High transparent and conductive thin films of zinc doped tin oxide （ZTO） were deposited on quartz substrates by the radio-frequency （RF） magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic targe...High transparent and conductive thin films of zinc doped tin oxide （ZTO） were deposited on quartz substrates by the radio-frequency （RF） magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target.The effect of substrate temperature on the structural,electrical and optical performances of ZTO films has been studied.X-ray diffraction （XRD） results show that ZTO films possess tetragonal rutile structure with the preferred orientation of （101）.The surface morphology and roughness of the films was investigated by the atomic force microscope （AFM）.The electrical characteristic （including carrier concentration,Hall mobility and resistivity） and optical transmittance were studied by the Hall tester and UV- VIS,respectively.The highest carrier concentration of -1.144×1020 cm-3 and the Hall mobility of 7.018 cm2（V ·sec）-1 for the film with an average transmittance of about 80.0% in the visible region and the lowest resistivity of 1.116×10-2 Ω·cm were obtained when the ZTO films deposited at 250 oC.展开更多
This study has investigated the influence of the radio frequency （rf） power and working pressure on the properties of indium tin oxide （ITO） thin films, which were prepared by long-throw rf magnetron sputtering te...This study has investigated the influence of the radio frequency （rf） power and working pressure on the properties of indium tin oxide （ITO） thin films, which were prepared by long-throw rf magnetron sputtering technique at room temperature. For 200 nm thick ITO films grown at room temperature in pure argon pressure of 0.27 Pa and sputtering power of 40 W, sheet resistance was 26.6 Ω/sq. and transmittance was higher than 88% （at wavelength 500 nm）. An X-ray diffraction analysis of the samples deposited at room temperature revealed a structural change from amorphous to mixed amorphous/polycrystalline structure at （222） and （400） texture with increasing rf power. The surface composition of ITO films was characterized by X-ray photoelectron spectroscopy （XPS）. Oxygen atoms in both amorphous and crystalline ITO structures were observed from O Is XPS spectra.展开更多
基金Funded by the Program for Changjiang Scholars and Innovative Research Team in University, Ministry of Education, China (No.IRT0547)
文摘High transparent and conductive thin films of zinc doped tin oxide （ZTO） were deposited on quartz substrates by the radio-frequency （RF） magnetron sputtering using a 12 wt% ZnO doped with 88 wt% SnO2 ceramic target.The effect of substrate temperature on the structural,electrical and optical performances of ZTO films has been studied.X-ray diffraction （XRD） results show that ZTO films possess tetragonal rutile structure with the preferred orientation of （101）.The surface morphology and roughness of the films was investigated by the atomic force microscope （AFM）.The electrical characteristic （including carrier concentration,Hall mobility and resistivity） and optical transmittance were studied by the Hall tester and UV- VIS,respectively.The highest carrier concentration of -1.144×1020 cm-3 and the Hall mobility of 7.018 cm2（V ·sec）-1 for the film with an average transmittance of about 80.0% in the visible region and the lowest resistivity of 1.116×10-2 Ω·cm were obtained when the ZTO films deposited at 250 oC.
基金supported by National Sci-ence Council of the Republic of China(No.NSC-97-2221-E-270-002)Chienkuo Technology University(No.CTU-97-PR-EN-003-013-A)
文摘This study has investigated the influence of the radio frequency （rf） power and working pressure on the properties of indium tin oxide （ITO） thin films, which were prepared by long-throw rf magnetron sputtering technique at room temperature. For 200 nm thick ITO films grown at room temperature in pure argon pressure of 0.27 Pa and sputtering power of 40 W, sheet resistance was 26.6 Ω/sq. and transmittance was higher than 88% （at wavelength 500 nm）. An X-ray diffraction analysis of the samples deposited at room temperature revealed a structural change from amorphous to mixed amorphous/polycrystalline structure at （222） and （400） texture with increasing rf power. The surface composition of ITO films was characterized by X-ray photoelectron spectroscopy （XPS）. Oxygen atoms in both amorphous and crystalline ITO structures were observed from O Is XPS spectra.
