In this study, a new technique of air cleaning by plasma combined with catalyst was proposed, which consisted of electrostatic precipitation, volatile organic compounds (VOCs) decomposition and sterilization. A nove...In this study, a new technique of air cleaning by plasma combined with catalyst was proposed, which consisted of electrostatic precipitation, volatile organic compounds (VOCs) decomposition and sterilization. A novel indoor air purifier based on this technique was adopted. The experimental results showed that formaldehyde decomposition by the plasma-catalyst hybrid system was more efficient than that by plasma only, Positive discharge was better than negative discharge in formaldehyde removal. Meanwhile, the outlet concentration of ozone byproduct was effectively reduced by the nano-titania catalyst.展开更多
The application of induction plasma technology developed for the synthesis of nano- metric powders is summarized. A brief description of the scientific basis for the induction plasma processes is given, followed by th...The application of induction plasma technology developed for the synthesis of nano- metric powders is summarized. A brief description of the scientific basis for the induction plasma processes is given, followed by the presentation of an induction plasma system developed by Tekna, together with various examples of the nanopowders synthesized using its facilities. The advantages of the induction plasma process over alternative techniques and its adaptability into industrial- scale operation is particularly illustrated. Some specific issues related to the nanopowder synthesis process are also discussed.展开更多
Plasma technology has some shortcomings, such as higher energy consumption and byproducts produced in the reaction process. However non-thermal plasma associated with catalyst can resolve these problems. So this kind ...Plasma technology has some shortcomings, such as higher energy consumption and byproducts produced in the reaction process. However non-thermal plasma associated with catalyst can resolve these problems. So this kind of technology was paid more and more attention to treat waste gas. In this paper, we make use of this technology to decompose toluene under different electric field and packed materials. At the same time, the mechanism of toluene decomposition using plasma and catalyst is discussed. The experimental results show toluene decomposition increases with electric field strength increasing and flow velocity and initial concentration decreasing. There are four conditions in plasma: without packed materials (1);with packed materials (2);with BaTiO3 in the surfaces of packed materials (3);and with nanometer Ba0.8Sr0.2Zr0.1Ti0.9O3 (4). Toluene decomposition represents a obvious trend, that is, η(4) > η(3) > η(2) > η(1). The best decomposition efficiency of toluene arrives at 95%.展开更多
By means of optical microscope , scanning electron microscope (SEM) and transmission electron microscope (TEM), the process of densification, the characterization of phase transformation and the microstructure for...By means of optical microscope , scanning electron microscope (SEM) and transmission electron microscope (TEM), the process of densification, the characterization of phase transformation and the microstructure for spark plasma sintering (SPS) nano hard phase Ti(C,N)-based cermet were investigated. It is found that the spark plasma sintering (SPS) enables the nano hard phase Ti(C,N)-based cermet to densify rapidly, however, the full densification of the sintered samples can not be obtained. The rate of phase transformation is significantly quick. When being sintered at 1 200 ℃ for 8 min, Mo2C is completely dissolved, and TiN dissolves into TiC entirely and disappears. Above 1 200 ℃, Ti(C,N) begins to decompose and the atoms of C and N separate from Ti(C,N) resulting in the generation of N2 and the graphite. Due to the denitrification and the graphitization, the density and the hardness of sintered samples are rather low. The distribution of grain size of the sample sintered at 1 350 ℃ covers a wide range of 90500 nm, and most of the grain size are about 200 nm. The hard phase is not of typical core-rim structure. Oxides on the surface of particles can not be fully removed and present in sample as titanium oxide TiO2. Graphite exists in band-like shape.展开更多
Particles can be removed from a silicon surface by means of irradiation and a laser plasma shock wave.The particles and silicon are heated by the irradiation and they will expand differently due to their different exp...Particles can be removed from a silicon surface by means of irradiation and a laser plasma shock wave.The particles and silicon are heated by the irradiation and they will expand differently due to their different expansion coefficients,making the particles easier to be removed.Laser plasma can ionize and even vaporize particles more significantly than an incident laser and,therefore,it can remove the particles more efficiently.The laser plasma shock wave plays a dominant role in removing particles,which is attributed to its strong burst force.The pressure of the laser plasma shock wave is determined by the laser pulse energy and the gap between the focus of laser and substrate surface.In order to obtain the working conditions for particle removal,the removal mechanism,as well as the temporal and spatial characteristics of velocity,propagation distance and pressure of shock wave have been researched.On the basis of our results,the conditions for nano-particle removal are achieved.展开更多
