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Redox regulation of classⅡHDACs and cardiac hypertrophy
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作者 Junichi Sadoshima 《岭南心血管病杂志》 2011年第S1期21-22,共2页
Oxidative stress plays an essential role in regulating growth and death of cardiac myocytes. ClassⅡhistone deacetylases(cⅡ-HDACs) are localized primarily in the nucleus in unstimulated cardiac myocytes and negativ... Oxidative stress plays an essential role in regulating growth and death of cardiac myocytes. ClassⅡhistone deacetylases(cⅡ-HDACs) are localized primarily in the nucleus in unstimulated cardiac myocytes and negatively regulate cardiac hypertrophy by interacting with pro-hypertrophic transcription factors,including myocyte enhancer factor 2(MEF2),calmodulin-binding transcription activator (CAMTA),and nuclear factor activated T cells (NFATs).Nuclear localization of cII-HDACs is regulated not only by phosphorylation but also through oxidation of conserved cysteine residues(Ago et al 2007),suggesting that posttranslational modulation plays an important role in mediating pathological cardiac hypertrophy and heart failure. In this presentation,I will discuss how reactive oxygen species(ROS) are produced in the heart under stress and how ROS regulate the subcellular localization of cII-HDACs,thereby causing pathological hypertrophy.The NADPH oxidase family is a group of transmembrane proteins producing superoxide and hydrogen peroxide.Nox4 is localized primarily in mitochondria,endoplasmic reticulum,and nucleus, whose expression is upregulated by pressure overload and heart failure.Nox4 plays an essential role in mediating increases in ROS in the failing heart.Increased oxidative stress induces oxidation of cysteine resides in cⅡ-HDACs,such as C667 and C669 in HDAC4,which in turn causes nuclear exit of cⅡ-HDACs.The cⅡ-HDACs are further phospho-rylated by the HDAC kinases,including Ca<sup>2+</sup> calmodulin kinase and PKD,leading to prolonged cytoplasmic localization of cⅡ-HDACs and consequent cardiac hypertrophy.Thioredoxin 1(Trx1),an anti-oxidant, reduces the critical cysteine residues in cⅡ-HDACs, thereby restoring the nuclear localization of cⅡ-HDACs and inhibiting pathological hypertrophy. Downregulation of Nox4 enhances nuclear localization of HDAC4,thereby inhibiting cardiac hypertrophy, suggesting that endogenous Nox4 mediates oxidation of HDAC4. In summary,oxidative stress plays an important role in regulating the subcellular localization of cⅡ-HDACs, critical regulators of pathological cardiac hypertrophy.Nox4 is upregulated in response to cardiac hypertrophy and heart failure,thereby playing a major role in mediating oxidative stress in the failing heart.Both Trxl and Nox4 play an essential role in regulating the oxidation status of cⅡ-HDACs, thereby critically regulating pathological hypertrophy and heart failure.I will also discuss pharmacological interventions targeting phosphorylation and/or oxidation of cⅡ-HDACs,which may be effective in treating pathological hypertrophy and heart failure in patients. 展开更多
关键词 HYPERTROPHY CALMODULIN endoplasmic reticulum HYPERTROPHIC regulating superoxide localization MITOCHONDRIA oxidative
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Laser-Induced Single Event Transients in Local Oxidation of Silicon and Deep Trench Isolation Silicon-Germanium Heterojunction Bipolar Transistors 被引量:2
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作者 李培 郭红霞 +2 位作者 郭旗 张晋新 魏莹 《Chinese Physics Letters》 SCIE CAS CSCD 2015年第8期204-207,共4页
We present a study on the single event transient (SET) induced by a pulsed laser in different silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) with the structure of local oxidation of silicon ... We present a study on the single event transient (SET) induced by a pulsed laser in different silicon-germanium (SiGe) heterojunction bipolar transistors (HBTs) with the structure of local oxidation of silicon (LOCOS) and deep trench isolation (DTI). The experimental results are discussed in detail and it is demonstrated that a SiGe HBT with the structure of LOCOS is more sensitive than the DTI SiGe HBT in the SET. Because of the limitation of the DTI structure, the charge collection of diffusion in the DTI SiGe HBT is less than that of the LOCOS SiGe HBT. The SET sensitive area of the LOCOS SiGe HBT is located in the eollector-substrate (C/S) junction, while the sensitive area of the DTI SiGe HBT is located near to the collector electrodes. 展开更多
