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Experimental Study on Indoor Air Cleaning Technique of Nano-Titania Catalysis Under Plasma Discharge 被引量:1
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作者 高得力 杨学昌 +1 位作者 周飞 吴宇煌 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第2期216-220,共5页
In this study, a new technique of air cleaning by plasma combined with catalyst was proposed, which consisted of electrostatic precipitation, volatile organic compounds (VOCs) decomposition and sterilization. A nove... In this study, a new technique of air cleaning by plasma combined with catalyst was proposed, which consisted of electrostatic precipitation, volatile organic compounds (VOCs) decomposition and sterilization. A novel indoor air purifier based on this technique was adopted. The experimental results showed that formaldehyde decomposition by the plasma-catalyst hybrid system was more efficient than that by plasma only, Positive discharge was better than negative discharge in formaldehyde removal. Meanwhile, the outlet concentration of ozone byproduct was effectively reduced by the nano-titania catalyst. 展开更多
关键词 non-thermal plasma nano-titania TiO2 CATALYST OZONE FORMALDEHYDE
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Development of Nanopowder Synthesis Using Induction Plasma 被引量:3
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作者 Richard DOLBEC Jerzy JUREWICZ Maher BOULOS 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第2期188-199,共12页
The application of induction plasma technology developed for the synthesis of nano- metric powders is summarized. A brief description of the scientific basis for the induction plasma processes is given, followed by th... The application of induction plasma technology developed for the synthesis of nano- metric powders is summarized. A brief description of the scientific basis for the induction plasma processes is given, followed by the presentation of an induction plasma system developed by Tekna, together with various examples of the nanopowders synthesized using its facilities. The advantages of the induction plasma process over alternative techniques and its adaptability into industrial- scale operation is particularly illustrated. Some specific issues related to the nanopowder synthesis process are also discussed. 展开更多
关键词 nano-material nanoPOWDERS induction plasma
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Experimental Research on Toluene Degradation in Plasma as the Driving Force of Nanomaterials 被引量:2
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作者 Tao Zhu Xiaoyang Li +2 位作者 Wenjuan Zhao Ni Xia Xiaojia Wang 《Open Journal of Applied Sciences》 2015年第10期586-594,共9页
Plasma technology has some shortcomings, such as higher energy consumption and byproducts produced in the reaction process. However non-thermal plasma associated with catalyst can resolve these problems. So this kind ... Plasma technology has some shortcomings, such as higher energy consumption and byproducts produced in the reaction process. However non-thermal plasma associated with catalyst can resolve these problems. So this kind of technology was paid more and more attention to treat waste gas. In this paper, we make use of this technology to decompose toluene under different electric field and packed materials. At the same time, the mechanism of toluene decomposition using plasma and catalyst is discussed. The experimental results show toluene decomposition increases with electric field strength increasing and flow velocity and initial concentration decreasing. There are four conditions in plasma: without packed materials (1);with packed materials (2);with BaTiO3 in the surfaces of packed materials (3);and with nanometer Ba0.8Sr0.2Zr0.1Ti0.9O3 (4). Toluene decomposition represents a obvious trend, that is, η(4) > η(3) > η(2) > η(1). The best decomposition efficiency of toluene arrives at 95%. 展开更多
关键词 NON-THERMAL plasma TOLUENE DECOMPOSITION Efficiency nano-MATERIALS
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Characterization of phase transformation and microstructure of nano hard phase Ti(C,N)-based cermet by spark plasma sintering 被引量:4
