期刊文献+
共找到3篇文章
< 1 >
每页显示 20 50 100
DESIGN OF CONTROL INVARIANT SETS OF PLANAR SYSTEMS
1
作者 Daizhan CHENG Yupeng QIAO Wei NI 《Journal of Systems Science & Complexity》 SCIE EI CSCD 2009年第4期614-626,共13页
Control invariant sets play a key role in model predictive control.Using Lyapunov function,a technique is proposed to design control invariant sets of planar systems in a precise form.First,itis designed for a linear ... Control invariant sets play a key role in model predictive control.Using Lyapunov function,a technique is proposed to design control invariant sets of planar systems in a precise form.First,itis designed for a linear system in Brunovsky canonical form.Then,the result is extended to generallinear systems.Finally,the nonlinear control systems are considered,and some sufficient conditionsand design techniques are also obtained.Numerical examples are presented to illustrate the proposeddesign methods. 展开更多
关键词 control invariant (terminal) set Lyapunov function model predictive control planar control systems.
原文传递
GPS测量建立平面控制网的组织与实施
2
作者 段方东 冯国涛 郭耀林 《河南科技》 2015年第9期88-90,共3页
在很多的工程测量项目上,应用GPS测量建立平面控制网已经取代了常规的测量方法。作者结合多年从事GPS测量的经验,对GPS测量建立平面控制网的组织与实施进行分析和讨论,仅供学习、交流。
关键词 GPS测量 技术设计 平面控制网 精度 坐标
下载PDF
Defectivity control of aluminum chemical mechanical planarization in replacement metal gate process of MOSFET 被引量:1
3
作者 张金 刘玉岭 +2 位作者 闫辰奇 何彦刚 高宝红 《Journal of Semiconductors》 EI CAS CSCD 2016年第4期120-124,共5页
The replacement metal gate(RMG) defectivity performance control is very challenging in high-k metal gate(HKMG) chemical mechanical polishing(CMP). In this study, three major defect types, including fall-on parti... The replacement metal gate(RMG) defectivity performance control is very challenging in high-k metal gate(HKMG) chemical mechanical polishing(CMP). In this study, three major defect types, including fall-on particles, micro-scratch and corrosion have been investigated. The research studied the effects of polishing pad,pressure, rotating speed, flow rate and post-CMP cleaning on the three kinds of defect, which finally eliminated the defects and achieved good surface morphology. This study will provide an important reference value for the future research of aluminum metal gate CMP. 展开更多
关键词 chemical mechanical planarization(CMP) high-k metal gate(HKMG) defectivity control surface morphology
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部