mechanical analysis of via filling using solder,Cu and Cu-cored solder was carried out to assess the thermo-mechanical properties of the different filling materials.It was found that the vias filled with Cu-cored solder exhibit less thermal-mechanical stresses than solder-filled vias, but more than Cu-filled vias. 展开更多
关键词 microsystem packaging through-silicon vias filling method METALLIZATION thermal-mechanical properties
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