Nanocrystalline silicon embedded SiO<sub>2</sub> matrix has been formed by annealing the a-SiO<sub>x</sub> films fabricated by plasma enhanced chemical vapor deposition technique. Absorption an...Nanocrystalline silicon embedded SiO<sub>2</sub> matrix has been formed by annealing the a-SiO<sub>x</sub> films fabricated by plasma enhanced chemical vapor deposition technique. Absorption and photoluminescence spectra of the films have been studied in conjunction with micro-Raman scattering spectra. It is found that absorption presents an exponential dependence of absorption coefficient to photon energy in the range of 1.5—3.0 eV, and a sub-band appears in the range of 1.0—1.5 eV. The exponential absorption is due to the indirect band-to-band transition of electrons in silicon nanocrystallites, while the sub-band absorption is ascribed to transitions between surfaces and/or defect states of the silicon nanocrystallites. The existence of Stokes shift between absorption and photoluminescence suggests that the phonon-assisted luminescence would be enhanced due to the quantum confinement effects.展开更多
Intrinsic fi-Ga203 and Zn-doped β-Ga203 films were prepared using RF magnetron sputtering. The effects of the Zn doping and thermal annealing on the structural and optical properties are investigated. In compar- ison...Intrinsic fi-Ga203 and Zn-doped β-Ga203 films were prepared using RF magnetron sputtering. The effects of the Zn doping and thermal annealing on the structural and optical properties are investigated. In compar- ison with the intrinsic β-Ga203 films, the microstructure, optical transmittance, optical absorption, optical energy gap, and photoluminescence ofZn-doped β-Ga203 films change significantly. The post-annealed β-Ga203 films are polycrystalline. After Zn doping, the crystallization deteriorates, the optical band gap shrinks, the transmittance decreases and the UV, blue, and green emission bands are enhanced.展开更多
文摘Nanocrystalline silicon embedded SiO<sub>2</sub> matrix has been formed by annealing the a-SiO<sub>x</sub> films fabricated by plasma enhanced chemical vapor deposition technique. Absorption and photoluminescence spectra of the films have been studied in conjunction with micro-Raman scattering spectra. It is found that absorption presents an exponential dependence of absorption coefficient to photon energy in the range of 1.5—3.0 eV, and a sub-band appears in the range of 1.0—1.5 eV. The exponential absorption is due to the indirect band-to-band transition of electrons in silicon nanocrystallites, while the sub-band absorption is ascribed to transitions between surfaces and/or defect states of the silicon nanocrystallites. The existence of Stokes shift between absorption and photoluminescence suggests that the phonon-assisted luminescence would be enhanced due to the quantum confinement effects.
基金supported by the National Natural Science Foundation of China(No.10974077)the Natural Science Foundation of Shandong Province,China(No.2009ZRB01702)the Shandong Province Higher Educational Science andTechnology Program,China(No. J10LA08)
文摘Intrinsic fi-Ga203 and Zn-doped β-Ga203 films were prepared using RF magnetron sputtering. The effects of the Zn doping and thermal annealing on the structural and optical properties are investigated. In compar- ison with the intrinsic β-Ga203 films, the microstructure, optical transmittance, optical absorption, optical energy gap, and photoluminescence ofZn-doped β-Ga203 films change significantly. The post-annealed β-Ga203 films are polycrystalline. After Zn doping, the crystallization deteriorates, the optical band gap shrinks, the transmittance decreases and the UV, blue, and green emission bands are enhanced.
