The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensi...The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (150 fs) Ti:sapphire laser (λp=790 nm).The refractive index modifications with diameters ranging from 400 nm to 3 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 2×1013 W/cm2.The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.展开更多
基金Project(2010-0008-277)supported by NCRC(National Core Research Center)Program through the National Research Foundation of Korea funded by the Ministry of Education,Science and Technology
文摘The fabrication of an internal diffraction grating with photoinduced refractive index modification in planar hybrid germanium-silica plates was demonstrated using low-density plasma formation excited by a high-intensity femtosecond (150 fs) Ti:sapphire laser (λp=790 nm).The refractive index modifications with diameters ranging from 400 nm to 3 μm were photoinduced after plasma formation occurred upon irradiation with peak intensities of more than 2×1013 W/cm2.The graded refractive index profile was fabricated to be a symmetric around from the center of the point at which low-density plasma occurred.
