We report a new method for the fabrication of two-dimensional photonic crystal （PhC） hole arrays to improve the light extraction of GaN-based light-emitting diodes （LEDs）. The PhC structures were realized using na...We report a new method for the fabrication of two-dimensional photonic crystal （PhC） hole arrays to improve the light extraction of GaN-based light-emitting diodes （LEDs）. The PhC structures were realized using nanospherical-lens photolithography and the selective-area epitaxy method, which ensured the electrical properties of the LEDs through leaving the p-GaN damage-free. At a current of 350 mA, the light output power of LEDs with PhC hole arrays of 450 nm and 600 nm in diameter with the same lattice period of 900 nm were enhanced by 49.3% and 72.2%, respectively, compared to LEDs without a PhC. Furthermore, the LEDs with PhC hole structures showed an obviously smaller divergent angle compared with conventional LEDs, which is consistent with the results of finite-difference time-domain simulation.展开更多
Actin cytoskeleton plays crucial roles in various cellular functions.Extracellular matrix(ECM)can modulate cell morphology by remodeling the internal cytoskeleton.To define how geometry of ECM regulates the organizati...Actin cytoskeleton plays crucial roles in various cellular functions.Extracellular matrix(ECM)can modulate cell morphology by remodeling the internal cytoskeleton.To define how geometry of ECM regulates the organization of actin cytoskeleton,we plated individual NIH 3T3 cells on micropatterned substrates with distinct shapes and sizes.It was found that the stress fibers could form along the nonadhesive edges of T-shaped pattern,but were absent from the opening edge of V-shaped pattern,indicating that the organization of actin cytoskeleton was dependent on the mechanical environment.Furthermore,a secondary actin ring was observed on 50μm circular pattern while did not appear on 30μm and 40μm pattern,showing a size-dependent organization of actin cytoskeleton.Finally,osteoblasts,MDCK and A549 cells exhibited distinct organization of actin cytoskeleton on T-shaped pattern,suggesting a cell-type specificity in arrangement of actin cytoskeleton.Together,our findings brought novel insight into the organization of actin cytoskeleton on micropatterned environments.展开更多
Simulations of photoresist etching,aerial image,exposure,and post-bake processes are integrated to obtain a photolithography process simulation for microelectromechanical system（MEMS） and integrated circuit（IC） fa...Simulations of photoresist etching,aerial image,exposure,and post-bake processes are integrated to obtain a photolithography process simulation for microelectromechanical system（MEMS） and integrated circuit（IC） fabrication based on three-dimensional （3D） cellular automata（CA）. The simulation results agree well with available experimental results. This indicates that the 3D dynamic CA model for the photoresist etching simulation and the 3D CA model for the post-bake simulation could be useful for the monolithic simulation of various lithography processes. This is determined to be useful for the device-sized fabrication process simulation of IC and MEMS.展开更多
A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system(VS)of photolithography.The presence of microstructure,such as recesses and...A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system(VS)of photolithography.The presence of microstructure,such as recesses and grooves,on the guideway working surface has been found to improve the loading performance.Nevertheless,the effects on the guideway performance of changing the microstructure on the micron level are not yet clear.The mesh adaptation method,which was proposed by the authors,is employed in this paper to quantitatively study the influences of four microstructure parameters.The effect of tuning these parameters on the loading performance is revealed.The level of impact determines the proposed design process of the parameters.The characteristic feature of the proposed design process is that the working points of carrying capacity,stiffness,and rotational stiffness are unified under twoway adjusting by means of recess parameters.According to the proposed design process and tuning method,the restriction of supply pressure is lifted to a certain extent and the mutual tradeoff among the loading performances is relieved.The experimental results show that the rotational stiffness of the designed guideway,based on the tuned parameters,reached 2.14×10^(4) Nmrad1 and increased by 69.8%.In a scanning test of the applied VS on argon fluoride laser(ArF)photolithography,the average scanning acceleration reached 67.5 m·s^(-2),meeting the design specification.展开更多
