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Short-wave infrared InGaAs photodetectors and focal plane arrays 被引量:4
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作者 张永刚 顾溢 +3 位作者 邵秀梅 李雪 龚海梅 方家熊 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第12期57-63,共7页
In this article, unique spectral features of short-wave infrared band of 1 μm–3 μm, and various applications related to the photodetectors and focal plane arrays in this band, are introduced briefly. In addition, t... In this article, unique spectral features of short-wave infrared band of 1 μm–3 μm, and various applications related to the photodetectors and focal plane arrays in this band, are introduced briefly. In addition, the different material systems for the devices in this band are outlined. Based on the background, the development of lattice-matched and wavelengthextended InGaAs photodetectors and focal plane arrays, including our continuous efforts in this field, are reviewed. These devices are concentrated on the applications in spectral sensing and imaging, exclusive of optical fiber communication. 展开更多
关键词 INGAAS short-wave infrared PHOTODETECTORS focal plane arrays
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Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640×512 focal plane array 被引量:1
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作者 郝宏玥 向伟 +8 位作者 王国伟 徐应强 韩玺 孙瑶耀 蒋洞微 张宇 廖永平 魏思航 牛智川 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第4期411-414,共4页
In this paper we focused on the mask technology of inductively coupled plasma(ICP) etching for the mesa fabrication of infrared focal plane arrays(FPA).By using the SiO_2 mask,the mesa has higher graphics transfer... In this paper we focused on the mask technology of inductively coupled plasma(ICP) etching for the mesa fabrication of infrared focal plane arrays(FPA).By using the SiO_2 mask,the mesa has higher graphics transfer accuracy and creates less micro-ripples in sidewalls.Comparing the IV characterization of detectors by using two different masks,the detector using the SiO_2 hard mask has the R_0A of 9.7×10~6 Ω·cm^2,while the detector using the photoresist mask has the R_0A of3.2 × 10~2 Ω·cm^2 in 77 K.After that we focused on the method of removing the remaining SiO_2 after mesa etching.The dry ICP etching and chemical buffer oxide etcher(BOE) based on HF and NH4 F are used in this part.Detectors using BOE only have closer R_0A to that using the combining method,but it leads to gaps on mesas because of the corrosion on AlSb layer by BOE.We finally choose the combining method and fabricated the 640×512 FPA.The FPA with cutoff wavelength of 4.8 μm has the average R_0A of 6.13 × 10~9 Ω·cm^2 and the average detectivity of 4.51 × 10~9 cm·Hz^(1/2).W^(-1)at 77 K.The FPA has good uniformity with the bad dots rate of 1.21%and the noise equivalent temperature difference(NEDT) of 22.9 mK operating at 77 K. 展开更多
关键词 InAs/GaSb superlattices etching mask mid-wavelength infared focal plane arrays
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The theory and experiment of very-long-wavelength 256×1 GaAs/Al_(x)Ga_(1-x)As quantum well infrared detector linear arrays 被引量:1
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作者 GUO FangMin LI Ning +7 位作者 XIONG DaYuan ZHEN HongLou XU XiangYan HOU Ying DING RuiJun LU Wei HUANG Qi ZHOU JunMing 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2008年第7期805-812,共8页
The 256×1 linear array of multiple quantum wells infrared photodetector (QWIP) is designed and fabricated for the peak response wavelength at λP=14.6 μm. The response spectral width is bigger than 2.2 μm. The ... The 256×1 linear array of multiple quantum wells infrared photodetector (QWIP) is designed and fabricated for the peak response wavelength at λP=14.6 μm. The response spectral width is bigger than 2.2 μm. The two-dimensional (2D) diffractive coupling grating has been formed on the top QWIP photosensitive pixel for coupling the infrared radiation to the infrared detective layers. The performance of the device at VB=3 V and T=45 K has the responsibility 4.28×10-2 (A/W), the blackbody detectivity Db*=5.14×109 (cm·Hz1/2/W), and the peak detectivity Dλ*=4.24× 1010 (cm·Hz1/2/W). The sensor pixels are connected with CMOS read out circuit (ROC) hybridization by indium bumps. When integral time is 100 μs, the linear array has the effective pixel of QWIP FPA Nef of 99.2%, the average responsibility  (V/W) of 3.48×106 (V/W), the average peak detectivity Dλ* of 8.29×109 (cm·Hz1/2/W), and the non-uniformity UR of 5.83%. This device is ready for the thermal image application. 展开更多
关键词 quantum well focal plane arrays very long wavelength infrared detector diffraction grating
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