5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet(EUV)lithography on a large scale.We have done a simulation study for typical 5 nm logic design rule patterns.In a 5 nm...5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet(EUV)lithography on a large scale.We have done a simulation study for typical 5 nm logic design rule patterns.In a 5 nm logic photo process,the most appropriate layers for the EUV lithography are the cut layers,metal layers,and via layers.Generally speaking,critical structures in a lithography process are semi-dense patterns,also known as the“forbidden pitch”patterns,the array edge structures,tip-to-tip structures,tip-to-line structures(under 2D design rules),the minimum area structures,the bi-lines,tri-lines,…,etc.Compared to that from the 193 nm immersion process,the behaviors for the above structures are different.For example,in the 193 nm immersion process,the minimum area is about 2~3 times that of minimum pixel squared,while in EUV photolithographic process,the minimum achievable area is found to be significantly larger.In the simulation,we have kept aware of the stochastics impact due to drastically reduced number of photons absorbed compared to the DUV process,the criteria used for various structures of image contrast are tightened.For example,in 193 nm immersion lithography,we have usually set the minimum Exposure Latitude(EL)for the poly layer,the metal layer,and tip-to-tip pattern,respectively,at 18%,13%,and 10%.However,in EUV lithography,reasonable targets for the minima are,respectively,>18%,18%,and 13%.We have also studied the aberration and shadowing impact to the above design rule structures.We will present the results of our work and our explanations.展开更多
The design target with definite purpose character of product quality wasdescribed in a real fuzzy number ( named fuzzy target for short in this paper), and its membershipjunctions in common use were given. According t...The design target with definite purpose character of product quality wasdescribed in a real fuzzy number ( named fuzzy target for short in this paper), and its membershipjunctions in common use were given. According to the fuzzy probability theory and the robust designprinciple, the robust design rule based on fuzzy probability (named fuzzy robust design rule forshort) was put forward and its validity and practicability were analyzed and tested with a designexample. The theoretical analysis and the design examples make clear that, while the fuzzy robustdesign rule was used, the fine design effect can be obtained and the fuzzy robust design rule can bevery suitable for the choice of the membership function of the fuzzy target; so it has a particularadvantage.展开更多
To realize the reuse of process design knowledge and improve the efficiency and quality of process design, a method for extracting thinking process rules for process design is proposed. An instance representation mode...To realize the reuse of process design knowledge and improve the efficiency and quality of process design, a method for extracting thinking process rules for process design is proposed. An instance representation model of the process planning reflecting the thinking process of techni- cians is established to achieve an effective representation of the process documents. The related process attributes are extracted from the model to form the related events. The manifold learning algorithm and clustering analysis are used to preprocess the process instance data. A rule extraction mechanism of process design is introduced, which is based on the related events after dimension reduction and clustering, and uses the association rule mining algorithm to realize the similar process information extraction in the same cluster. Through the vectorization description of the related events, the final process design rules are formed. Finally, an example is given to evaluate the method of process design rules extraction.展开更多
At the present time, best rules and patterns have reached a zenith in popularity and diffusion, thanks to the software community's efforts to discover, classify and spread knowledge concerning all types of rules and ...At the present time, best rules and patterns have reached a zenith in popularity and diffusion, thanks to the software community's efforts to discover, classify and spread knowledge concerning all types of rules and patterns. Rules and patterns are useful elements, but many features remain to be studied if we wish to apply them in a rational manner. The improvement in quality that rules and patterns can inject into design is a key issue to be analyzed, so a complete body of empirical knowledge dealing with this is therefore necessary. This paper tackles the question of whether design rules and patterns can help to improve the extent to which designs are easy to understand and modify. An empirical study, composed of one experiment and a replica, was conducted with the aim of validating our conjecture. The results suggest that the use of rules and patterns affect the understandability and modifiability of the design, as the diagrams with rules and patterns are more difficult to understand than non-rule/pattern versions and more effort is required to carry out modifications to designs with rules and patterns.展开更多
Knowledge-based engineering(KBE) has made success in automobile and molding design industry, and it is introduced into the ship structural design in this paper. From the implementation of KBE, the deterministic design...Knowledge-based engineering(KBE) has made success in automobile and molding design industry, and it is introduced into the ship structural design in this paper. From the implementation of KBE, the deterministic design solutions for both rules design method(RDM) and interpolation design method(IDM) are generated. The corresponding finite element model is generated. Gaussian process(GP) is then employed to build the surrogate model for finite element analysis, in order to increase efficiency and maintain accuracy at the same time, and the multi-modal adaptive importance sampling method is adopted to calculate the corresponding structural reliability.An example is given to validate the proposed method. Finally, the reliabilities of the structures' strength caused by uncertainty lying in water corrosion, static and wave moments are calculated, and the ship structures are optimized to resist the water corrosion by multi-island genetic algorithm. Deterministic design results from the RDM and IDM are compared with each separate robust design result. The proposed method shows great efficiency and accuracy.展开更多
As technology advances, there is a considerable gap between the congestion model used in global routing and the routing resource consumption in detailed routing. The new factors contributing to congestion include loca...As technology advances, there is a considerable gap between the congestion model used in global routing and the routing resource consumption in detailed routing. The new factors contributing to congestion include local pin access paths, vias, and various design rules. In this paper, we propose a practical congestion model with measurement of the impact of design rules, and resources consumed by vias and local pin access paths. The model is compatible with path search algorithms commonly used in global routing. Validated by full-flow routing, this congestion model correlates better with real resource consumption situation in detailed routing, compared with previous work. It leads to better solution quality and shorter runtime of detailed routing when it is used in the layer assignment phase of global routing stage.展开更多
文摘5 nm logic technology node is believed to be the first node that will adopt Extremely Ultra-Violet(EUV)lithography on a large scale.We have done a simulation study for typical 5 nm logic design rule patterns.In a 5 nm logic photo process,the most appropriate layers for the EUV lithography are the cut layers,metal layers,and via layers.Generally speaking,critical structures in a lithography process are semi-dense patterns,also known as the“forbidden pitch”patterns,the array edge structures,tip-to-tip structures,tip-to-line structures(under 2D design rules),the minimum area structures,the bi-lines,tri-lines,…,etc.Compared to that from the 193 nm immersion process,the behaviors for the above structures are different.For example,in the 193 nm immersion process,the minimum area is about 2~3 times that of minimum pixel squared,while in EUV photolithographic process,the minimum achievable area is found to be significantly larger.In the simulation,we have kept aware of the stochastics impact due to drastically reduced number of photons absorbed compared to the DUV process,the criteria used for various structures of image contrast are tightened.For example,in 193 nm immersion lithography,we have usually set the minimum Exposure Latitude(EL)for the poly layer,the metal layer,and tip-to-tip pattern,respectively,at 18%,13%,and 10%.However,in EUV lithography,reasonable targets for the minima are,respectively,>18%,18%,and 13%.We have also studied the aberration and shadowing impact to the above design rule structures.We will present the results of our work and our explanations.