To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography pr...To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography process, hybrid Petri nets （HPNs） were introduced. To cope with the complexity of a photolithography process, object-oriented methods such as encapsulation and classifications were integrated with HPN models. EHPN definitions were presented on the basis of HPN models and object-oriented methods. Object-oriented hybrid Petri subnet models were developed for each typical physical object and an EHPN modeling procedure steps were structured. To demonstrate the feasibility and validity of the proposed modeling method, a real wafer photolithography case was used to illustrate the modeling procedure. dynamic modeling of a complex photolithography process effectively The modeling results indicate that the EHPNs can deal with the dynamic modeling of a complex photolithography process effectively.展开更多
In this study, the authors have shown the power conversion efficiency of flexible organic solar cells. The structure of the device is PET/ITO/PEDOT： PSS/P3HT： PCBM/AI. P3HT （poly-3-hexylthiophene）. It was used as ...In this study, the authors have shown the power conversion efficiency of flexible organic solar cells. The structure of the device is PET/ITO/PEDOT： PSS/P3HT： PCBM/AI. P3HT （poly-3-hexylthiophene）. It was used as an electron donor, PCBM （[6, 6]-phenyl C6 l-butyric acid methyl ester） as an electron acceptor and PEDOT： PSS used as a HIL （hole injection layer）. These materials were deposited by spin coating method on the flexible substrates. Photolithography method is used to etch ITO. The electrical parameters of the fabricated cells were investigated by means of J （V）, FF （fill factor）, the efficiency （r/）, photocurrent and IPCE measurement. It was observed that 45% of the absorbed photons are converted into current. The results obtained using etching technology by photolithography is better than that obtained in the clean room.展开更多
The fabrication of black pixel define layer (PDL) on the organic light emitting diode (OLED) panel has been developed actively by using negative-tone black photoresist which contain photoinitiator, photosensitizer, bi...The fabrication of black pixel define layer (PDL) on the organic light emitting diode (OLED) panel has been developed actively by using negative-tone black photoresist which contain photoinitiator, photosensitizer, binder polymer, multifunctional monomer and black mill base in order to improve the outdoor visibility of OLEDs. Cardo type binder polymer containing bulky and rigid fluorene group has been widely used in the black photoresist formulation. However, the commercial cardo binder polymer has high cost and requires high UV dose for the fine patterning of PDL in the photolithographic process. In this study we designed and synthesized various non-cardo type binder polymers and evaluated the new binder polymers in comparison with the cardo binder polymer for the improved patterning of PDL on the OLED panel.展开更多
基金supported by the National Natural Science Foundation of China(No.61274040)the National Basic Research Program of China(No.2011CB301902)the National High Technology R&D Program of China(Nos.2011AA03A105,2011AA03A103)
文摘We report a new method for the fabrication of two-dimensional photonic crystal （PhC） hole arrays to improve the light extraction of GaN-based light-emitting diodes （LEDs）. The PhC structures were realized using nanospherical-lens photolithography and the selective-area epitaxy method, which ensured the electrical properties of the LEDs through leaving the p-GaN damage-free. At a current of 350 mA, the light output power of LEDs with PhC hole arrays of 450 nm and 600 nm in diameter with the same lattice period of 900 nm were enhanced by 49.3% and 72.2%, respectively, compared to LEDs without a PhC. Furthermore, the LEDs with PhC hole structures showed an obviously smaller divergent angle compared with conventional LEDs, which is consistent with the results of finite-difference time-domain simulation.
基金This work was supported by the Guangdong Major Project of Basic and Applied Basic Research(2020B0301030009)the National Key Research and Development Program of China(2022YFC3400600)National Natural Science Foundation of China(12174208,32227802,11874231,31801134 and 31870843)+2 种基金Tianjin Natural Science Foundation(20JCYBJC01010)China Postdoctoral Science Foundation(2020M680032)Fundamental Research Funds for the Central Universities(2122021337 and 2122021405).
文摘Actin cytoskeleton plays crucial roles in various cellular functions.Extracellular matrix(ECM)can modulate cell morphology by remodeling the internal cytoskeleton.To define how geometry of ECM regulates the organization of actin cytoskeleton,we plated individual NIH 3T3 cells on micropatterned substrates with distinct shapes and sizes.It was found that the stress fibers could form along the nonadhesive edges of T-shaped pattern,but were absent from the opening edge of V-shaped pattern,indicating that the organization of actin cytoskeleton was dependent on the mechanical environment.Furthermore,a secondary actin ring was observed on 50μm circular pattern while did not appear on 30μm and 40μm pattern,showing a size-dependent organization of actin cytoskeleton.Finally,osteoblasts,MDCK and A549 cells exhibited distinct organization of actin cytoskeleton on T-shaped pattern,suggesting a cell-type specificity in arrangement of actin cytoskeleton.Together,our findings brought novel insight into the organization of actin cytoskeleton on micropatterned environments.
