Using density functional theory calculation based on the B3LYP method,we have studied the interactions of H2 molecules with alkali-metal organic complexes C6H6-nLin（n = 1～3）,C6H5Na and C6H5K.A significant part of t...Using density functional theory calculation based on the B3LYP method,we have studied the interactions of H2 molecules with alkali-metal organic complexes C6H6-nLin（n = 1～3）,C6H5Na and C6H5K.A significant part of the electronic charge of M s orbital（Li 2s,Na 3s,K 4s） is donated to phenyl and is accommodated by H2 bonding orbital.For all the complexes considered,each bonded alkali-metal atom can adsorb up to five H2 in molecular form with the mean binding energy of 0.59,0.55 and 0.56 eV/H2 molecule for C6H6-nLin（n = 1～3）,C6H5Na and C6H5K,respectively.The kinetic stability of these hydrogen-covered organometallic complexes is discussed in terms of energy gap between HOMO and LUMO.It is remarkable that these alkali-metal organic complexes can store up to 23.80 wt% hydrogen.Therefore,the complexes studied may be used as hydrogen storage materials.展开更多
Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries ove...Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries over the past few decades.It is obvious that extreme ultraviolet(EUV)lithography has become the next-generation lithography technology.The development of comprehensive performance EUV resist is one of the most critical issues.However,organic polymeric photoresists are difficult to meet the harsh requirements of EUV lithography.Pure inorganic photoresists such as metal salts,hydrogen silsesquioxane(HSQ)are expected for EUV lithography due to their high resistance and high resolution.But the low sensitivity makes them not suitable for high volume manufacturing(HVM).Organic-inorganic hybrid photoresists,containing both organic and inorganic components,are regarded as one of the most promising EUV resists.They combine both merits of organic and inorganic materials and have significant advantages in machinability,etching resistance,EUV absorption,and chemical/thermal stability.Organic-inorganic hybrid photoresists are considered as ideal materials for realizing industrialgrade patterns below 10 nm.This review mainly focuses on the development of organic-inorganic hybrid photoresists over the past decade.展开更多
Three semicarbazonyl ligands were synthesized and used to form six novel organometallic complexes with Ph2SnCl2 and Cp2ZrCl2. All these complexes were characterized by IR 1H NMR MS and elemental analysis.
Ten ferrocene containing liquid crystalline materials, p FcC 6H 4CO 2C 6H 4N=CHC 6H 4O 2CC 6H 3BrOC n H 2 n +1 (type I) and p FcC 6H 4N=CHC 6H 4O 2CC 6H 3BrOC n H 2 ...Ten ferrocene containing liquid crystalline materials, p FcC 6H 4CO 2C 6H 4N=CHC 6H 4O 2CC 6H 3BrOC n H 2 n +1 (type I) and p FcC 6H 4N=CHC 6H 4O 2CC 6H 3BrOC n H 2 n +1 (type II), were synthesized by condensation reactions of two ferrocene substituted amines, p FcC 6H 4CO 2C 6H 4NH 2 (4) and p FcC 6H 4NH 2 (5) (Fc: ferrocenyl) with five bromo substituted benzaldehydes (3) (H 2 n +1 C n OC 6H 3BrCOOC 6H 4CHO, n =2, 4, 6, 8 and 10). Their mesogenic behaviors were studied by hot stage polarized optical microscopy and differential scanning calorimetry. The effects of structure (rigid core, terminal chain length) on the phase transition behaviors were discussed.展开更多
1 Results In addition to single wall and multiwall carbon nanotubes[1], several structures,which are more or less related to fullerenes,including carbon nanohorns[2a], carbon nanospheres[2b] and onion like carbon stru...1 Results In addition to single wall and multiwall carbon nanotubes[1], several structures,which are more or less related to fullerenes,including carbon nanohorns[2a], carbon nanospheres[2b] and onion like carbon structures[2c] have been reported.A new simple straight forward method to access some of these structures is the solid-state pyrolysis of different organometallic complexes in a sealed vessel,which led so far to carbon nanotubes[3a,b], carbon nanocables[3c] and onions[3d].展开更多
基金Supported by the National Natural Science Foundation of China (No.10976019)
文摘Using density functional theory calculation based on the B3LYP method,we have studied the interactions of H2 molecules with alkali-metal organic complexes C6H6-nLin（n = 1～3）,C6H5Na and C6H5K.A significant part of the electronic charge of M s orbital（Li 2s,Na 3s,K 4s） is donated to phenyl and is accommodated by H2 bonding orbital.For all the complexes considered,each bonded alkali-metal atom can adsorb up to five H2 in molecular form with the mean binding energy of 0.59,0.55 and 0.56 eV/H2 molecule for C6H6-nLin（n = 1～3）,C6H5Na and C6H5K,respectively.The kinetic stability of these hydrogen-covered organometallic complexes is discussed in terms of energy gap between HOMO and LUMO.It is remarkable that these alkali-metal organic complexes can store up to 23.80 wt% hydrogen.Therefore,the complexes studied may be used as hydrogen storage materials.
