An Uncertainty Analysis of Downward Pressure Applied to the Wafer Based on a Flexible Airbag by a Double Side Polishing Machine

The process of wafer polishing is known to be highly demanding,and even small deviations in the processing parameters can have a significant impact on the quality of the wafers obtained.During the process of wafer polishing,maintaining a constant pressure value applied by the polishing head is essential to achieve the desired flatness of the wafer.The accuracy of the downward pressure output by the polishing head is a crucial factor in producing flat wafers.In this paper,the uncertainty component of downward pressure is calculated and its measurement uncertainty is evaluated,and a method for calculating downward pressure uncertainty traceable to international basic unit is established.Therefore,the reliability of double side polishing machine has been significantly improved.

Standardization of meibomian gland dysfunction in an Egyptian population sample using a non-contact meibography technique

AIM:To develop normative data for meibomian gland dysfunction(MGD)parameters,using non-contact meibography technique of Sirius Costruzione Strumenti Oftalmici(CSO)machine,in an Egyptian population sample.METHODS:Observational,cross-sectional,analytic study,in which 104 Egyptian volunteers were included.Both upper lids were examined,using“Sirius CSO”machine.Each eyelid was given a degree of meibomian gland loss(MGL),which was calculated by the software of the machine.RESULTS:Mean percentage MGL in right upper lid was of 30.9%±12.6%,and that of left upper lid was 32.6%±11.8%.Thirty-four volunteers(32.7%)had first-degree MGL in their right upper lid,and 67.3%had second-degree loss.One volunteer(1%)had zero-degree MGL in left upper lid,28(26.9%)had first-degree loss,and 75(72.1%)had second-degree loss.Degree of MGL in right upper eyelid was not related to age,but degree of MGL in left upper eyelid increased with age.There was statistically significant difference between both genders for degree of MGL in right eye(P=0.036)and in left eye(P=0.027).CONCLUSION:Noncontact meibography is a useful non-invasive tool for diagnosing MGL.MGL is diagnosed in 100%of apparently normal individuals;26.9%-32.7%of which have first-degree MGL,and 67.3%-72.1%have second-degree MGL.

Non-contact wide-field viewing system-assisted scleral buckling surgery for retinal detachment in silicone oilfilled eyes

AIM:To evaluate scleral buckling(SB)surgery using a noncontact wide-field viewing system and 23-gauge intraocular illumination for the treatment of rhegmatogenous retinal detachment in silicone oil(SO)-filled eyes.METHODS:Totally 9 patients(9 eyes)with retinal detachment in SO-filled eyes were retrospectively analyzed.All patients underwent non-contact wide-field viewing system-assisted buckling surgery with 23-gauge intraocular illumination.SO was removed at an appropriate time based on recovery.The patients were followed up for at least 3mo after SO removal.Retinal reattachment,complications,visual acuity and intraocular pressure(IOP)before and after surgery were observed.RESULTS:Patients were followed up for a mean of 8.22mo(3-22mo)after SO removal.All patients had retinal reattachment.At the final follow-up,visual acuity showed improvement for 8 patients,and no change for 1 patient.The IOP was high in 3 patients before surgery,but it stabilized after treatment;it was not affected in the other patients.None of the patients had infections,hemorrhage,anterior ischemia,or any other complication.CONCLUSION:This new non-contact wide-field viewing system-assisted SB surgery with 23-gauge intraocular illumination is effective and safe for retinal detachment in SO-filled eyes.

Effects Optimization of Bio-Polishing Industrial Process Parameters

The purpose of this study is to select an appropriate commercial neutral cellulase enzyme for denim garments bio-polishing to achieve specific industrial goals. A full factorial experimental design was used to evaluate the effect of factors considered in the optimization of the bio-polishing process (fabric ID: x1, treatment time: x2, treatment temperature: x3, enzyme concentration: x4, storage time: x5, inactivation step: x6 and enzyme type: x7). Experiments were conducted using laboratory washing machine. Subjective evaluation was performed at a pilot and at an industrial scale. Tear, tensile strength and subjective evaluation concerning hand feel, fabric color, indigo dye pocket back staining and fuzziness extent were evaluated. Results showed that x6 and x7 had significant effects on the fabric tear and tensile strength loss. In the optimization, the great dependence between observed and predicted tear strength and tensile strength loss, the correlation coefficient of the models (R2 > 0.85) and the important value of F-ratio proved the validity of the models. Results showed that denim leg panels treated with the enzyme Lava-Cell NSZ presented a minimum loss of tear and tensile strength. A low-temperature and time enzymatic bio-polishing process was developed at industrial scale.