This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface ...This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy, respectively. The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm^2 and a current density of 3.2mA/cm^2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%. The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory.展开更多
Hydrogen thermal plasma jet was employed to prepare nano-sized boron powder with hydrogen reduction of BCI3. The maximum yield of nano-sized boron powders was about 50% with the operational conditions of H2/BCl3 of 4....Hydrogen thermal plasma jet was employed to prepare nano-sized boron powder with hydrogen reduction of BCI3. The maximum yield of nano-sized boron powders was about 50% with the operational conditions of H2/BCl3 of 4.5:1, total feed of 4.9 m3/h, and plasma power of 25 kW. The samples were analyzed by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), and inductively coupled plasma - mass spectrometry (ICP-MS), inductively coupled plasma - atomic emission spectrometry (ICP-AES), inductive combustion infrared absorption (ICIA) and infrared thermal conductivity of oxygen and nitrogen analyzer (ITCA). The results show that the boron powders have different crystal structures with higher dispersion and purity. The average diameter is about 50 nm, and the purity is 90.29% or so. This new technology can use simple process to produce high quality boron powders, and is feasible for industrial production.展开更多
Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is invest...Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope (FESEM) and Raman spectroscopy. These nano^carbon films are possessed of good field emission (FE) characteristics with a low threshold field of 2.6 V/μm and a high current density of 12.6 mA/cm^2 at an electric field of 9 V/μm. As the FE currents tend to be saturated in a high E region, no simple Fowler-Nordheim (F-N) model is applicable. A modified F N model considering statistic effects of FE tip structures and a space-charge-limited-current (SCLC) effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively.展开更多
Modification of a surface of strontium titanate single crystals as pure as doped with Mn (Ni) or Nd (Sm) ions after plasma treatment was studied by combination of scanning electron microscopy and atomic force microsco...Modification of a surface of strontium titanate single crystals as pure as doped with Mn (Ni) or Nd (Sm) ions after plasma treatment was studied by combination of scanning electron microscopy and atomic force microscopy techniques. Valence shift method for characteristic X ray lines was used for study of stoichiometry violation and oxidation state of ions on the crystals surface after plasma treatment. One-and two-level ordered systems of unit crystallites sized of about 10-7 – 10-10 m were discovered on samples surface after plasma treatment with energy density of about 5 - 20 (40) J.cm-2. Oxidation state of Ti ions and stoichiometry of the surface changed essentially on background of high stability of strontium ions valence.展开更多
Nano-crystalline diamond (NCD) films were prepared on poly-crystalline diamond (PCD) thick flims by the microwave plasma enhanced chemical vapor deposition (MPCVD) method. Free standing PCD thick film (50 mm in...Nano-crystalline diamond (NCD) films were prepared on poly-crystalline diamond (PCD) thick flims by the microwave plasma enhanced chemical vapor deposition (MPCVD) method. Free standing PCD thick film (50 mm in diameter) with a thickness of 413 μm was deposited in CHn/H2 plasma. It was then abraded for 2 hours and finally cut into pieces in a size of 10×10 mm^2 by pulse laser. NCD fihns were deposited on the thick film substrates by introducing a micro-crystalline diamond (MCD) interlayer. Results showed that a higher carbon concentration (5%) and a lower substrate temperature (650℃) were feasible to obtain a highly smooth interlayer, and the appropriate addition of oxygen (2%) into the gas mixture was conducive to obtaining a smooth nano-crystalline diamond film with a tiny grain size.展开更多
Three-electrode plasma jet system consisting of a perforated dielectric tube with two outer and one floating inner electrodes was developed and employed for nano-coating processes of Si [1 0 0] wafer. Lowered gas brea...Three-electrode plasma jet system consisting of a perforated dielectric tube with two outer and one floating inner electrodes was developed and employed for nano-coating processes of Si [1 0 0] wafer. Lowered gas breakdown voltage, increasing plasma density and increased discharge current were achieved by using the floating inner electrode. The low temperature (Nonthermal) Atmospheric Pressure Plasma protective coating technique using precursor-containing gases (Ar, O2 and OMCTS mixture) which injected into Plasma Jet (APPJ), there are several techniques are introduced here to avoid substrate damage including increasing plasma density without increasing the kinetic energy of the ion bombardment. Furthermore some few precautions are given here to insure good media for silicon wafer prepared for coating.展开更多
ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance ...ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance of ZrN films was investigated. When the ICP power is below 300 W, the ZrN films show a columnar structure. With the increase of ICP power, the texture coefficient (To) of the (111) plane, the nanohardness and elastic modulus of the films increase and reach the maximum at a power of 300 W. As the ICP Power exceeds 300 W, the films exhibit a ZrN and ZrNx mixed crystal structure without columnar grain while the nanohardness and elastic modulus of the films decrease. All the ZrN coated samples show a higher corrosion resistance than that of the bare M2 steel substrate in 3.5% NaCl electrolyte. The nanohardness and elastic modulus mostly depend on the crystalline structure and Tc of ZrN(111).展开更多
Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma s...Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases.展开更多
Adherent nano diamond films were successfully deposited on glass substrate bymicrowave plasma assisted CVD method in H_2-CH_4 and Ar-CH_4 environment. Raman, AFM (Atomic ForceMicroscope), TEM (Transmission Electron Mi...Adherent nano diamond films were successfully deposited on glass substrate bymicrowave plasma assisted CVD method in H_2-CH_4 and Ar-CH_4 environment. Raman, AFM (Atomic ForceMicroscope), TEM (Transmission Electron Microscope), FTIR, and Nano Indentation techniques were usedfor characterization of the obtained nano diamond films. It was found that the average grain sizewas less than 100 nm with a surface roughness value as low as 2 nm. The nano diamond films werefound to have excellent transparency in visible and IR spectrum range, and were as hard as naturaldiamond. Experimental results were presented. Mechanisms for nano diamond film deposition werediscussed.展开更多
This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). I...This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). In order to further improve the field emission (FE) characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9 V/μm was increased from 12.4 mA/cm2 to 27.2 mA/cm2 and the threshold field was decreased from 2.6 V/μm to 2.0 V/μm for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-chavge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF.展开更多
A number of techniques have been developed to synthesize nanocrystalline bulk materials,including inert-gas condensation and consolidation,electrodeposition,severe plastic deformation,crystallization of amorphous soli...A number of techniques have been developed to synthesize nanocrystalline bulk materials,including inert-gas condensation and consolidation,electrodeposition,severe plastic deformation,crystallization of amorphous solid,surface mechanical attrition,and powder metallurgy.However,it is hard to produce the bulk with controllable nanostructures,especially with the grain sizes controllable in a wide range below 100 nm.In the conventional powder metallurgy,due to the fact that rapid coarsening of the particles ...展开更多
At present, the most common micro/nano-scale fabri ca tion processes include the plane silicon process based on IC technology, stereo silicon process, LIGA, quasi-LIGA based on near ultra violet deep lithography, MEMS...At present, the most common micro/nano-scale fabri ca tion processes include the plane silicon process based on IC technology, stereo silicon process, LIGA, quasi-LIGA based on near ultra violet deep lithography, MEMS, energy beam etching and micro/nano-machining, etc. A common problem for t hese processes is the difficulty to fabricate arbitrary form for 3-dimensional micro/nano-parts, devices or mechanisms. To develop advanced MEMS manufacturin g technology, and to achieve fabrication of true 3-dimensional parts, devices or mechanisms, this paper proposes a nanofabrication technology for rapid proto typing of 3-dimensional parts, using plasma chemical vapor deposition (PCVD). This process can be describes as follows: A laser beam is produced by a low power, quasi molecule laser. It enters the vac uum chamber through a window, and is focused on with the substrate surface. A ga s in the chamber is ionized by the laser beam to produce PCVD on the substrate s urface, and forms a particle of the size of Ф100 nm (its thickness is about 100 nm). When the laser beam moves along X-axis, many particles form a line. Then the laser beam moves one step in Y-axis to form a new line. A plane is complete d by many lines. Then the substrate moves in Z-axis to form new plane. Eventu ally, many planes form a 3-dimensional component. Using available CAD/CAM softw are with this process, rapid prototyping of complex components can be achieved. A nanometer precision linear motor, such as that described in Chinese national p atent (patent No. ZL 98 2 16753.9), can be used to obtain the nanometer precisio n movements in the process. The process does not require mask, can be used for v arious rapid prototyping materials, to obtain high fabrication precision (its sc ale precision is 15 nm), and larger ratio of height to width of micro/nano-stru cture. It can find widespread applications in the fabrication of micro-mechani sm, trimming IC, and fabricating minilens, etc.展开更多
基金National Natural Science Foundation of China(No.50436040)
文摘In this study, a new technique of air cleaning by plasma combined with catalyst was proposed, which consisted of electrostatic precipitation, volatile organic compounds (VOCs) decomposition and sterilization. A novel indoor air purifier based on this technique was adopted. The experimental results showed that formaldehyde decomposition by the plasma-catalyst hybrid system was more efficient than that by plasma only, Positive discharge was better than negative discharge in formaldehyde removal. Meanwhile, the outlet concentration of ozone byproduct was effectively reduced by the nano-titania catalyst.
