A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). A...A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features. The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.展开更多
This paper proposes an effective method of fabricating top contact organic field effect transistors by using a pho- tolithographic process. The semiconductor layer is protected by a passivation layer. Through photolit...This paper proposes an effective method of fabricating top contact organic field effect transistors by using a pho- tolithographic process. The semiconductor layer is protected by a passivation layer. Through photolithographic and etching processes, parts of the passivation layer are etched off to form source/drain electrode patterns. Combined with conventional evaporation and lift-off techniques, organic field effect transistors with a top contact are fabricated suc- cessfully, whose properties are comparable to those prepared with the shadow mask method and one order of magnitude higher than the bottom contact devices fabricated by using a photolithographic process.展开更多
Photosensitive polyimide/titania hybrid was prepared successfully by sol gel process. This hybrid material posseses a good photolithographic property under UV exposure. The introduction of titania leads to the increas...Photosensitive polyimide/titania hybrid was prepared successfully by sol gel process. This hybrid material posseses a good photolithographic property under UV exposure. The introduction of titania leads to the increase in refractive index of the hybrid.展开更多
A kind of negative photoresist, composed of photosensitive polyimides and N methyl 2 pyrrolidone was formulated. The curing mechanism and the relationship of the properties and structure of PSPIs were studied. The res...A kind of negative photoresist, composed of photosensitive polyimides and N methyl 2 pyrrolidone was formulated. The curing mechanism and the relationship of the properties and structure of PSPIs were studied. The results of TGA show that the PSPIs have excellent heat resistance. Based on our research, the pattern with line width as low as 2.5 μm was gained with the conventional UV photolithography under the optimum parameters.展开更多
基金This work was supported by the National Natural Science Foundation of the Peoples Republic of China (No. 69890220).
文摘A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features. The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.
基金Project supported by the National Basic Research Program of China (Grant Nos. 2011CB808404 and 2009CB939703)the National Natural Science Foundation of China (Grant Nos. 10974074,90607022,60676001,60676008,and 60825403)
文摘This paper proposes an effective method of fabricating top contact organic field effect transistors by using a pho- tolithographic process. The semiconductor layer is protected by a passivation layer. Through photolithographic and etching processes, parts of the passivation layer are etched off to form source/drain electrode patterns. Combined with conventional evaporation and lift-off techniques, organic field effect transistors with a top contact are fabricated suc- cessfully, whose properties are comparable to those prepared with the shadow mask method and one order of magnitude higher than the bottom contact devices fabricated by using a photolithographic process.
文摘Photosensitive polyimide/titania hybrid was prepared successfully by sol gel process. This hybrid material posseses a good photolithographic property under UV exposure. The introduction of titania leads to the increase in refractive index of the hybrid.
文摘A kind of negative photoresist, composed of photosensitive polyimides and N methyl 2 pyrrolidone was formulated. The curing mechanism and the relationship of the properties and structure of PSPIs were studied. The results of TGA show that the PSPIs have excellent heat resistance. Based on our research, the pattern with line width as low as 2.5 μm was gained with the conventional UV photolithography under the optimum parameters.