基金Financial support from the National Natural Science Foundation of China(22090012,U20A20144,21873106,22073108 and 21903085)the Ministry of Science and Technology of China Major Project(2018ZX02102005,2011ZX02701)is gratefully acknowledged.
文摘Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries over the past few decades.It is obvious that extreme ultraviolet(EUV)lithography has become the next-generation lithography technology.The development of comprehensive performance EUV resist is one of the most critical issues.However,organic polymeric photoresists are difficult to meet the harsh requirements of EUV lithography.Pure inorganic photoresists such as metal salts,hydrogen silsesquioxane(HSQ)are expected for EUV lithography due to their high resistance and high resolution.But the low sensitivity makes them not suitable for high volume manufacturing(HVM).Organic-inorganic hybrid photoresists,containing both organic and inorganic components,are regarded as one of the most promising EUV resists.They combine both merits of organic and inorganic materials and have significant advantages in machinability,etching resistance,EUV absorption,and chemical/thermal stability.Organic-inorganic hybrid photoresists are considered as ideal materials for realizing industrialgrade patterns below 10 nm.This review mainly focuses on the development of organic-inorganic hybrid photoresists over the past decade.
文摘Three semicarbazonyl ligands were synthesized and used to form six novel organometallic complexes with Ph2SnCl2 and Cp2ZrCl2. All these complexes were characterized by IR 1H NMR MS and elemental analysis.
基金ProjectsupportedbytheKeyResearchProgramissuedbytheSichuanProvincialEducationCommittee (No .1999 12 7) .edicatedtoProfessorHUANGWei Yuanontheoccasionofhis 80thbirthday .
文摘Ten ferrocene containing liquid crystalline materials, p FcC 6H 4CO 2C 6H 4N=CHC 6H 4O 2CC 6H 3BrOC n H 2 n +1 (type I) and p FcC 6H 4N=CHC 6H 4O 2CC 6H 3BrOC n H 2 n +1 (type II), were synthesized by condensation reactions of two ferrocene substituted amines, p FcC 6H 4CO 2C 6H 4NH 2 (4) and p FcC 6H 4NH 2 (5) (Fc: ferrocenyl) with five bromo substituted benzaldehydes (3) (H 2 n +1 C n OC 6H 3BrCOOC 6H 4CHO, n =2, 4, 6, 8 and 10). Their mesogenic behaviors were studied by hot stage polarized optical microscopy and differential scanning calorimetry. The effects of structure (rigid core, terminal chain length) on the phase transition behaviors were discussed.
文摘1 Results In addition to single wall and multiwall carbon nanotubes[1], several structures,which are more or less related to fullerenes,including carbon nanohorns[2a], carbon nanospheres[2b] and onion like carbon structures[2c] have been reported.A new simple straight forward method to access some of these structures is the solid-state pyrolysis of different organometallic complexes in a sealed vessel,which led so far to carbon nanotubes[3a,b], carbon nanocables[3c] and onions[3d].