Chemical Mechanical Polishing of Glass Substrate with α-Alumina-g-Polystyrene Sulfonic Acid Composite Abrasive

Abrasive is the one of key influencing factors during chemical mechanical polishing（CMP） process. Currently, α-Alumina （α-Al2O3） particle, as a kind of abrasive, has been widely used in CMP slurries, but their high hardness and poor dispersion stability often lead to more surface defects. After being polished with composite particles, the surface defects of work pieces decrease obviously. So the composite particles as abrasives in slurry have been paid more attention. In order to reduce defect caused by pure α-Al2O3 abrasive, α-alumina-g-polystyrene sulfonic acid （α-Al2O3-g-PSS） composite abrasive was prepared by surface graft polymerization. The composition, structure and morphology of the product were characterized by Fourier transform infrared spectroscopy（FTIR）, X-ray photoelectron spectroscopy（XPS）, time-of-flight secondary ion mass spectroscopy（TOF-SIMS）, and scanning electron microscopy（SEM）, respectively. The results show that polystyrene sulfonic acid grafts onto α-Al2O3, and has well dispersibility. Then, the chemical mechanical polishing performances of the composite abrasive on glass substrate were investigated with a SPEEDFAM-16B-4M CMP machine. Atomic force microscopy（AFM） images indicate that the average roughness of the polished glass substrate surface can be decreased from 0.835 nm for pure α-Al2O3 abrasive to 0.583 nm for prepared α-Al2O3-g-PSS core-shell abrasive. The research provides a new and effect way to improve the surface qualities during CMP.

Computer Controlled Polishing of the Off-axis Aspheric Mirrors

In this paper, the manufacturing and testing procedures to make large off-axis aspherical mirrors are presented. The difficulties in polishing and testing for both circular aperture and rectangular aperture mirrors are previewed, and a possible solution is given. The two mirrors have been polished by means of CCOS, and the final accuracy is 25nm rms for 770mm×210mm rectangular mirror and 20nm rms for φ600mm circular mirror. These results just meet the optical tolerances specified by the designer, and the manufacturing and testing procedures presented here show good ability to make the large off-axis aspherical mirrors.

Parameters Optimization of a Novel 5-DOF Gasbag Polishing Machine Tool

The research on the parameters optimization for gasbag polishing machine tools, mainly aims at a better kinematics performance and a design scheme. Serial structural arm is mostly employed in gasbag polishing machine tools at present, but it is disadvantaged by its complexity, big inertia, and so on. In the multi-objective parameters optimization, it is very difficult to select good parameters to achieve excellent performance of the mechanism. In this paper, a statistics parameters optimization method based on index atlases is presented for a novel 5-DOF gasbag polishing machine tool. In the position analyses, the structure and workspace for a novel 5-DOF gasbag polishing machine tool is developed, where the gasbag polishing machine tool is advantaged by its simple structure, lower inertia and bigger workspace. In the kinematics analyses, several kinematics performance evaluation indices of the machine tool are proposed and discussed, and the global kinematics performance evaluation atlases are given. In the parameters optimization process, considering the assembly technique, a design scheme of the 5-DOF gasbag polishing machine tool is given to own better kinematics performance based on the proposed statistics parameters optimization method, and the global linear isotropic performance index is 0.5, the global rotational isotropic performance index is 0.5, the global linear velocity transmission performance index is 1.012 3 m/s in the case of unit input matrix, the global rotational velocity transmission performance index is 0.102 7 rad/s in the case of unit input matrix, and the workspace volume is 1. The proposed research provides the basis for applications of the novel 5-DOF gasbag polishing machine tool, which can be applied to the modern industrial fields requiring machines with lower inertia, better kinematics transmission performance and better technological efficiency.

