Low-order Wavefront Error Compensation for Multi-field of Lithography Projection Objective Based on Interior Point Method

Low-order wavefront error account for a large proportion of wave aberrations.A compensation method for low order aberration of projection lithography objective based on Interior Point Method is presented.Compensation model between wavefront error and degree of movable lens freedom is established.Converting over-determined system to underdetermined system,the compensation is solved by Interior Point Method(IPM).The presented method is compared with direct solve the over-determined system.Then,other algorithm GA,EA and PS is compared with IPM.Simulation and experimental results show that the presented compensation method can obtained compensation with less residuals compared with direct solve the over-determined system.Also,the presented compensation method can reduce computation time and obtain results with less residuals compare with AGA,EA and PS.Moreover,after compensation,RMS of wavefront error of the experimental lithography projection objective decrease from 56.05 nm to 17.88 nm.

Hydrogel-elastomer-based stretchable strain sensor fabricated by a simple projection lithography method

Stretchable strain sensor detects a wide range of strain variation and is therefore a key component in various applications.Unlike traditional ones made of elastomers doped with conductive components or fabricated with liquid conductors,ionically conductive hydrogel-based strain sensors remain conductive under large deformations and are biocompatible.However,dehydration is a challenging issue for the latter.Researchers have developed hydrogel-elastomer-based strain sensors where an elastomer matrix encapsulates a hydrogel circuit to prevent its dehydration.However,the reported multistep approaches are generally time-consuming.Our group recently reported a multimaterial 3D printing approach that enables fast fabrication of such sensors,yet requires a self-built digital-light-processing-based multimaterial 3D printer.Here,we report a simple projection lithography method to fabricate hydrogel-elastomer-based stretchable strain sensors within 5 minutes.This method only requires a UV projector/lamp with photomasks;the chemicals are commercially available;the protocols for preparing the polymer precursors are friendly to users without chemistry background.Moreover,the manufacturing flexibility allows users to readily pattern the sensor circuit and attach the sensor to a 3D printed soft pneumatic actuator to enable strain sensing on the latter.The proposed approach paves a simple and versatile way to fabricate hydrogel-elastomer-based stretchable strain sensors and flexible electronic devices.

Glass homogeneity efect on wavefront aberration in lithography projection lens

Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution.To improve analysis accuracy,we establish the three-dimensional gradient index(GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions.Using the GRIN model,a lithography projection lens with a numerical aperture of 0.75 is analyzed.Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.

Feature size below 100 nm realized by UVLEDbased microscope projection photolithography

The demand for miniaturization and integration of optical elements has fostered the development of various micro-and nanofabrication technologies.In this work,we developed a low-cost UV-LED-based microscope projection photolithography system for rapid and high-resolution fabrication.This system can be easily implemented using off-the-shelf components.It allows for micro-and nanostructuring within seconds.By optimizing the process,a minimum feature size down to approximately 85 nm was successfully realized.In addition,investigations on fabrication of the same structures using both costly and economic microscope objectives were performed.Feature sizes below 100 nm can be stably achieved.The demonstrated approach extends the technology capabilities and may find applications in fields such as nanophotonics,biophotonics sensing and material science.