文摘The application of induction plasma technology developed for the synthesis of nano- metric powders is summarized. A brief description of the scientific basis for the induction plasma processes is given, followed by the presentation of an induction plasma system developed by Tekna, together with various examples of the nanopowders synthesized using its facilities. The advantages of the induction plasma process over alternative techniques and its adaptability into industrial- scale operation is particularly illustrated. Some specific issues related to the nanopowder synthesis process are also discussed.
文摘Plasma technology has some shortcomings, such as higher energy consumption and byproducts produced in the reaction process. However non-thermal plasma associated with catalyst can resolve these problems. So this kind of technology was paid more and more attention to treat waste gas. In this paper, we make use of this technology to decompose toluene under different electric field and packed materials. At the same time, the mechanism of toluene decomposition using plasma and catalyst is discussed. The experimental results show toluene decomposition increases with electric field strength increasing and flow velocity and initial concentration decreasing. There are four conditions in plasma: without packed materials (1);with packed materials (2);with BaTiO3 in the surfaces of packed materials (3);and with nanometer Ba0.8Sr0.2Zr0.1Ti0.9O3 (4). Toluene decomposition represents a obvious trend, that is, η(4) > η(3) > η(2) > η(1). The best decomposition efficiency of toluene arrives at 95%.
文摘By means of optical microscope , scanning electron microscope (SEM) and transmission electron microscope (TEM), the process of densification, the characterization of phase transformation and the microstructure for spark plasma sintering (SPS) nano hard phase Ti(C,N)-based cermet were investigated. It is found that the spark plasma sintering (SPS) enables the nano hard phase Ti(C,N)-based cermet to densify rapidly, however, the full densification of the sintered samples can not be obtained. The rate of phase transformation is significantly quick. When being sintered at 1 200 ℃ for 8 min, Mo2C is completely dissolved, and TiN dissolves into TiC entirely and disappears. Above 1 200 ℃, Ti(C,N) begins to decompose and the atoms of C and N separate from Ti(C,N) resulting in the generation of N2 and the graphite. Due to the denitrification and the graphitization, the density and the hardness of sintered samples are rather low. The distribution of grain size of the sample sintered at 1 350 ℃ covers a wide range of 90500 nm, and most of the grain size are about 200 nm. The hard phase is not of typical core-rim structure. Oxides on the surface of particles can not be fully removed and present in sample as titanium oxide TiO2. Graphite exists in band-like shape.
基金Project supported by the National Natural Science Foundation of China(Grant No.11574221)
文摘Particles can be removed from a silicon surface by means of irradiation and a laser plasma shock wave.The particles and silicon are heated by the irradiation and they will expand differently due to their different expansion coefficients,making the particles easier to be removed.Laser plasma can ionize and even vaporize particles more significantly than an incident laser and,therefore,it can remove the particles more efficiently.The laser plasma shock wave plays a dominant role in removing particles,which is attributed to its strong burst force.The pressure of the laser plasma shock wave is determined by the laser pulse energy and the gap between the focus of laser and substrate surface.In order to obtain the working conditions for particle removal,the removal mechanism,as well as the temporal and spatial characteristics of velocity,propagation distance and pressure of shock wave have been researched.On the basis of our results,the conditions for nano-particle removal are achieved.
文摘This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy, respectively. The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm^2 and a current density of 3.2mA/cm^2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%. The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory.
基金supported in part by the National Centre of Analysis and Testing for Nonferrous Metal & Electronic Material for Elementary Analysis, Beijing, China
文摘Hydrogen thermal plasma jet was employed to prepare nano-sized boron powder with hydrogen reduction of BCI3. The maximum yield of nano-sized boron powders was about 50% with the operational conditions of H2/BCl3 of 4.5:1, total feed of 4.9 m3/h, and plasma power of 25 kW. The samples were analyzed by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), and inductively coupled plasma - mass spectrometry (ICP-MS), inductively coupled plasma - atomic emission spectrometry (ICP-AES), inductive combustion infrared absorption (ICIA) and infrared thermal conductivity of oxygen and nitrogen analyzer (ITCA). The results show that the boron powders have different crystal structures with higher dispersion and purity. The average diameter is about 50 nm, and the purity is 90.29% or so. This new technology can use simple process to produce high quality boron powders, and is feasible for industrial production.