Research on Abrasives in the Chemical Mechanical Polishing Process for Silicon Nitride Balls

Silicon nitride (Si 3N 4) has been the main material for balls in ceramic ball bearings, for its lower density, high strength, high hardness, fine thermal stability and anticorrosive, and is widely used in various fields, such as high speed and high temperature areojet engines, precision machine tools and chemical engineer machines. Silicon nitride ceramics is a kind of brittle and hard material that is difficult to machining. In the traditional finishing process of silicon nitride balls, balls are lapped by expensive diamond abrasive. The machining is inefficiency and the cost is high, but also lots of pits, scratch subsurface micro crazes and dislocations will be caused on the surface of the balls, the performance of the ball bearings would be declined seriously. In these year, a kind of new technology known as chemical mechanical polishing is introduced in the ultraprecision machining process of ceramic balls. In this technology, abrasives such as ZrO 2, CeO 2 whose hardness is close to or lower than the work material (Si 3N 4) are used to polishing the balls. In special slurry, these abrasives can chemo-mechanically react with the work material and environment (air or water) to generate softer material (SiO 2). And the resultants will be removed easily at 0.1 nm level. So the surface defects can be minimized, very smooth surface (Ra=4 nm) and fine sphericity (0.15～0.25 μm ) can be obtained, and the machining efficiency is also improved. The action mechanism of the abrasives in the chemical mechanical polishing process in finishing of silicon nitride ball will be introduced in this paper.

Effects of Polishing on Proximate Composition,Physico-Chemical Characteristics,Mineral Composition and Antioxidant Properties of Pigmented Rice

The effects of polishing on proximate compositions,physico-chemical characteristics,mineral compositions and antioxidant properties of the rice flours obtained from three different pigmented rice varieties(Chak-hao Angangba,Chak-hao Amubi and Chak-hao Poireiton) were investigated.The rice varieties were significantly(P < 0.05) different in the contents of the test characteristics.Lipids,ash,minerals,phytochemicals(phenolic acids and flavonoids) and 2,2-diphenyl-1-picrylhydrazyl(DPPH) activity of rice flours were decreased after polishing(9% degree of milling),while amylose content and lightness were increased.X-ray diffraction pattern of rice flours exhibited A-type crystalline pattern with reflections at 15.1o,17.1o,18.2o and 23.0o.Pasting properties and transition temperatures were decreased after polishing treatment.Polishing resulted in changes in the crystallinity,enthalpy and morphology of rice flours.

Numerical Analysis of Nd:YAG Pulsed Laser Polishing CVD Self-standing Diamond Film

Chemical vapor deposited （CVD） diamond film has broad application foreground in high-tech fields. But polycrystalline CVD self-standing diamond thick film has rough surface and non-uniform thickness that adversely affect its extensive applications. Laser polishing is a useful method to smooth self-standing diamond film. At present, attentions have been focused on experimental research on laser polishing, but the revealing of theoretical model and the forecast of polishing process are vacant. The paper presents a finite element model to simulate and analyze the mechanism of laser polishing diamond based on laser thermal conduction theory. The experimental investigation is also carried out on Nd：YAG pulsed laser smoothing diamond thick film. The simulation results have good accordance with the results of experimental results. The temperature and thermal stress fields are investigated at different incidence angles and parameters of Nd：YAG pulsed laser. The pyramidal-like roughness of diamond thick film leads to the non-homogeneous temperature fields. The temperature at the peak of diamond film is much higher than that in the valley, which leads to the smoothing of diamond thick film. The effect of laser parameters on the surface roughness and thickness of graphite transition layer is also carried out. The results show that high power density laser makes the diamond surface rapid heating, evaporation and sublimation after its graphitization. It is also found that the good polish quality of diamond thick film can be obtained by a combination of large incident angle, moderate laser pulsed energy, large repetition rate and moderate laser pulse width. The results obtained here provide the theoretical basis for laser polishing diamond film with high efficiency and high quality.