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作者 丰平 熊惟皓 +2 位作者 李鹏 余立新 夏阳华 《中国有色金属学会会刊:英文版》 CSCD 2004年第3期510-515,共6页
By means of optical microscope , scanning electron microscope (SEM) and transmission electron microscope (TEM), the process of densification, the characterization of phase transformation and the microstructure for... By means of optical microscope , scanning electron microscope (SEM) and transmission electron microscope (TEM), the process of densification, the characterization of phase transformation and the microstructure for spark plasma sintering (SPS) nano hard phase Ti(C,N)-based cermet were investigated. It is found that the spark plasma sintering (SPS) enables the nano hard phase Ti(C,N)-based cermet to densify rapidly, however, the full densification of the sintered samples can not be obtained. The rate of phase transformation is significantly quick. When being sintered at 1 200 ℃ for 8 min, Mo2C is completely dissolved, and TiN dissolves into TiC entirely and disappears. Above 1 200 ℃, Ti(C,N) begins to decompose and the atoms of C and N separate from Ti(C,N) resulting in the generation of N2 and the graphite. Due to the denitrification and the graphitization, the density and the hardness of sintered samples are rather low. The distribution of grain size of the sample sintered at 1 350 ℃ covers a wide range of 90500 nm, and most of the grain size are about 200 nm. The hard phase is not of typical core-rim structure. Oxides on the surface of particles can not be fully removed and present in sample as titanium oxide TiO2. Graphite exists in band-like shape. 展开更多
关键词 火花等离子烧结 金属陶瓷 粉末冶金 相变 显微结构 硬质相 TEM SPS 纳米相
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Conditions for laser-induced plasma to effectively remove nano-particles on silicon surfaces 被引量:1
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作者 韩敬华 罗莉 +2 位作者 张玉波 胡锐峰 冯国英 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第9期423-428,共6页
Particles can be removed from a silicon surface by means of irradiation and a laser plasma shock wave.The particles and silicon are heated by the irradiation and they will expand differently due to their different exp... Particles can be removed from a silicon surface by means of irradiation and a laser plasma shock wave.The particles and silicon are heated by the irradiation and they will expand differently due to their different expansion coefficients,making the particles easier to be removed.Laser plasma can ionize and even vaporize particles more significantly than an incident laser and,therefore,it can remove the particles more efficiently.The laser plasma shock wave plays a dominant role in removing particles,which is attributed to its strong burst force.The pressure of the laser plasma shock wave is determined by the laser pulse energy and the gap between the focus of laser and substrate surface.In order to obtain the working conditions for particle removal,the removal mechanism,as well as the temporal and spatial characteristics of velocity,propagation distance and pressure of shock wave have been researched.On the basis of our results,the conditions for nano-particle removal are achieved. 展开更多
关键词 laser-induced plasma shock wave nano-particles surface cleaning
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Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition 被引量:2
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作者 顾广瑞 吴宝嘉 +1 位作者 金哲 Ito Toshimichi 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第2期716-720,共5页
This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface ... This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy, respectively. The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm^2 and a current density of 3.2mA/cm^2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%. The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory. 展开更多
关键词 field emission carbon films nano-catkin microwave plasma chemical vapour deposition
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Synthesis and Characterization of Nano-sized Boron Powder Prepared by Plasma Torch 被引量:5
