A spectrophotometric approach for the detection of non-ionic surfactant (Triton X-100) has been proposed in this paper. This method does not involve extraction of the ion-associate with harmful solvents, but employs a...A spectrophotometric approach for the detection of non-ionic surfactant (Triton X-100) has been proposed in this paper. This method does not involve extraction of the ion-associate with harmful solvents, but employs adhesion of the ion-association of potassium/non-ionic surfactants complex and tetraphenylporphyrin tetrasulfonic acid obtained by vigorous shaking. The adhered ion-associate was dissolved with water and its absorbance was measured. The sensitivity for Triton X-100 was determined to be 0.146 (expressed as absorbance of 1 mg/L solution). The adhesion tendency of ion-associate was found to be dependent on the water contact angle, which in turn was influenced by a high adhesion of the ion-associate and by low blank values. In this respect, a tetrafluo-roethylene vessel was found to be the most suitable for the detection of non-ionic surfactants. This spectrophotometrical method is simply and rapidly performed by a procedure based on mechanical shaking and can be employed to detect non-ionic surfactants containing more than 7 polyethylene oxide units.展开更多
A simple and rapid method for the determination of polyethylene oxide-type non-ionic surfactants is reported herein. This method is based on the adhesion of calcium/non-ionic surfactant complexes with tetra phenyl por...A simple and rapid method for the determination of polyethylene oxide-type non-ionic surfactants is reported herein. This method is based on the adhesion of calcium/non-ionic surfactant complexes with tetra phenyl porphine sulfonic acid （TPPS） to the wall of reaction vessel upon vigorous shaking. The ion-associate adhering to the inner wall of the vessel was dissolved with water after discarding the solution and spectrophotometrically assayed at 412 nm. From the standard curve for Triton X-100, the order of the sensitivity for different ions was as follows： Ca^2＋〉 K^＋〉 NH4^＋〉 Ba^2＋. The proposed method does not involve extraction of the ion-associated with harmful solvents and can be simply performed by combining a procedure based on hand shaking and the use of a spectrophotometer.展开更多
Extraction behavior of chlorpromazine hydrochloride (CPZ) and procaine hydro- chloride (PCN) in the system described in the title was studied. Research shows that the extraction efficiency of CPZ can amount to 96% by...Extraction behavior of chlorpromazine hydrochloride (CPZ) and procaine hydro- chloride (PCN) in the system described in the title was studied. Research shows that the extraction efficiency of CPZ can amount to 96% by twice extraction, while that of PCN is 77%. This system produces the distribution coefficients (KD) of 12.3 and 2.6 respectively for CPZ and PCN. Extraction mechanism is deduced according to ultraviolet and molecular fluorescence spectra variation of the drugs in the system studied.展开更多
The ONP neutral deinking performances of fatty alcohol polyoxyethylene ether with different EO value were investigated in this paper. Meanwhile, the synergistic effects of different non-ionic surfactants, the co-opera...The ONP neutral deinking performances of fatty alcohol polyoxyethylene ether with different EO value were investigated in this paper. Meanwhile, the synergistic effects of different non-ionic surfactants, the co-operation of non-ionic surfactants with anionic surfactants,and the effects of different salts added into the above two systems on deinkability were also studied. The results showed the deinking performance of A7 was good. But the synergistic effect of A7 and A4 was better. In addition, the accession of salt W2 could improve the deinking efficiency, and the brightness of the deinked pulp was 1.0%ISO higher than that of A7 and A4.展开更多
The effect of a non-ionic surfactant on particles removal in post-CMP cleaning was investigated. By changing the concentration of the non-ionic surfactant, a series of experiments were performed on the 12 inch Cu patt...The effect of a non-ionic surfactant on particles removal in post-CMP cleaning was investigated. By changing the concentration of the non-ionic surfactant, a series of experiments were performed on the 12 inch Cu pattern wafers in order to determine the best cleaning results. Then the effect of the surfactant on the reduction of defects and the removal of particles was discussed in this paper. What is more, the negative effect of a non-ionic surfactant was also discussed. Based on the experiment results, it is concluded that the non-ionic surfactant could cause good and ill effects at different concentrations in the post-CMP cleaning process. This understanding will serve as a guide to how much surfactant should be added in order to achieve excellent cleaning performance.展开更多
This paper presents a new cleaning process for particle and organic contaminants on polished silicon wafer surfaces.It combines a non-ionic surfactant with boron-doped diamond（BDD） film anode electrochemical oxidati...This paper presents a new cleaning process for particle and organic contaminants on polished silicon wafer surfaces.It combines a non-ionic surfactant with boron-doped diamond（BDD） film anode electrochemical oxidation. The non-ionic surfactant is used to remove particles on the polished wafer＇s surface,because it can form a protective film on the surface,which makes particles easy to remove.The effects of particle removal comparative experiments were observed by metallographic microscopy,which showed that the 1%v/v non-ionic surfactant achieved the best result. However,the surfactant film itself belongs to organic contamination,and it eventually needs to be removed.BDD film anode electrochemical oxidation（BDD-EO） is used to remove organic contaminants,because it can efficiently degrade organic matter.Three organic contaminant removal comparative experiments were carried out：the first one used the non-ionic surfactant in the first step and then used BDD-EO,the second one used BDD-EO only,and the last one used RCA cleaning technique.The XPS measurement result shows that the wafer＇s surface cleaned by BDD-EO has much less organic residue than that cleaned by RCA cleaning technique,and the non-ionic surfactant can be efficiently removed by BDD-EO.展开更多
文摘A spectrophotometric approach for the detection of non-ionic surfactant (Triton X-100) has been proposed in this paper. This method does not involve extraction of the ion-associate with harmful solvents, but employs adhesion of the ion-association of potassium/non-ionic surfactants complex and tetraphenylporphyrin tetrasulfonic acid obtained by vigorous shaking. The adhered ion-associate was dissolved with water and its absorbance was measured. The sensitivity for Triton X-100 was determined to be 0.146 (expressed as absorbance of 1 mg/L solution). The adhesion tendency of ion-associate was found to be dependent on the water contact angle, which in turn was influenced by a high adhesion of the ion-associate and by low blank values. In this respect, a tetrafluo-roethylene vessel was found to be the most suitable for the detection of non-ionic surfactants. This spectrophotometrical method is simply and rapidly performed by a procedure based on mechanical shaking and can be employed to detect non-ionic surfactants containing more than 7 polyethylene oxide units.