Surface Roughness and Roundness of Bearing Raceway Machined by Floating Abrasive Polishing and Their Effects on Bearing's Running Noise

As the two most important indexes of bearing raceway, surface roughness and roundness have significant influence on bearing noise. Some researchers have carried out studies in this field, however, reason and extent of the influence of raceway surface geometric characteristics on bearing running noise are not perfectly clear up to now. In this paper, the raceway of 6309 type bearing＇s inner and outer ring is machined by floating abrasive polishing adopting soft abrasive pad. Surface roughness parameters, arithmetical mean deviation of the profile Ra, the point height of irregularities Rz, maximum height of the profile Rmax and roundness fof raceways, are measured before and after machining, and the change rules of the measured results are studied. The study results show that the floating abrasive polishing can reduce the surface geometric errors of bearing raceway evidently. The roundness error is reduced by 25%, Rm^x value is reduced by 35.5%, Rz value is reduced by 22% and Ra value is reduced by 5%. By analyzing the change of the geometrical parameters and the shape difference of the raceway before and after machining, it is found that the floating abrasive polishing method can affect the roundness error mainly by modifying the local deviation of the raceway＇s surface profile. Bearings with different raceway surface geometrical parameter value are assembled and the running noise is tested. The test results show that Ra has a little, Rmax and Rz have a measurable, and the roundness error has a significant influence on the running noise. From the viewpoint of controlling bearings＇ running noise, raceway roundness error should be strictly controlled, and for the surface roughness parameters, R,n^x and Rz should be mainly controlled. This paper proposes an effective method to obtain the low noise bearing by machining the raceway with floating abrasive polishing after super finishing.

Effect of Roasting Conditions of Rich Cerium Rare Earth Carbonate on Crystallite Morphology and Polishing Ability of Ceria-Based Rare Earth Oxide

The granule shape and crystal structure of the the ceria-based rare earth oxide which were roasted at 600～1050 ℃ for 2～6 h and then cooled in furnace, cooled out of furnace or cooled in water were studied by means of XRD and SEM. The results revealed that the rich cerium rare earth carbonate could be changed into the rare earth oxide which was a kind of sandwich made of globose granule whose diameter was between 0.5～3.0 μm after being roasted in 900 ℃ for 2 h. This kind of crystal lattice in rare earth oxide belonged to face-centered cubic lattice and its space between crystal surface {111} and {200} (viz. L111 and L200) would enlarge as the roasting temperature increasing. With increasing roasting temperature, L111 would rise straightly upward, and L200 would rise straightly upward when roasting time was 2～4 h but changed little when roasting time was 4～6 h. The glass-polishing experiments found that the polishing ability of the ceria-based rare earth oxide was the best as L111 was 43～53 nm and the L200 was 43～56 nm.

Damage mechanisms during lapping and mechanical polishing CdZnTe wafers

CdZnTe wafers were machined by lapping and mechanical polishing processes,and their surface and subsurface damages were investigated.The surface damages are mainly induced by three-body abrasive wear and embedded abrasive wear during lapping process.A new damage type,which is induced by the indentation of embedded abrasives,is found in the subsurface.When a floss pad is used to replace the lapping plate during machining,the surface damage is mainly induced by two-body abrasive and three-body abrasive wear,and the effect of embedded abrasives on the surface is greatly weakened.Moreover,this new damage type nearly disappears on the subsurface.

An Investigation on a Tin Fixed Abrasive Polishing Pad with Phyllotactic Pattern for Polishing Wafer

In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by the use of electroplating technology, and also its polishing ability for JGS-2 wafer was investigated by polishing experiments. The research results show that the phyllotactic parameters of the polishing pad influence the arrangement density of the tin fixed abrasive blocks, the polishing pad with phyllotactic pattern is feasibly fabricated by the use of electroplating technology, and the good polishing result can be obtained by using the polishing pad with phyllotactic pattern to polish a wafer when the diameter D of the tin fixed abrasive block is between Φ1.3 mm and Φ1.4 mm, and the phyllotactic coefficient k between 1.0 and 1.1,respectively.