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作者 黄志军 吴青友 +3 位作者 李祥 尚书勇 戴晓雁 印永祥 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第5期577-580,共4页
Hydrogen thermal plasma jet was employed to prepare nano-sized boron powder with hydrogen reduction of BCI3. The maximum yield of nano-sized boron powders was about 50% with the operational conditions of H2/BCl3 of 4.... Hydrogen thermal plasma jet was employed to prepare nano-sized boron powder with hydrogen reduction of BCI3. The maximum yield of nano-sized boron powders was about 50% with the operational conditions of H2/BCl3 of 4.5:1, total feed of 4.9 m3/h, and plasma power of 25 kW. The samples were analyzed by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), and inductively coupled plasma - mass spectrometry (ICP-MS), inductively coupled plasma - atomic emission spectrometry (ICP-AES), inductive combustion infrared absorption (ICIA) and infrared thermal conductivity of oxygen and nitrogen analyzer (ITCA). The results show that the boron powders have different crystal structures with higher dispersion and purity. The average diameter is about 50 nm, and the purity is 90.29% or so. This new technology can use simple process to produce high quality boron powders, and is feasible for industrial production. 展开更多
关键词 nano-SIZED boron powder thermal plasma ultra-fine powder
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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition 被引量:1
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作者 顾广瑞 金哲 Ito Toshimichi 《Chinese Physics B》 SCIE EI CAS CSCD 2008年第4期1467-1471,共5页
Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is invest... Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope (FESEM) and Raman spectroscopy. These nano^carbon films are possessed of good field emission (FE) characteristics with a low threshold field of 2.6 V/μm and a high current density of 12.6 mA/cm^2 at an electric field of 9 V/μm. As the FE currents tend to be saturated in a high E region, no simple Fowler-Nordheim (F-N) model is applicable. A modified F N model considering statistic effects of FE tip structures and a space-charge-limited-current (SCLC) effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively. 展开更多
关键词 field emission carbon films nano-sheet microwave plasma chemical vapour deposition
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Fabrication of Nano-Yttria Disperseo uuplex and Ferritic Stainless Steels by Planetary Milling Followed by Spark Plasma Sintering and Non-Lubricated Sliding Wear Behaviour Study
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作者 Rajendrachari Shashanka Debasis Chaira Dibyendu Chakravarty 《材料科学与工程(中英文B版)》 2016年第3期111-125,共15页
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Nanostructures on Surface of SrTio<sub>3</sub>Single Crystals Treated by Plasma
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作者 Nicolay Kulagin Jablan Dojcilovic Ellen Hieckmann 《Materials Sciences and Applications》 2011年第8期971-976,共6页
Modification of a surface of strontium titanate single crystals as pure as doped with Mn (Ni) or Nd (Sm) ions after plasma treatment was studied by combination of scanning electron microscopy and atomic force microsco... Modification of a surface of strontium titanate single crystals as pure as doped with Mn (Ni) or Nd (Sm) ions after plasma treatment was studied by combination of scanning electron microscopy and atomic force microscopy techniques. Valence shift method for characteristic X ray lines was used for study of stoichiometry violation and oxidation state of ions on the crystals surface after plasma treatment. One-and two-level ordered systems of unit crystallites sized of about 10-7 – 10-10 m were discovered on samples surface after plasma treatment with energy density of about 5 - 20 (40) J.cm-2. Oxidation state of Ti ions and stoichiometry of the surface changed essentially on background of high stability of strontium ions valence. 展开更多
关键词 Ordered nano-Scale STRUCTURE Strontium TITANATE plasma Change In STRUCTURE And Ion’S VALENCE
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Preparation of Nano-Crystalline Diamond Films on Poly-Crystalline Diamond Thick Films by Microwave Plasma Enhanced Chemical Vapor Deposition