文摘Simulations of photoresist etching,aerial image,exposure,and post-bake processes are integrated to obtain a photolithography process simulation for microelectromechanical system（MEMS） and integrated circuit（IC） fabrication based on three-dimensional （3D） cellular automata（CA）. The simulation results agree well with available experimental results. This indicates that the 3D dynamic CA model for the photoresist etching simulation and the 3D CA model for the post-bake simulation could be useful for the monolithic simulation of various lithography processes. This is determined to be useful for the device-sized fabrication process simulation of IC and MEMS.
基金This work was funded by the National Natural Science Foundation of China(51675136)the National Science and Technology Major Project(2017ZX02101006-005)the Heilongjiang Natural Science Foundation(E2017032).
文摘A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system(VS)of photolithography.The presence of microstructure,such as recesses and grooves,on the guideway working surface has been found to improve the loading performance.Nevertheless,the effects on the guideway performance of changing the microstructure on the micron level are not yet clear.The mesh adaptation method,which was proposed by the authors,is employed in this paper to quantitatively study the influences of four microstructure parameters.The effect of tuning these parameters on the loading performance is revealed.The level of impact determines the proposed design process of the parameters.The characteristic feature of the proposed design process is that the working points of carrying capacity,stiffness,and rotational stiffness are unified under twoway adjusting by means of recess parameters.According to the proposed design process and tuning method,the restriction of supply pressure is lifted to a certain extent and the mutual tradeoff among the loading performances is relieved.The experimental results show that the rotational stiffness of the designed guideway,based on the tuned parameters,reached 2.14×10^(4) Nmrad1 and increased by 69.8%.In a scanning test of the applied VS on argon fluoride laser(ArF)photolithography,the average scanning acceleration reached 67.5 m·s^(-2),meeting the design specification.
基金Project(60574054) supported by the National Natural Science Foundation of China
文摘To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography process, hybrid Petri nets （HPNs） were introduced. To cope with the complexity of a photolithography process, object-oriented methods such as encapsulation and classifications were integrated with HPN models. EHPN definitions were presented on the basis of HPN models and object-oriented methods. Object-oriented hybrid Petri subnet models were developed for each typical physical object and an EHPN modeling procedure steps were structured. To demonstrate the feasibility and validity of the proposed modeling method, a real wafer photolithography case was used to illustrate the modeling procedure. dynamic modeling of a complex photolithography process effectively The modeling results indicate that the EHPNs can deal with the dynamic modeling of a complex photolithography process effectively.
文摘In this study, the authors have shown the power conversion efficiency of flexible organic solar cells. The structure of the device is PET/ITO/PEDOT： PSS/P3HT： PCBM/AI. P3HT （poly-3-hexylthiophene）. It was used as an electron donor, PCBM （[6, 6]-phenyl C6 l-butyric acid methyl ester） as an electron acceptor and PEDOT： PSS used as a HIL （hole injection layer）. These materials were deposited by spin coating method on the flexible substrates. Photolithography method is used to etch ITO. The electrical parameters of the fabricated cells were investigated by means of J （V）, FF （fill factor）, the efficiency （r/）, photocurrent and IPCE measurement. It was observed that 45% of the absorbed photons are converted into current. The results obtained using etching technology by photolithography is better than that obtained in the clean room.
文摘The fabrication of black pixel define layer (PDL) on the organic light emitting diode (OLED) panel has been developed actively by using negative-tone black photoresist which contain photoinitiator, photosensitizer, binder polymer, multifunctional monomer and black mill base in order to improve the outdoor visibility of OLEDs. Cardo type binder polymer containing bulky and rigid fluorene group has been widely used in the black photoresist formulation. However, the commercial cardo binder polymer has high cost and requires high UV dose for the fine patterning of PDL in the photolithographic process. In this study we designed and synthesized various non-cardo type binder polymers and evaluated the new binder polymers in comparison with the cardo binder polymer for the improved patterning of PDL on the OLED panel.