文摘Nano-sheet carbon films are prepared on Si wafers by means of quartz-tube microwave plasma chemical vapour deposition (MPCVD) in a gas mixture of hydrogen and methane. The structure of the fabricated films is investigated by using field emission scanning electron microscope (FESEM) and Raman spectroscopy. These nano^carbon films are possessed of good field emission (FE) characteristics with a low threshold field of 2.6 V/μm and a high current density of 12.6 mA/cm^2 at an electric field of 9 V/μm. As the FE currents tend to be saturated in a high E region, no simple Fowler-Nordheim (F-N) model is applicable. A modified F N model considering statistic effects of FE tip structures and a space-charge-limited-current (SCLC) effect is applied successfully to explaining the FE data observed at low and high electric fields, respectively.
文摘Modification of a surface of strontium titanate single crystals as pure as doped with Mn (Ni) or Nd (Sm) ions after plasma treatment was studied by combination of scanning electron microscopy and atomic force microscopy techniques. Valence shift method for characteristic X ray lines was used for study of stoichiometry violation and oxidation state of ions on the crystals surface after plasma treatment. One-and two-level ordered systems of unit crystallites sized of about 10-7 – 10-10 m were discovered on samples surface after plasma treatment with energy density of about 5 - 20 (40) J.cm-2. Oxidation state of Ti ions and stoichiometry of the surface changed essentially on background of high stability of strontium ions valence.
基金supported by the Research Pund of Hubei Provincial Department of Education of China (No.Q20081505)
文摘Nano-crystalline diamond (NCD) films were prepared on poly-crystalline diamond (PCD) thick flims by the microwave plasma enhanced chemical vapor deposition (MPCVD) method. Free standing PCD thick film (50 mm in diameter) with a thickness of 413 μm was deposited in CHn/H2 plasma. It was then abraded for 2 hours and finally cut into pieces in a size of 10×10 mm^2 by pulse laser. NCD fihns were deposited on the thick film substrates by introducing a micro-crystalline diamond (MCD) interlayer. Results showed that a higher carbon concentration (5%) and a lower substrate temperature (650℃) were feasible to obtain a highly smooth interlayer, and the appropriate addition of oxygen (2%) into the gas mixture was conducive to obtaining a smooth nano-crystalline diamond film with a tiny grain size.
文摘Three-electrode plasma jet system consisting of a perforated dielectric tube with two outer and one floating inner electrodes was developed and employed for nano-coating processes of Si [1 0 0] wafer. Lowered gas breakdown voltage, increasing plasma density and increased discharge current were achieved by using the floating inner electrode. The low temperature (Nonthermal) Atmospheric Pressure Plasma protective coating technique using precursor-containing gases (Ar, O2 and OMCTS mixture) which injected into Plasma Jet (APPJ), there are several techniques are introduced here to avoid substrate damage including increasing plasma density without increasing the kinetic energy of the ion bombardment. Furthermore some few precautions are given here to insure good media for silicon wafer prepared for coating.
文摘ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance of ZrN films was investigated. When the ICP power is below 300 W, the ZrN films show a columnar structure. With the increase of ICP power, the texture coefficient (To) of the (111) plane, the nanohardness and elastic modulus of the films increase and reach the maximum at a power of 300 W. As the ICP Power exceeds 300 W, the films exhibit a ZrN and ZrNx mixed crystal structure without columnar grain while the nanohardness and elastic modulus of the films decrease. All the ZrN coated samples show a higher corrosion resistance than that of the bare M2 steel substrate in 3.5% NaCl electrolyte. The nanohardness and elastic modulus mostly depend on the crystalline structure and Tc of ZrN(111).
