Improved Visible Transparency of SiO_2/ZnO:Al/CeO_2-TiO_2/SiO_2 Multilayer Films with High UV Absorption and Infrared Reflection Rate

New visible transparent, UV absorption, and high infrared reflection properties have been realized by depositing multilayer Si O2/Zn O: Al/Ce O2-Ti O2/Si O2 films onto glass substrates at low temperature by radio frequency magnetron sputtering. Optimum thickness of Si O2, Zn O: Al(ZAO) and Ce O2-Ti O2(CTO) films were designed with the aid of thin film design software. The degree of antireflection can be controlled by adjusting the thickness and refractive index. The outer Si O2 film can diminish the interference coloring and increase the transparency; the inner Si O2 film improves the adhesion of the coating on the glass substrate and prevents Ca2+, Na+ in the glass substrate from entering the ZAO film. The average transmittance in the visible light range increases by nearly 18%-20%, as compared to double layer ZAO/CTO films. And the films display high infrared reflection rate of above 75% in the wavelength range of 10-25 μm and good UV absorption(> 98%) properties. These systems are easy to produce on a large scale at low cost and exhibit high mechanical and chemical durability. The triple functional films with high UV absorption, antireflective and high infrared reflection rate will adapt to application in flat panel display and architectural coating glass, automotive glass, with diminishing light pollution as well as decreasing eye fatigue and increasing comfort.

Wave reflection in semiconductor nanostructures

Based on nonlocal thermoelastic theory, this article studies the reflection of waves in nanometersemi-conductor media. Firstly, the governing equations are established based on couplednonlocal elasticity theory, plasma diffusion equation, and moving equation. Then, using theharmonic method, the solution of the dissipation equation and the analytic expression of thereflection coefficient rate are obtained. Finally, the influences of nonlocal parameters on wavevelocities are showed graphically. It is found that after the introduction of nonlocal effect, thephase and group velocities all show the attenuation, and as the frequency increases, the nonlocalparameter is bigger, and the decay rate is faster. The reflection coefficient rate varies greatly withdifferent theories, with different reflection coefficient rates depending on the incident angle.

Observation of tiny polarization rotation rate in total internal reflection via weak measurements

In this paper,we examine the tiny polarization rotation effect in total internal reflection due to the spin–orbit interaction of light.We find that the tiny polarization rotation rate will induce a geometric phase gradient,which can be regarded as the physical origin of photonic spin Hall effect.We demonstrate that the spin-dependent splitting in position space is related to the polarization rotation in momentum space,while the spin-dependent splitting in momentum space is attributed to the polarization rotation in position space.Furthermore,we introduce a quantum weak measurement to determine the tiny polarization rotation rate.The rotation rate in momentum space is obtained with 118 nm,which manifests itself as a spatial shift,and the rotation rate in position space is achieved with 38 μrad∕λ,which manifests itself as an angular shift.The investigation of the polarization rotation characteristics will provide insights into the photonic spin Hall effect and will enable us to better understand the spin–orbit interaction of light.