文摘A simple and rapid method for the determination of polyethylene oxide-type non-ionic surfactants is reported herein. This method is based on the adhesion of calcium/non-ionic surfactant complexes with tetra phenyl porphine sulfonic acid （TPPS） to the wall of reaction vessel upon vigorous shaking. The ion-associate adhering to the inner wall of the vessel was dissolved with water after discarding the solution and spectrophotometrically assayed at 412 nm. From the standard curve for Triton X-100, the order of the sensitivity for different ions was as follows： Ca^2＋〉 K^＋〉 NH4^＋〉 Ba^2＋. The proposed method does not involve extraction of the ion-associated with harmful solvents and can be simply performed by combining a procedure based on hand shaking and the use of a spectrophotometer.
文摘Extraction behavior of chlorpromazine hydrochloride (CPZ) and procaine hydro- chloride (PCN) in the system described in the title was studied. Research shows that the extraction efficiency of CPZ can amount to 96% by twice extraction, while that of PCN is 77%. This system produces the distribution coefficients (KD) of 12.3 and 2.6 respectively for CPZ and PCN. Extraction mechanism is deduced according to ultraviolet and molecular fluorescence spectra variation of the drugs in the system studied.
文摘The ONP neutral deinking performances of fatty alcohol polyoxyethylene ether with different EO value were investigated in this paper. Meanwhile, the synergistic effects of different non-ionic surfactants, the co-operation of non-ionic surfactants with anionic surfactants,and the effects of different salts added into the above two systems on deinkability were also studied. The results showed the deinking performance of A7 was good. But the synergistic effect of A7 and A4 was better. In addition, the accession of salt W2 could improve the deinking efficiency, and the brightness of the deinked pulp was 1.0%ISO higher than that of A7 and A4.
基金Project supported by the Specific Project Items No.2 in National Long-Term Technology Development Plan(No.2009zx02308-003)
文摘The effect of a non-ionic surfactant on particles removal in post-CMP cleaning was investigated. By changing the concentration of the non-ionic surfactant, a series of experiments were performed on the 12 inch Cu pattern wafers in order to determine the best cleaning results. Then the effect of the surfactant on the reduction of defects and the removal of particles was discussed in this paper. What is more, the negative effect of a non-ionic surfactant was also discussed. Based on the experiment results, it is concluded that the non-ionic surfactant could cause good and ill effects at different concentrations in the post-CMP cleaning process. This understanding will serve as a guide to how much surfactant should be added in order to achieve excellent cleaning performance.
文摘This paper presents a new cleaning process for particle and organic contaminants on polished silicon wafer surfaces.It combines a non-ionic surfactant with boron-doped diamond（BDD） film anode electrochemical oxidation. The non-ionic surfactant is used to remove particles on the polished wafer＇s surface,because it can form a protective film on the surface,which makes particles easy to remove.The effects of particle removal comparative experiments were observed by metallographic microscopy,which showed that the 1%v/v non-ionic surfactant achieved the best result. However,the surfactant film itself belongs to organic contamination,and it eventually needs to be removed.BDD film anode electrochemical oxidation（BDD-EO） is used to remove organic contaminants,because it can efficiently degrade organic matter.Three organic contaminant removal comparative experiments were carried out：the first one used the non-ionic surfactant in the first step and then used BDD-EO,the second one used BDD-EO only,and the last one used RCA cleaning technique.The XPS measurement result shows that the wafer＇s surface cleaned by BDD-EO has much less organic residue than that cleaned by RCA cleaning technique,and the non-ionic surfactant can be efficiently removed by BDD-EO.
