期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Seamless-merging-oriented parallel inverse lithography technology
1
作者 杨祎巍 史峥 沈珊瑚 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2009年第10期147-152,共6页
Inverse lithography technology (ILT), a promising resolution enhancement technology (RET) used in next generations of IC manufacture, has the capability to push lithography to its limit. However, the existing meth... Inverse lithography technology (ILT), a promising resolution enhancement technology (RET) used in next generations of IC manufacture, has the capability to push lithography to its limit. However, the existing methods of ILT are either time-consuming due to the large layout in a single process, or not accurate enough due to simply block merging in the parallel process. The seamless-merging-oriented parallel ILT method proposed in this paper is fast because of the parallel process; and most importantly, convergence enhancement penalty terms (CEPT) introduced in the parallel ILT optimization process take the environment into consideration as well as environmental change through target updating. This method increases the similarity of the overlapped area between guard-bands and work units, makes the merging process approach seamless and hence reduces hot-spots. The experimental results show that seamless-merging-oriented parallel ILT not only accelerates the optimization process, but also significantly improves the quality of ILT. 展开更多
关键词 LITHOGRAPHY PARALLEL inverse lithography technology seamless merging convergence
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部