基金Project supported by the National Natural Science Foundation of China (Grant Nos 50842028 and 50972012)the National Basic Research Program of China (Grant No 2007CB613301)
文摘Nano metal-particle dispersed glasses are the attractive candidates for nonlinear optical material applications. Au/SiO2 nano-composite thin films with 3 vol% to 65 vol% Au are prepared by inductively coupled plasma sputtering. Au particles as perfect spheres with diameters between 10 nm and 30 nm are uniformly dispersed in the SiO2 matrix. Optical absorption peaks due to the surface plasmon resonance of Au particles are observed. The absorption property is enhanced with the increase of Au content, showing a maximum value in the films with 37 vol% Au. The absorption curves of the Au/SiO2 thin films with 3 vol% to 37 vol% Au accord well with the theoretical optical absorption spectra obtained from Mie resonance theory. Increasing Au content over 37 vol% results in the partial connection of Au particles, whereby the intensity of the absorption peak is weakened and ultimately replaced by the optical absorption of the bulk. The band gap decreases with Au content increasing from 3 vol% to 37 vol % but increases as Au content further increases.
基金This work was financially supported by the National "863" Project of China (No.863-715-Z38-03).
文摘Adherent nano diamond films were successfully deposited on glass substrate bymicrowave plasma assisted CVD method in H_2-CH_4 and Ar-CH_4 environment. Raman, AFM (Atomic ForceMicroscope), TEM (Transmission Electron Microscope), FTIR, and Nano Indentation techniques were usedfor characterization of the obtained nano diamond films. It was found that the average grain sizewas less than 100 nm with a surface roughness value as low as 2 nm. The nano diamond films werefound to have excellent transparency in visible and IR spectrum range, and were as hard as naturaldiamond. Experimental results were presented. Mechanisms for nano diamond film deposition werediscussed.
文摘This paper reports that the nano-sheet carbon films (NSCFs) were fabricated on Si wafer chips with hydrogen- methane gas mixture by means of quartz-tube-type microwave plasma chemical vapour deposition (MWPCVD). In order to further improve the field emission (FE) characteristics, a 5-nm Au film was prepared on the samples by using electron beam evaporation. The FE properties were obviously improved due to depositing Au thin film on NSCFs. The FE current density at a macroscopic electric field, E, of 9 V/μm was increased from 12.4 mA/cm2 to 27.2 mA/cm2 and the threshold field was decreased from 2.6 V/μm to 2.0 V/μm for Au-coated carbon films. A modified F-N model considering statistic effects of FE tip structures in the low E region and a space-chavge-limited-current effect in the high E region were applied successfully to explain the FE data of the Au-coated NSCF.
文摘A number of techniques have been developed to synthesize nanocrystalline bulk materials,including inert-gas condensation and consolidation,electrodeposition,severe plastic deformation,crystallization of amorphous solid,surface mechanical attrition,and powder metallurgy.However,it is hard to produce the bulk with controllable nanostructures,especially with the grain sizes controllable in a wide range below 100 nm.In the conventional powder metallurgy,due to the fact that rapid coarsening of the particles ...
文摘At present, the most common micro/nano-scale fabri ca tion processes include the plane silicon process based on IC technology, stereo silicon process, LIGA, quasi-LIGA based on near ultra violet deep lithography, MEMS, energy beam etching and micro/nano-machining, etc. A common problem for t hese processes is the difficulty to fabricate arbitrary form for 3-dimensional micro/nano-parts, devices or mechanisms. To develop advanced MEMS manufacturin g technology, and to achieve fabrication of true 3-dimensional parts, devices or mechanisms, this paper proposes a nanofabrication technology for rapid proto typing of 3-dimensional parts, using plasma chemical vapor deposition (PCVD). This process can be describes as follows: A laser beam is produced by a low power, quasi molecule laser. It enters the vac uum chamber through a window, and is focused on with the substrate surface. A ga s in the chamber is ionized by the laser beam to produce PCVD on the substrate s urface, and forms a particle of the size of Ф100 nm (its thickness is about 100 nm). When the laser beam moves along X-axis, many particles form a line. Then the laser beam moves one step in Y-axis to form a new line. A plane is complete d by many lines. Then the substrate moves in Z-axis to form new plane. Eventu ally, many planes form a 3-dimensional component. Using available CAD/CAM softw are with this process, rapid prototyping of complex components can be achieved. A nanometer precision linear motor, such as that described in Chinese national p atent (patent No. ZL 98 2 16753.9), can be used to obtain the nanometer precisio n movements in the process. The process does not require mask, can be used for v arious rapid prototyping materials, to obtain high fabrication precision (its sc ale precision is 15 nm), and larger ratio of height to width of micro/nano-stru cture. It can find widespread applications in the fabrication of micro-mechani sm, trimming IC, and fabricating minilens, etc.