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作者 熊礼威 汪建华 +2 位作者 满卫东 翁俊 刘长林 《Plasma Science and Technology》 SCIE EI CAS CSCD 2010年第3期310-313,共4页
Nano-crystalline diamond (NCD) films were prepared on poly-crystalline diamond (PCD) thick flims by the microwave plasma enhanced chemical vapor deposition (MPCVD) method. Free standing PCD thick film (50 mm in... Nano-crystalline diamond (NCD) films were prepared on poly-crystalline diamond (PCD) thick flims by the microwave plasma enhanced chemical vapor deposition (MPCVD) method. Free standing PCD thick film (50 mm in diameter) with a thickness of 413 μm was deposited in CHn/H2 plasma. It was then abraded for 2 hours and finally cut into pieces in a size of 10×10 mm^2 by pulse laser. NCD fihns were deposited on the thick film substrates by introducing a micro-crystalline diamond (MCD) interlayer. Results showed that a higher carbon concentration (5%) and a lower substrate temperature (650℃) were feasible to obtain a highly smooth interlayer, and the appropriate addition of oxygen (2%) into the gas mixture was conducive to obtaining a smooth nano-crystalline diamond film with a tiny grain size. 展开更多
关键词 diamond thick film nano-crystalline diamond film microwave plasma en hanced chemical vapor deposition
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Nano-Coating Process for Si [1 0 0] Wafer Using Atmospheric Pressure Plasma Jet (APPJ)
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作者 Ahmed Rida Galaly 《Journal of Modern Physics》 2012年第9期1031-1039,共9页
Three-electrode plasma jet system consisting of a perforated dielectric tube with two outer and one floating inner electrodes was developed and employed for nano-coating processes of Si [1 0 0] wafer. Lowered gas brea... Three-electrode plasma jet system consisting of a perforated dielectric tube with two outer and one floating inner electrodes was developed and employed for nano-coating processes of Si [1 0 0] wafer. Lowered gas breakdown voltage, increasing plasma density and increased discharge current were achieved by using the floating inner electrode. The low temperature (Nonthermal) Atmospheric Pressure Plasma protective coating technique using precursor-containing gases (Ar, O2 and OMCTS mixture) which injected into Plasma Jet (APPJ), there are several techniques are introduced here to avoid substrate damage including increasing plasma density without increasing the kinetic energy of the ion bombardment. Furthermore some few precautions are given here to insure good media for silicon wafer prepared for coating. 展开更多
关键词 nano-Coating Nonthermal ATMOSPHERIC Pressure plasma JET SI [1 0 0] OMCTS
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Microstructure, Hardness and Corrosion Resistance of ZrN Films Prepared by Inductively Coupled Plasma Enhanced RF Magnetron Sputtering 被引量:4
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作者 文峰 孟月东 +1 位作者 任兆杏 舒兴胜 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第2期170-175,共6页
ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance ... ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance of ZrN films was investigated. When the ICP power is below 300 W, the ZrN films show a columnar structure. With the increase of ICP power, the texture coefficient (To) of the (111) plane, the nanohardness and elastic modulus of the films increase and reach the maximum at a power of 300 W. As the ICP Power exceeds 300 W, the films exhibit a ZrN and ZrNx mixed crystal structure without columnar grain while the nanohardness and elastic modulus of the films decrease. All the ZrN coated samples show a higher corrosion resistance than that of the bare M2 steel substrate in 3.5% NaCl electrolyte. The nanohardness and elastic modulus mostly depend on the crystalline structure and Tc of ZrN(111). 展开更多
关键词 inductively coupled plasma (ICP) magnetron sputtering zirconium nitride nficrostructure nano-hardness corrosion resistance
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Enhanced nonlinear optical absorption of Au/SiO_2 nano-composite thin films