文摘The design target with definite purpose character of product quality wasdescribed in a real fuzzy number ( named fuzzy target for short in this paper), and its membershipjunctions in common use were given. According to the fuzzy probability theory and the robust designprinciple, the robust design rule based on fuzzy probability (named fuzzy robust design rule forshort) was put forward and its validity and practicability were analyzed and tested with a designexample. The theoretical analysis and the design examples make clear that, while the fuzzy robustdesign rule was used, the fine design effect can be obtained and the fuzzy robust design rule can bevery suitable for the choice of the membership function of the fuzzy target; so it has a particularadvantage.
文摘To realize the reuse of process design knowledge and improve the efficiency and quality of process design, a method for extracting thinking process rules for process design is proposed. An instance representation model of the process planning reflecting the thinking process of techni- cians is established to achieve an effective representation of the process documents. The related process attributes are extracted from the model to form the related events. The manifold learning algorithm and clustering analysis are used to preprocess the process instance data. A rule extraction mechanism of process design is introduced, which is based on the related events after dimension reduction and clustering, and uses the association rule mining algorithm to realize the similar process information extraction in the same cluster. Through the vectorization description of the related events, the final process design rules are formed. Finally, an example is given to evaluate the method of process design rules extraction.
基金MECENAS (Junta de Comunidades de Castilla-La-Mancha,Consejeria de Educacion y Ciencia) under Grnat No. PBI06-0024ESFINGE (Dirección General de Investigación of the Ministerio de Educación y Ciencia) under Grant No. TIN2006-15175-C05-05IDONEO (Junta de Comunidades de Castilla-La-Mancha,Consejeria de Educacion y Ciencia) under Grant No. PAC08-0160-6141
文摘At the present time, best rules and patterns have reached a zenith in popularity and diffusion, thanks to the software community's efforts to discover, classify and spread knowledge concerning all types of rules and patterns. Rules and patterns are useful elements, but many features remain to be studied if we wish to apply them in a rational manner. The improvement in quality that rules and patterns can inject into design is a key issue to be analyzed, so a complete body of empirical knowledge dealing with this is therefore necessary. This paper tackles the question of whether design rules and patterns can help to improve the extent to which designs are easy to understand and modify. An empirical study, composed of one experiment and a replica, was conducted with the aim of validating our conjecture. The results suggest that the use of rules and patterns affect the understandability and modifiability of the design, as the diagrams with rules and patterns are more difficult to understand than non-rule/pattern versions and more effort is required to carry out modifications to designs with rules and patterns.
基金the Project of Ministry of Finance andMinistry of Education of China(Nos.200512 and201335)the State Key Laboratory of Ocean Engineering Foundation of Shanghai Jiao Tong University(No.GKZD010053-10)
文摘Knowledge-based engineering(KBE) has made success in automobile and molding design industry, and it is introduced into the ship structural design in this paper. From the implementation of KBE, the deterministic design solutions for both rules design method(RDM) and interpolation design method(IDM) are generated. The corresponding finite element model is generated. Gaussian process(GP) is then employed to build the surrogate model for finite element analysis, in order to increase efficiency and maintain accuracy at the same time, and the multi-modal adaptive importance sampling method is adopted to calculate the corresponding structural reliability.An example is given to validate the proposed method. Finally, the reliabilities of the structures' strength caused by uncertainty lying in water corrosion, static and wave moments are calculated, and the ship structures are optimized to resist the water corrosion by multi-island genetic algorithm. Deterministic design results from the RDM and IDM are compared with each separate robust design result. The proposed method shows great efficiency and accuracy.
基金This work was supported by the National Natural Science Foundation of China under Grant No. 61274031. A preliminary version of the paper was published in the Proceedings of CAD/Graphics 2013.
文摘As technology advances, there is a considerable gap between the congestion model used in global routing and the routing resource consumption in detailed routing. The new factors contributing to congestion include local pin access paths, vias, and various design rules. In this paper, we propose a practical congestion model with measurement of the impact of design rules, and resources consumed by vias and local pin access paths. The model is compatible with path search algorithms commonly used in global routing. Validated by full-flow routing, this congestion model correlates better with real resource consumption situation in detailed routing, compared with previous work. It leads to better solution quality and shorter runtime of detailed routing when it is used in the layer assignment phase of global routing stage.