关键词 LOCOS DTI HBT Laser-Induced Single Event Transients in Local Oxidation of Silicon and Deep Trench Isolation Silicon-Germanium Heterojunction Bipolar Transistors
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衰老细胞中热休克转录因子1的异常调节和定位 被引量:3
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作者 林正 张式鸿 +4 位作者 罗兰 黄帆 吴兴刚 徐康 马中富 《中国生物化学与分子生物学报》 CAS CSCD 北大核心 2006年第2期129-134,共6页
为评估人热休克转录因子1(HSF1)在衰老细胞中呈现年龄依赖功能失调机制,通过凝胶电泳迁移率改变实验(EMSA)和RNA酶保护实验等了解低总体倍增水平(PDLs)的年轻和高PDLs的衰老IMR90双倍体人肺纤维母细胞的HSF1 DNA结合活性、HSF1蛋白质及... 为评估人热休克转录因子1(HSF1)在衰老细胞中呈现年龄依赖功能失调机制,通过凝胶电泳迁移率改变实验(EMSA)和RNA酶保护实验等了解低总体倍增水平(PDLs)的年轻和高PDLs的衰老IMR90双倍体人肺纤维母细胞的HSF1 DNA结合活性、HSF1蛋白质及其编码转录子mRNA水平和亚细胞分布.使用H2O2诱导年轻IMR90细胞成为“应激诱导早熟性老化(SIPS)”细胞,并与复制性衰老细胞比较HSF1 DNA结合活性、HSF1亚细胞分布和细胞内过氧化物含量.在不同年龄的IMR90细胞中,无论体内或体外,HSF1激活能力与细胞年龄呈反相关,但细胞内HSF1蛋白质与其mRNA水平并无改变.HSF1的亚细胞定位分析显示,HSF1主要存在于年轻细胞胞质中,热刺激促使三体形成和核转移;而在衰老细胞中,37℃时HSF1大部分存在于细胞核内,热刺激后形成三体,与DNA结合能力明显比年轻细胞弱;用H2O2诱导的应激成熟前老化细胞内,HSF1功能和亚细胞分布都与复制性衰老细胞相似.结果显示,细胞年龄与HSF1的激活和定位相关,而与HSF1含量无关,这些变化可能是通过氧化修饰所致. 展开更多
关键词 热休克转录因子1 衰老 氧化作用 调节与定位
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外源一氧化氮供体硝普钠对小麦种子萌发早期β-淀粉酶及其亚细胞分布的影响 被引量:10
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作者 孙永刚 凌腾芳 +4 位作者 王家杰 徐晟 宣伟 汤国辉 沈文飚 《作物学报》 CAS CSCD 北大核心 2008年第9期1608-1614,共7页
采用药理学和生物化学实验技术,研究了外源一氧化氮(nitric oxide,NO)供体硝普钠(sodium nitroprusside,SNP)处理对小麦种子萌发早期β-淀粉酶及其亚细胞分布的影响。β-淀粉酶的专一性抑制剂α-环糊精可以明显抑制0.5mmol L-1SNP诱导... 采用药理学和生物化学实验技术,研究了外源一氧化氮(nitric oxide,NO)供体硝普钠(sodium nitroprusside,SNP)处理对小麦种子萌发早期β-淀粉酶及其亚细胞分布的影响。β-淀粉酶的专一性抑制剂α-环糊精可以明显抑制0.5mmol L-1SNP诱导的小麦种子萌发,SNP还能诱导自由型β-淀粉酶酶活性,上调β-淀粉酶基因转录本的水平。Western blotting结果发现,SNP处理可以增加β-淀粉酶蛋白的表达;运用NO专一性清除剂cPTIO及转录抑制剂放线菌素D可以逆转上述转录本和蛋白水平的变化。免疫电镜亚细胞定位证实小麦胚内的β-淀粉酶主要定位于蛋白储藏体内,并可能附着在淀粉粒上,SNP处理增加了β-淀粉酶蛋白的分布。推测外源NO供体SNP在小麦种子萌发早期不仅提高了自由型β-淀粉酶的活性,还可能诱导了β-淀粉酶的重新合成。 展开更多
关键词 一氧化氮 Β-淀粉酶 转录调控 亚细胞定位 小麦种子
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功率VDMOSFET单粒子效应研究 被引量:4
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作者 段雪 郎秀兰 +6 位作者 刘英坤 董四华 崔占东 刘忠山 孙艳玲 胡顺欣 冯彬 《微纳电子技术》 CAS 2008年第10期573-576,共4页
阐述了空间辐射环境下n沟功率VDMOSFET发生单粒子栅穿(SEGR)和单粒子烧毁(SEB)的物理机理。研究了多层缓冲局部屏蔽抗单粒子辐射的功率VDMOSFET新结构及相应硅栅制作新工艺。通过对所研制的漏源击穿电压分别为65V和112V两种n沟功率VDMOS... 阐述了空间辐射环境下n沟功率VDMOSFET发生单粒子栅穿(SEGR)和单粒子烧毁(SEB)的物理机理。研究了多层缓冲局部屏蔽抗单粒子辐射的功率VDMOSFET新结构及相应硅栅制作新工艺。通过对所研制的漏源击穿电压分别为65V和112V两种n沟功率VDMOS-FET器件样品进行锎源252Cf单粒子模拟辐射实验,研究了新技术VDMOSFET的单粒子辐射敏感性。实验结果表明,两种器件样品在锎源单粒子模拟辐射实验中的漏源安全电压分别达到61V和110V,验证了新结构和新工艺在提高功率VDMOSFET抗单粒子效应方面的有效性。 展开更多
关键词 功率纵向双扩散金属氧化物半导体场效应晶体管 单粒子栅穿 单粒子烧毁 缓冲屏蔽 锎源
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A novel structure for improving the SEGR of a VDMOS 被引量:1
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作者 唐昭焕 胡刚毅 +4 位作者 陈光炳 谭开洲 刘勇 罗俊 徐学良 《Journal of Semiconductors》 EI CAS CSCD 2012年第4期38-41,共4页
The mechanism of single-event gate-rupture in an N-channel VDMOS in a space radiation environment was analyzed. Based on the mechanism, a novel structure of VDMOS for improving single-event gate-rupture is proposed, a... The mechanism of single-event gate-rupture in an N-channel VDMOS in a space radiation environment was analyzed. Based on the mechanism, a novel structure of VDMOS for improving single-event gate-rupture is proposed, and the structure is simulated and it is demonstrated that it can improve a VDMOS SEGR threshold voltage by 120%. With this structure, the specific on-resistance value of a VDMOS is reduced by 15.5% as the breakdown voltage almost maintains the same value. As only one mask added, which is local oxidation of silicon instead of an active processing area, the new structure VDMOS it is easily fabricated. The novel structure can be widely used in high-voltage VDMOS in a space radiation environment. 展开更多
关键词 VDMOS single event gate-rupture local oxidation of silicon specific on-resistance
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