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作者 赵翠华 张波萍 尚鹏鹏 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第12期5539-5543,共5页
Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma s... Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases. 展开更多
关键词 Au/SiO2 nano-composite film plasma sputtering optical absorption spectra
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Preparation and characterization of nano-crystalline diamond films on glass substrate
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作者 Fanxiu Lu Wubao Yang +2 位作者 Zhilin Liu Weizhong Tang Yumei Tong Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China 《Journal of University of Science and Technology Beijing》 CSCD 2004年第3期216-220,共5页
Adherent nano diamond films were successfully deposited on glass substrate bymicrowave plasma assisted CVD method in H_2-CH_4 and Ar-CH_4 environment. Raman, AFM (Atomic ForceMicroscope), TEM (Transmission Electron Mi... Adherent nano diamond films were successfully deposited on glass substrate bymicrowave plasma assisted CVD method in H_2-CH_4 and Ar-CH_4 environment. Raman, AFM (Atomic ForceMicroscope), TEM (Transmission Electron Microscope), FTIR, and Nano Indentation techniques were usedfor characterization of the obtained nano diamond films. It was found that the average grain sizewas less than 100 nm with a surface roughness value as low as 2 nm. The nano diamond films werefound to have excellent transparency in visible and IR spectrum range, and were as hard as naturaldiamond. Experimental results were presented. Mechanisms for nano diamond film deposition werediscussed. 展开更多
关键词 nano diamond films microwave plasma assisted CVD CHARACTERIZATION glasssubstrate
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Enhanced field emission characteristics of thin-Au-coated nano-sheet carbon films 被引量:2
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作者 顾广瑞 伊藤利道 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第10期4547-4551,共5页
This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). I... This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). In order to further improve the field emission (FE) characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9 V/μm was increased from 12.4 mA/cm2 to 27.2 mA/cm2 and the threshold field was decreased from 2.6 V/μm to 2.0 V/μm for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-chavge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF. 展开更多
关键词 nano-sheet carbon films field emission microwave plasma chemical vapour deposition space-charge-limited-current
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Preparation of nano-structured pure rare-earth bulks by combining inert-gas condensation with SPS
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作者 ZHANG Jiu-xing SONG Xiao-yan LU Nian-duan LI Er-dong YUE Ming (Dept.of Materials Science and Engineering,Key Laboratory of Advanced Functional Materials,Ministry of Education,Beijing University of Technology,Beijing 100022,China) 《功能材料信息》 2007年第5期37-39,共3页
A number of techniques have been developed to synthesize nanocrystalline bulk materials,including inert-gas condensation and consolidation,electrodeposition,severe plastic deformation,crystallization of amorphous soli... A number of techniques have been developed to synthesize nanocrystalline bulk materials,including inert-gas condensation and consolidation,electrodeposition,severe plastic deformation,crystallization of amorphous solid,surface mechanical attrition,and powder metallurgy.However,it is hard to produce the bulk with controllable nanostructures,especially with the grain sizes controllable in a wide range below 100 nm.In the conventional powder metallurgy,due to the fact that rapid coarsening of the particles ... 展开更多
关键词 pure rare-earth bulk nano-STRUCTURE spark plasma sintering(SPS)
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Research on Nanofabrication Technology of Micro-/Nano-Stereo Rapid Prototyping of PCVD
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作者 Sandy TO 《厦门大学学报(自然科学版)》 CAS CSCD 北大核心 2002年第S1期280-,共1页