Preparation of Non-spherical Colloidal Silica Nanoparticle and Its Application on Chemical Mechanical Polishing of Sapphire

Non-spherical colloidal silica nanoparticle was prepared by a simple new method, and its particle size distribution and shape morphology were characterized by dynamic light scattering(DLS) and the Focus Ion Beam(FIB) system. This kind of novel colloidal silica particles can be well used in chemical mechanical polishing(CMP) of sapphire wafer surface. And the polishing test proves that non-spherical colloidal silica slurry shows much higher material removal rate(MRR) with higher coefficient of friction(COF) when compared to traditional large spherical colloidal silica slurry with particle size 80 nm by DLS. Besides, sapphire wafer polished by non-spherical abrasive also has a good surface roughness of 0.460 6 nm. Therefore, non-spherical colloidal silica has shown great potential in the CMP field because of its higher MRR and better surface roughness.

Development of Application of RE Polishing Materials

The manufacturing method and functions of the RE polishing powder and comparation of the current situation of its production and application home and abroad were introduced.By analyzing the development of the liquid crystal (plate) display, the wide application of the RE polishing powder in the field of the liquid crystal display and predicts the development direction of the market of the RE polishing powder was presented.In addition, the development trends of the RE polishing powder industry and forecasts the application prospect of the RE polishing powder was analyzed.

A review on polishing technology of large area free-standing CVD diamond films

Recently,with the rapid development of chemical vapor deposition(CVD)technology,large area free-standing CVD diamond films have been produced successfully.However,the coarse grain size on the surface and the non-uniform thickness of unprocessed CVD diamond films make it difficult to meet the application requirement.The current study evaluates several existing polishing methods for CVD diamond films,including mechanical polishing,chemical mechanical polishing and tribochemical polishing technology.

MORPHOLOGY CONTROL OF ULTRAFINE CeO_2 AND ITS POLISHING EFFICACY

Homogenous precipitation and subsequent calcination has been used tosynthesize ultrafine ceria from cerium nitrate and urea solution. The ceria calcined from theprecursor inherit the size and morphology of it. The size and morphology of the precursor areclosely related to the preparation process. The morphology, size and distribution of the precursorcould be tailored by changing the reaction condition and the ageing time. Monodispersed 200 nm sizedspherical particles is prepared by this method. The powder is used in the chemical-mechanicalpolishing of Si wafer. The average surface roughness of the polished Si wafer is 0.171 nm measuredby AFM.

EFFECTS OF POLISHING PARAMETERS ON MATERIAL REMOVAL FOR CURVED OPTICAL GLASSES IN BONNET POLISHING

The paper firstly analyzes the influence factor on material removal rate of curved optical work-pieces in the bonnet polishing. Then the experiments are conducted to reveal the effects of several polishing parameters on the material removal rate when the spherical optical glasses are polished with different curvature radius, such as the decrement of the bonnet, the rotational speed of the bonnet and the curvature radius of the work-piece＇s surface using a bonnet trial-manufacturing machine developed by our assignment groups. In the end, the curvilinear relationships between these parameters and the material removal rate are acquired and the laws of the effects on material removal rate in bonnet polishing by several parameters are given. When the spherical-pieces are polished with smaller curvature radius, it is not proportional to either bonnet decrement or bonnet rotational speed as described by the Preston equation although the removal rate increases as the relative velocity or the applied pressure increases. Therefore, for the purpose of calculating more accurately the material removal of the spherical work-pieces, the Preston equation should be modified and studied further.

Optimization of Polishing Parameters with Taguchi Method for LBO Crystal in CMP

Chemical mechanical polishing （CMP） was used to polish Lithium triborate （LiB3O5 or LBO） crystal. Taguchi method was applied for optimization of the polishing parameters. Material removal rate （MRR） and surface roughness are considered as criteria for the optimization. The polishing pressure, the abrasive concentration and the table velocity are important parameters which influence MRR and surface roughness in CMP of LBO crystal. Experiment results indicate that for MRR the polishing pressure is the most significant polishing parameter followed by table velocity; while for the surface roughness, the abrasive concentration is the most important one. For high MRR in CMP of LBO ctystal the optimal conditions are： pressure 620 g/cm^2, concentration 5.0 wt pct, and velocity 60 r/min, respectively. For the best surface roughness the optimal conditions are： pressure 416 g/cm^2, concentration 5.0 wt pct, and velocity 40 r/min, respectively. The contributions of individual parameters for MRR and surface roughness were obtained.