Fabrication of 4-Inch Nano Patterned Wafer with High Uniformity by Laser Interference Lithography

We report the fabrication of 4-inch nano patterned wafer by two-beam laser interference lithography and analyze the uniformity in detail. The profile of the dots array with a period of 800 nm divided into five regions is characterized by a scanning electron microscope. The average size in each region ranges from 270 nm to 320 nm,and the deviation is almost 4%, which is approaching the applicable value of 3% in the industrial process. We simulate the two-beam laser interference lithography system with MATLAB software and then calculate the distribution of light intensity around the 4 inch area. The experimental data fit very well with the calculated results. Analysis of the experimental data and calculated data indicates that laser beam quality and space filter play important roles in achieving a periodical nanoscale pattern with high uniformity and large area. There is the potential to obtain more practical applications.

Manufacturing Nano Electrode is Sensitive to Light for Produce Hydrogen Fuel

This research is aimed at preparing nano （WO3：Sn） thin film, so that manufacturing anode electrode for a cell electrolysis to produce hydrogen fuel, this thin film was prepared on glass substrates by using deposition laser pulse （LPD） technique have been studying optical properties through the spectra of absorbance and transmittance, was determine the optical energy gap was observed that the permeability increases with the wavelength found that these films have high transmittance in the visible spectral region. The allowed direct band gap was found to increase from （2.9 eV） structured characteristics was studied through the analysis of X-ray diffraction （XRD） of the prepared film for determining the yielding phase which are to set the with standard tables. Also, the sample was tested atomic force microscope to identify the roughness of prepared films surface, and has been the study of the volume of gas output voltages with change, time and current.

Ultrashort pulsed laser induced complex surface structures generated by tailoring the melt hydrodynamics

We present a novel approach for tailoring the laser induced surface topography upon femtosecond(fs)pulsed laser irradiation.The method employs spatially controlled double fs laser pulses to actively regulate the hydrodynamic microfluidic motion of the melted layer that gives rise to the structures formation.The pulse train used,in particular,consists of a previously unexplored spatiotemporal intensity combination including one pulse with Gaussian and another with periodically modulated intensity distribution created by Direct Laser Interference Patterning(DLIP).The interpulse delay is appropriately chosen to reveal the contribution of the microfluidic melt flow,while it is found that the sequence of the Gaussian and DLIP pulses remarkably influences the surface profile attained.Results also demonstrate that both the spatial intensity of the double pulse and the effective number of pulses per irradiation spot can further be modulated to control the formation of complex surface morphologies.The underlying physical processes behind the complex patterns’generation were interpreted in terms of a multiscale model combining electron excitation with melt hydrodynamics.We believe that this work can constitute a significant step forward towards producing laser induced surface structures on demand by tailoring the melt microfluidic phenomena.

Large-area superconducting nanowires fabricated based on laser exposure on photoresist

To realize large-scale micro/nanofabrication process in superconducting devices,the nano laser direct writing(NLDW)as a potential tool was implemented.In this paper,thermal effect induced laser-matter(superconducting film)interaction based on laser direct writing on Nb films and laser exposure on photoresist were investigated by simulation and experiment.To avoid nanoscale thermal effect on superconducting films,large-scale superconducting nanoarrays with the area up to 100μm×100μm based on laser exposure on photoresist were fabricated.Compared with laser direct writing on superconducting films,which lead to the degradation of superconducting performance such as critical current,transition temperature,the superconducting nanoarrays based on laser exposure on photoresist maintain excellent superconducting performance without degradation.Besides that,by further optimizing the process parameters and the thickness of photoresist,the nanowires with the width down to nanometers are plausible.Compared with the traditional electron beam and ion beam process,to some extent,the nanowires fabrication process based on NLDW provides a more efficient and cost-effective path for the fabrication of large-area superconducting devices/circuits.

Generation of micro/nano hybrid surface structures on copper by femtosecond pulsed laser irradiation

The delamination of copper lead frames from epoxy molding compounds(EMC)is a severe problem for microelectronic devices,as it leads to reduced heat dissipation or circuit breakage.The micro/nanoscale surface structuring of copper is a promising method to improve the copper-EMC interfacial adhesion.In this study,the generation of micro/nano hybrid structures on copper surfaces through femtosecond pulsed laser irradiation is proposed to improve interfacial adhesion.The micro/nano hybrid structures were realized by generating nanoscale laser-induced periodic surface structures(LIPSS)on microscale parallel grooves.Several types of hybrid surface structures were generated by changing the laser polarization direction,fluence,and scanning speed.At a specific aspect ratio of microgrooves,a latticed structure was generated on the sides of microgrooves by combining LIPSS formation and direct laser interference patterning.This study provides an efficient method for the micro/nanoscale hybrid surface structure formation for interfacial adhesion improvement between copperand EMC.