At present, the most common micro/nano-scale fabri ca tion processes include the plane silicon process based on IC technology, stereo silicon process, LIGA, quasi-LIGA based on near ultra violet deep lithography, MEMS... At present, the most common micro/nano-scale fabri ca tion processes include the plane silicon process based on IC technology, stereo silicon process, LIGA, quasi-LIGA based on near ultra violet deep lithography, MEMS, energy beam etching and micro/nano-machining, etc. A common problem for t hese processes is the difficulty to fabricate arbitrary form for 3-dimensional micro/nano-parts, devices or mechanisms. To develop advanced MEMS manufacturin g technology, and to achieve fabrication of true 3-dimensional parts, devices or mechanisms, this paper proposes a nanofabrication technology for rapid proto typing of 3-dimensional parts, using plasma chemical vapor deposition (PCVD). This process can be describes as follows: A laser beam is produced by a low power, quasi molecule laser. It enters the vac uum chamber through a window, and is focused on with the substrate surface. A ga s in the chamber is ionized by the laser beam to produce PCVD on the substrate s urface, and forms a particle of the size of Ф100 nm (its thickness is about 100 nm). When the laser beam moves along X-axis, many particles form a line. Then the laser beam moves one step in Y-axis to form a new line. A plane is complete d by many lines. Then the substrate moves in Z-axis to form new plane. Eventu ally, many planes form a 3-dimensional component. Using available CAD/CAM softw are with this process, rapid prototyping of complex components can be achieved. A nanometer precision linear motor, such as that described in Chinese national p atent (patent No. ZL 98 2 16753.9), can be used to obtain the nanometer precisio n movements in the process. The process does not require mask, can be used for v arious rapid prototyping materials, to obtain high fabrication precision (its sc ale precision is 15 nm), and larger ratio of height to width of micro/nano-stru cture. It can find widespread applications in the fabrication of micro-mechani sm, trimming IC, and fabricating minilens, etc. 展开更多
关键词 plasma nanofabrication rapid prototyping advan ced manufacturing technology micro/nano-technology
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两步法制备纳米TiC_(p)/GH3536复合粉末组织性能研究
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作者 刘佳伟 宋美慧 +5 位作者 李岩 张煜 李艳春 张晓臣 安德烈·萨莫欣 杨慧敏 《材料工程》 EI CAS CSCD 北大核心 2024年第8期189-199,共11页
采用机械合金化(mechanical alloying, MA)结合热等离子体球化处理(thermal plasma spheroidization,TPS)两步法,制备纳米TiC_(p)/GH3536复合粉末。采用霍尔流速计、斯科特容量计、XRD、粒度粒形仪、扫描电子显微镜及透射电子显微镜等... 采用机械合金化(mechanical alloying, MA)结合热等离子体球化处理(thermal plasma spheroidization,TPS)两步法,制备纳米TiC_(p)/GH3536复合粉末。采用霍尔流速计、斯科特容量计、XRD、粒度粒形仪、扫描电子显微镜及透射电子显微镜等分析测试手段,研究球化处理前后复合粉末的流动性、松装密度、粒度分布、球形度及微观组织形貌。结果表明:第一步MA-5 h处理得到的预制粉末为基体GH3536表面非均匀附着纳米TiC颗粒的不规则形状粉末;相比原始GH3536粉末,预制粉末内部等轴晶数量增多,晶粒得到细化,但流动性和松装密度均降低。第二步TPS处理得到的纳米TiC_p/GH3536复合粉末为球形,原始不规则纳米TiC颗粒被球化,同时均匀分布于GH3536基体内部;去除平均粒度183.27 nm的亚微米颗粒后,复合粉末的流动性、松装密度和球形度得到进一步改善。亚微米颗粒的TEM结果显示,纳米级GH3536微球上均匀包覆着一层TiC,类似核壳结构,且粉末中出现球状TiC颗粒。两步法制备的纳米TiC_(p)/GH3536复合粉末,平均球形度达0.965,平均粒径为33.65μm,流动性为17.1 s/50 g,松装密度为4.184 g/cm^(3)。 展开更多
关键词 热等离子体球化 纳米TiC_p/GH3536 复合材料 微观组织 性能
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等离子喷涂高强韧纳米TiO_(2)涂层的制备及其力学性能
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作者 马凤孝 郭星晔 +3 位作者 何翰伟 吴旭 周正 贺定勇 《热喷涂技术》 2024年第2期99-105,112,共8页
为提高大气等离子喷涂(APS)TiO_(2)陶瓷涂层的结合强度及其摩擦磨损性能,采用喷雾造粒的纳米结构TiO_(2)粉末为原料,利用APS工艺制备出TiO_(2)陶瓷涂层,研究了涂层的显微组织、相组成、力学性能和摩擦磨损性能,并与常见的微米级TiO_(2)... 为提高大气等离子喷涂(APS)TiO_(2)陶瓷涂层的结合强度及其摩擦磨损性能,采用喷雾造粒的纳米结构TiO_(2)粉末为原料,利用APS工艺制备出TiO_(2)陶瓷涂层,研究了涂层的显微组织、相组成、力学性能和摩擦磨损性能,并与常见的微米级TiO_(2)粉末制备的陶瓷涂层组织性能进行了对比。结果表明,微米TiO_(2)粉在喷涂前后相成分从板钛矿变为金红石和锐钛矿的混合相;而纳米团聚的TiO_(2)粉喷涂前后无明显的相成分变化,均以金红石相为主。纳米TiO_(2)涂层的孔隙率为1.4%,低于微米粉涂层的3.3%。纳米TiO_(2)涂层的力学性能优于微米涂层,微米涂层硬度为934.2 HV_(0.1),而纳米涂层的硬度为1349 HV_(0.1);纳米和微米涂层的弹性模量分别为203.1和185.8 GPa;纳米涂层的断裂韧性为2.1 MPa·m^(1/2),略高于微米涂层的2.0 MPa·m^(1/2);纳米涂层的结合强度可达46.8 MPa,是微米涂层的3.18倍(14.7 MPa)。此外,在相同的摩擦条件下,纳米TiO_(2)涂层的摩擦因数为0.69,比微米TiO_(2)涂层更低,纳米涂层的磨损体积也比微米涂层更少。综合来说,纳米TiO_(2)涂层相对于微米级TiO_(2)涂层体现出更好的综合力学性能。 展开更多
关键词 等离子喷涂 纳米TiO_(2)涂层 力学性能 摩擦学性能
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